Systems and methods for integrated circuits comprising multiple body biasing domains
First Claim
1. A method comprising:
- forming an epitaxy layer of a first conductivity type on a semiconductor substrate of the first conductivity type;
forming in the epitaxy layer a wall structure of a second conductivity type around a first region; and
forming in the epitaxy layer a bottom buried structure of the second conductivity type under the first region and connecting the bottom buried structure to the wall structure to electrically isolate the first region from a second region in the epitaxy layer, wherein the bottom buried structure is located internally with respect to the epitaxy layer and is separated by the epitaxy layer from an interface formed between the epitaxy layer and the semiconductor substrate and located under the bottom buried structure.
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Abstract
Systems and methods for integrated circuits comprising multiple body biasing domains. In accordance with a first embodiment, a semiconductor structure comprises a substrate of first type material. A first closed structure comprising walls of second type material extends from a surface of the substrate to a first depth. A planar deep well of said second type material underlying and coupled to the closed structure extends from the first depth to a second depth. The closed structure and the planar deep well of said second type material form an electrically isolated region of the first type material. A second-type semiconductor device is disposed to receive a first body biasing voltage from the electrically isolated region of the first type material. A well of the second-type material within the electrically isolated region of the first type material is formed and a first-type semiconductor device is disposed to receive a second body biasing voltage from the well of second-type material.
160 Citations
20 Claims
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1. A method comprising:
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forming an epitaxy layer of a first conductivity type on a semiconductor substrate of the first conductivity type; forming in the epitaxy layer a wall structure of a second conductivity type around a first region; and forming in the epitaxy layer a bottom buried structure of the second conductivity type under the first region and connecting the bottom buried structure to the wall structure to electrically isolate the first region from a second region in the epitaxy layer, wherein the bottom buried structure is located internally with respect to the epitaxy layer and is separated by the epitaxy layer from an interface formed between the epitaxy layer and the semiconductor substrate and located under the bottom buried structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method comprising:
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forming an epitaxy layer of a first conductivity type on a semiconductor substrate of the first conductivity type; forming in the epitaxy layer a wall structure of a second conductivity type around a first region; electrically isolating the first region from a second region in the epitaxy layer, wherein said electrically isolating includes; forming in the epitaxy layer a bottom buried structure of the second conductivity type under the first region, wherein the bottom buried structure is located internally with respect to the epitaxy layer and is separated by the epitaxy layer from an interface formed between the epitaxy layer and the semiconductor substrate and located under the bottom buried structure; and connecting the bottom buried structure to the wall structure; and forming in the first and second regions a first plurality of transistors of the first conductivity type and a second plurality of transistors of the second conductivity type. - View Dependent Claims (10, 11, 12, 13, 14)
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15. A method comprising:
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forming an epitaxy layer of a first conductivity type on a semiconductor substrate of the first conductivity type; forming in the epitaxy layer a first wall structure of a second conductivity type around a first region and a second wall structure of the second conductivity type around a second region; and electrically isolating the first region from the second region, wherein said electrically isolating includes; forming in the epitaxy layer a first bottom buried structure of the second conductivity type under the first region and a second bottom buried structure of the second conductivity type under the second region, wherein the first bottom buried structure and the second bottom buried structure are located internally with respect to the epitaxy layer, wherein the first bottom buried structure is separated by the epitaxy layer from an interface formed between the epitaxy layer and the semiconductor substrate and located under the first bottom buried structure, and wherein the second bottom buried structure is separated by the epitaxy layer from the interface formed between the epitaxy layer and the semiconductor substrate and located under the second bottom buried structure; and connecting the first and second bottom buried structures to the first and second wall structures, respectively. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification