Gas distribution plate and substrate treating apparatus including the same

• US 8,702,867 B2
• Filed: 07/05/2009
• Issued: 04/22/2014
• Est. Priority Date: 07/08/2008
• Status: Active Grant

• Current Assignee: Jusung Engineering Company Limited
• Original Assignee: Jusung Engineering Company Limited
• Inventors: Park, Chan-Ho, Choi, Jae-Wook
• Primary Examiner(s): Zervigon, Rudy
• Application Number:
  US12/497,697
• Publication Number:
  US 20100006031A1
• Time in Patent Office: 1,752 Days
• Field of Search: 118/715, 15634533-34534
• US Class Current: 118/715
• CPC Class Codes: C23C 16/45565 Shower nozzles

Abstract

A gas distribution plate that is installed in a chamber providing a reaction space and supplies a reaction gas onto a substrate placed on a substrate placing plate, wherein the gas distribution plate includes: first and second surfaces opposing to each other, wherein the second surface faces the substrate placing plate and has a recess shape; and a plurality of injection holes each including: an inflow portion that extends from the first surface toward the second surface; a diffusing portion that extends from the second surface toward the first surface; and an orifice portion between the inflow portion and the diffusing portion, wherein the plurality of inflow portions of the plurality of injection holes decrease in gas path from edge to middle of the gas distribution plate, and wherein the plurality of diffusing portions of the plurality of injection holes have substantially the same gas path.

Claims

1. A gas distribution plate that is installed in a chamber providing a reaction space and supplies a reaction gas onto a substrate placed on a substrate placing plate, the gas distribution plate comprising:

first and second surfaces opposite to each other, wherein the second surface faces the substrate placing plate and has a recess; and

a plurality of injection holes each including;

an inflow portion that extends from the first surface toward the second surface;

a diffusing portion that extends from the second surface toward the first surface; and

an orifice portion between the inflow portion and the diffusing portion,

wherein heights of the plurality of inflow portions in a gas path direction decrease from an edge portion to a center portion of the gas distribution plate, and wherein the plurality of diffusing portions of the plurality of injection holes have substantially the same dimensions in the gas path direction.

2. The gas distribution plate according to claim 1, wherein a distance between the second surface and the substrate placing plate decreases from middle to edge of the gas distribution plate.

3. The gas distribution plate according to claim 1, wherein the first surface is planar and parallel with the substrate placing plate.

4. The gas distribution plate according to claim 1, wherein the plurality of inflow portions are arranged at substantially the same interval therebetween with respect to a plane of the gas distribution plate, and the plurality of inflow portions are arranged at intervals therebetween, which increase from middle to edge of the gas distribution plate, with respect to the second surface.

5. The gas distribution plate according to claim 1, wherein the plurality of orifice portions of the plurality of injection holes have substantially the same dimension in the gas path direction and are arranged in parallel with the second surface.

6. The gas distribution plate according to claim 1, wherein the plurality of diffusing portions have substantially the same diameter and volume, and are arranged at substantially the same interval therebetween and in parallel with the second surface.

7. The gas distribution plate according to claim 1, wherein a center axis of the diffusing portion is perpendicular to the substrate placing plate.

8. The gas distribution plate according to claim 1, wherein the diffusing portion has a cone shape truncated at top thereof.

9. The gas distribution plate according to claim 1, wherein the recess shape of the second surface has an elliptical arc shape in cross-section.

10. The gas distribution plate according to claim 1, wherein the second surface includes a plurality of step portions.

11. The gas distribution plate according to claim 10, wherein the plurality of step portions are configured concentrically around middle of the gas distribution plate.

12. The gas distribution plate according to claim 10, wherein the plurality of step portions are more recessed from edge to middle of the gas distribution plate.

13. The gas distribution plate according to claim 10, wherein the plurality of inflow portions are divided into a plurality of groups corresponding to the plurality of step portions, respectively, and the dimensions in the gas path direction of inflow portions between the plurality of groups are different.

14. The gas distribution plate according to claim 10, wherein the plurality of inflow portions are divided into a plurality of groups corresponding to the plurality of step portions, respectively, and the dimensions in the gas path direction of the inflow portions within each of the plurality of groups are substantially the same.

15. A substrate treating apparatus, comprising:

a chamber providing a reaction space;

a substrate placing plate in the reaction space, wherein a substrate is placed on the substrate placing plate; and

a gas distribution plate in the reaction space, the gas distribution plate including;

first and second surfaces opposing to each other, wherein the second surface faces the substrate placing plate and has a recess shape; and

a plurality of injection holes each including;

an inflow portion that extends from the first surface toward the second surface;

a diffusing portion that extends from the second surface toward the first surface; and

an orifice portion between the inflow portion and the diffusing portion, wherein dimensions in a gas path direction of the plurality of inflow portions of the plurality of injection holes decrease from edge to middle of the gas distribution plate, and wherein the plurality of diffusing portions of the plurality of injection holes have substantially the same dimensions in the gas path direction.

16. The apparatus according to claim 15, wherein the recess shape of the second surface has an elliptical arc shape or a plurally stepped shape.

17. A gas distribution plate configured to supply a reaction gas to a substrate placed on a substrate placing plate in a chamber providing a reaction space, the gas distribution plate comprising:

first and second surfaces arranged opposite to each other, wherein the second surface is configured to face the substrate placing plate when arranged in the chamber; and

a recess formed along the second surface such that the gas distribution plate is narrower toward a center thereof and thicker toward edges thereof;

a plurality of injection holes extending through the gas distribution plate from the first surface to the second surface, each injection hole including;

an inflow portion having a length that extends from the first surface toward the second surface;

a diffusing portion having a length that extends from the second surface toward the first surface; and

an orifice portion having a length that extends between the inflow portion and the diffusing portion,

wherein lengths of the inflow portions of the plurality of injection holes decrease from an edge portion to a center portion of the gas distribution plate, and wherein lengths of each of the diffusing portions of the plurality of injection holes are substantially the same.

18. The gas distribution plate according to claim 17, wherein a distance between the second surface and the substrate placing plate decreases from the center portion to the edge portion of the gas distribution plate when arranged in the chamber.

19. The gas distribution plate according to claim 17, wherein the first surface is substantially planar and is configured to be arranged substantially parallel with the substrate placing plate when both are positioned in the chamber.

20. A substrate treating apparatus, comprising:

a chamber providing a reaction space;

a substrate placing plate disposed in the reaction space, wherein the substrate placing plate is configured to receive a substrate on a top surface of the substrate placing plate; and

a gas distribution plate arranged in the reaction space, the gas distribution plate including;

first and second surfaces arranged opposite to each other, wherein the second surface faces the substrate placing plate and has a shape recessed toward the first surface; and

a plurality of injection holes arranged through the gas distribution plate, each injection hole including;

an inflow portion that extends for a length from the first surface toward the second surface;

a diffusing portion that extends for a length from the second surface toward the first surface; and

an orifice portion extending between the inflow portion and the diffusing portion,

wherein the lengths of one or more of the inflow portions of the plurality of injection holes near a center portion of the gas distribution plate are shorter than the lengths of one or more of the inflow portions of the plurality of injection holes near an edge portion thereof, and wherein the lengths of the diffusing portions of the plurality of injection holes are substantially the same.