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Methods of fabricating substrates

  • US 8,703,570 B2
  • Filed: 07/30/2012
  • Issued: 04/22/2014
  • Est. Priority Date: 12/04/2008
  • Status: Active Grant
First Claim
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1. A method of forming a pattern on a substrate, comprising:

  • forming spaced first features and spaced second features over a substrate, the first and second features alternating with one another and being spaced relative one another;

    laterally trimming width of the spaced second features to a greater degree than any lateral trimming of width of the spaced first features while laterally trimming width of the spaced second features;

    after the laterally trimming, forming spacers on sidewalls of the spaced first features and on sidewalls of the spaced second features, the spacers being of some different composition from that of the spaced first features and from that of the spaced second features; and

    after forming the spacers, removing the spaced first features and the spaced second features from the substrate.

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