Embeded DRAM cell structures with high conductance electrodes and methods of manufacture
First Claim
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1. A method comprising:
- forming upper layers on a semiconductor substrate, the semiconductor substrate being a single uniformly doped layer of silicon substrate;
forming an opening in the upper layers;
forming a trench in the semiconductor substrate, aligned with the opening;
forming a metal plate on all exposed surfaces in the trench by applying a metallic aqueous solution with an electrical bias to a backside of the semiconductor substrate;
forming an insulator material on the metal plate;
forming an inner plate on the insulator material; and
forming a contact in an oxide layer formed on the inner plate, the contact being formed on a portion of a surface area of the inner plate,wherein the semiconductor substrate is an electrode that receives the electrical bias.
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Abstract
A method and structure is directed to eDRAM cells with high-conductance electrodes. The method includes forming upper layers on a semiconductor substrate and forming an opening in the upper layers. The method further includes forming a trench in the semiconductor substrate, aligned with the opening. The method further includes forming a metal plate on all exposed surface in the trench by applying a metallic aqueous solution with an electrical bias to a backside of the semiconductor substrate.
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Citations
9 Claims
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1. A method comprising:
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forming upper layers on a semiconductor substrate, the semiconductor substrate being a single uniformly doped layer of silicon substrate; forming an opening in the upper layers; forming a trench in the semiconductor substrate, aligned with the opening; forming a metal plate on all exposed surfaces in the trench by applying a metallic aqueous solution with an electrical bias to a backside of the semiconductor substrate; forming an insulator material on the metal plate; forming an inner plate on the insulator material; and forming a contact in an oxide layer formed on the inner plate, the contact being formed on a portion of a surface area of the inner plate, wherein the semiconductor substrate is an electrode that receives the electrical bias. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method comprising:
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depositing a pad layer on top of a semiconductor layer provided on an insulator layer and semiconductor substrate, the semiconductor substrate being a single uniformly doped layer of silicon substrate; depositing a hardmask over the pad layer; etching an opening through the insulator layer, semiconductor layer, pad layer and hardmask; forming an isolation spacer along sidewalls of the opening; etching a trench in the semiconductor substrate and in alignment with the opening; applying an aqueous solution and electrical bias from a backside of the semiconductor substrate to form a metal plate in the trench; depositing a dielectric liner on the metal plate; depositing a polysilicon material in the trench to form an electrode; forming a contact on a portion of a surface area of the electrode; and forming an oxide cap layer in the opening, wherein the contact is in the oxide cap layer, and wherein the semiconductor substrate is configured as another electrode to receive the electrical bias. - View Dependent Claims (9)
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Specification