Method for determining illumination source with optimized depth of focus

• US 8,699,003 B2
• Filed: 06/07/2011
• Issued: 04/15/2014
• Est. Priority Date: 06/07/2011
• Status: Active Grant

• Current Assignee: Nanya Technology Corporation
• Original Assignee: Nanya Technology Corporation
• Inventors: Wu, Chun-Wei
• Primary Examiner(s): Ton, Toan
• Assistant Examiner(s): RIDDLE, CHRISTINA A
• Application Number:
  US13/154,450
• Publication Number:
  US 20120314195A1
• Time in Patent Office: 1,043 Days
• Field of Search: 355/53, 355/55, 355 67- 71, 355/77, 430/5, 430/8, 430/22, 430/30, 430/311, 430/312, 430/321, 430/322, 250/492.1, 250/492.2, 250/492.22, 250/493.1, 250/548, 716/53, 716/106
• US Class Current: 355/77
• CPC Class Codes: G03F 7/70125 Use of illumination settings tailored to particular mask patterns details of setting means G03F7/70091
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
• CPC Class Codes: G03F 7/70625 Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
• CPC Class Codes: G03F 7/70641 Focus

Abstract

A method for determining an illumination source with optimized depth of focus includes the following steps. First, a simulated optimal correlation and a simulated defocus correlation of each illumination source are provided. Second, an optimal peak is determined, a defocus peak is determined, and an optimal correlation slope and a defocus correlation slope are determined. An optimal correlation ratio and a peak variation are calculated. A correlation variation is calculated from the optimal correlation ratio and the defocus correlation ratio. Next, a weighted variation is determined from the peak variation and the correlation variation. An illumination source of a lowest weighted variation among a plurality of the illumination sources is determined to be an illumination source with optimized depth of focus.

Claims

1. A method for determining an illumination source with optimized depth of focus, comprising:

providing a plurality of illumination sources;

providing a simulated optimal correlation and a simulated defocus correlation of each of said illumination sources, wherein said simulated optimal correlation expresses an optimal intensity as a function of a position of a given illumination source and said simulated defocus correlation expresses a defocus intensity as a function of a position of said given illumination source, wherein said defocus intensity is an intensity of each of said illumination source at defocus;

determining an optimal peak of said simulated optimal correlation and a defocus peak of said simulated defocus correlation;

calculating a peak variation of said optimal peak and said defocus peak, wherein said peak variation is calculated from the following formula;

said peak variation=(said optimal peak−

said defocus peak)/(said optimal peak); and

determining an illumination source of a lowest peak variation among a plurality of said illumination sources to be an illumination source with optimized depth of focus.

2. The method for determining an illumination source with optimized depth of focus of claim 1, wherein said simulated optimal correlation is determined by a given photolithographic device.

3. The method for determining an illumination source with optimized depth of focus of claim 2, wherein said simulated defocus correlation is obtained by adjusting at least one photolithographic parameter of said given photolithographic device away from an optimal value.

4. The method for determining an illumination source with optimized depth of focus of claim 1, wherein at most two simulations are done to obtain said simulated optimal correlation and said simulated defocus correlation for each of said illumination sources.

5. The method for determining an illumination source with optimized depth of focus of claim 1, wherein said optimal peak of said simulated optimal correlation is the greatest optimal intensity of said simulated optimal correlation.

6. The method for determining an illumination source with optimized depth of focus of claim 1, wherein said defocus peak of said simulated optimal correlation is the greatest defocus intensity of said simulated optimal correlation.

7. A method for determining an illumination source with optimized depth of focus, comprising:

providing a plurality of illumination sources,

providing a simulated optimal correlation and a simulated defocus correlation of each of said illumination sources, wherein said simulated optimal correlation expresses an optimal intensity as a function of a position of a given illumination source and said simulated defocus correlation expresses a defocus intensity as a function of a position of said given illumination source, wherein said defocus intensity is an intensity of each of said illumination sources at defocus;

determining an optimal correlation slope and a defocus correlation slope of said given illumination source, wherein said optimal correlation slope represents the slope of said simulated optimal correlation at a given dimension, and said defocus correlation slope represents the slope of said simulated defocus correlation at a given dimension;

calculating an optimal correlation ratio from said optimal correlation slope and a defocus correlation ratio from said defocus correlation slope;

calculating a correlation variation of said optimal correlation ratio and said defocus correlation ratio; and

determining an illumination source of a lowest correlation variation among a plurality of said illumination sources to be an illumination source with optimized depth of focus.

8. The method for determining an illumination source with optimized depth of focus of claim 7, wherein said simulated optimal correlation is determined by a given photolithographic device.

9. The method for determining an illumination source with optimized depth of focus of claim 8, wherein said simulated defocus correlation is obtained by adjusting at least one photolithographic parameter of said given photolithographic device away from an optimal value.

10. The method for determining an illumination source with optimized depth of focus of claim 7, wherein at most two simulations are done to obtain said simulated optimal correlation and said simulated defocus correlation for each of said illumination sources.

11. The method for determining an illumination source with optimized depth of focus of claim 7, wherein said given dimension is a critical dimension of a semiconductor device.

12. The method for determining an illumination source with optimized depth of focus of claim 7, wherein said optimal correlation ratio is calculated from the following formula:

said optimal correlation ratio=(said optimal correlation slope)/(said optimal intensity at said given dimension).

13. The method for determining an illumination source with optimized depth of focus of claim 7, wherein said defocus correlation ratio is calculated from the following formula:

said defocus correlation ratio=(said defocus correlation slope)/(said defocus intensity at said given dimension).

14. The method for determining an illumination source with optimized depth of focus of claim 7, wherein said correlation variation is calculated from the following formula:

said correlation variation=(said optimal correlation ratio−

said defocus correlation ratio)/(said optimal correlation ratio).

15. A method for determining an illumination source with an optimized depth of focus, comprising:

providing a plurality of illumination sources;

providing a simulated optimal correlation and a simulated defocus correlation of each of said illumination sources, wherein said simulated optimal correlation expresses an optimal intensity as a function of a position of a given illumination source and said simulated defocus correlation expresses a defocus intensity as a function of a position of said given illumination source, wherein said defocus intensity is an intensity of each of said illumination source at defocus;

determining an optimal peak of said simulated optimal correlation, a defocus peak of said simulated defocus correlation, an optimal correlation slope of said given illumination source, and a defocus correlation slope of said given illumination source, wherein said optimal correlation slope represents the slope of said simulated optimal correlation at a given dimension, and said defocus correlation slope represents the slope of said simulated defocus correlation at a given dimension;

calculating an optimal correlation ratio from said optimal correlation slope and a defocus correlation ratio from said defocus correlation slope;

calculating a peak variation of said optimal peak and said defocus peak, a correlation variation of said optimal correlation ratio and said defocus correlation ratio;

determining a weight variation from said peak variation and said correlation variation; and

determining an illumination source of a lowest weighted variation among a plurality of said illumination sources to be an illumination source with optimized depth of focus.

16. The method for determining an illumination source with optimized depth of focus of claim 15, wherein at most two simulations are done to obtain said simulated optimal correlation and said simulated defocus correlation for each of said illumination sources.

17. The method for determining an illumination source with optimized depth of focus of claim 15, wherein said peak variation is calculated from the following formula:

said peak variation=(said optimal peak−

said defocus peak)/(said optimal peak).

18. The method for determining an illumination source with optimized depth of focus of claim 15, wherein said given dimension is a critical dimension of a semiconductor device.

19. The method for determining an illumination source with optimized depth of focus of claim 15, wherein said optimal correlation ratio is calculated from the following formula:

said optimal correlation ratio=(said optimal correlation slope)/(said optimal intensity at said given dimension).

20. The method for determining an illumination source with optimized depth of focus of claim 15, wherein said defocus correlation ratio is calculated from the following formula:

said defocus correlation ratio=(said defocus correlation slope)/(said defocus intensity at said given dimension).

21. The method for determining an illumination source with optimized depth of focus of claim 15, wherein said correlation variation is calculated from the following formula:

said correlation variation=(said optimal correlation ratio−

said defocus correlation ratio)/(said optimal correlation ratio).

22. The method for determining an illumination source with optimized depth of focus of claim 15, wherein said weighted variation is calculated from the following formula:

said weighted variation=(said peak variation*a peak weight)+(said correlation variation*a correlation weight).

23. The method for determining an illumination source with optimized depth of focus of claim 15, wherein said peak weight +said correlation weight=1.