Semiconductor device and method of manufacturing the same
First Claim
Patent Images
1. A semiconductor device comprising:
- a pixel portion over a substrate, the pixel portion comprising;
a first electrode;
a semiconductor layer;
an insulating film over the first electrode, the insulating film comprising a contact hole;
a first conductive film over the insulating film, the first conductive film being electrically connected to the semiconductor layer;
a second conductive film over the first conductive film;
a third conductive film; and
a fourth conductive film over the insulating film; and
a terminal portion over the substrate, the terminal portion comprising;
a first wiring;
a second wiring over the first wiring; and
a third wiring over the second wiring,wherein the semiconductor layer and the first electrode overlap with each other,wherein the third conductive film, the first electrode and the first wiring comprise a same material,wherein the second wiring and the first conductive film comprises a same material,wherein the third wiring and the second conductive film comprise a same material,wherein the second wiring is electrically connected to the first wiring through the contact hole of the insulating film,wherein the third wiring is electrically connected to the second wiring,wherein the third conductive film extends in a direction such that the third conductive film and the second conductive film do not overlap with each other,wherein the fourth conductive film and the third conductive film overlap with each other,wherein the fourth conductive film and the first electrode overlap with each other, andwherein the second conductive film and the fourth conductive film is configured to generate an electric field substantially parallel to a surface of the substrate.
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Abstract
The present invention improves the aperture ratio of a pixel of a reflection-type display device or a reflection type display device without increasing the number of masks and without using a blackmask. A pixel electrode (167) is arranged so as to partially overlap a source wiring (137) for shielding the gap between pixels from light, and a thin film transistor is arranged so as to partially overlap a gate wiring (166) for shielding a channel region of the thin film transistor from light, thereby realizing a high pixel aperture ratio.
195 Citations
20 Claims
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1. A semiconductor device comprising:
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a pixel portion over a substrate, the pixel portion comprising; a first electrode; a semiconductor layer; an insulating film over the first electrode, the insulating film comprising a contact hole; a first conductive film over the insulating film, the first conductive film being electrically connected to the semiconductor layer; a second conductive film over the first conductive film; a third conductive film; and a fourth conductive film over the insulating film; and a terminal portion over the substrate, the terminal portion comprising; a first wiring; a second wiring over the first wiring; and a third wiring over the second wiring, wherein the semiconductor layer and the first electrode overlap with each other, wherein the third conductive film, the first electrode and the first wiring comprise a same material, wherein the second wiring and the first conductive film comprises a same material, wherein the third wiring and the second conductive film comprise a same material, wherein the second wiring is electrically connected to the first wiring through the contact hole of the insulating film, wherein the third wiring is electrically connected to the second wiring, wherein the third conductive film extends in a direction such that the third conductive film and the second conductive film do not overlap with each other, wherein the fourth conductive film and the third conductive film overlap with each other, wherein the fourth conductive film and the first electrode overlap with each other, and wherein the second conductive film and the fourth conductive film is configured to generate an electric field substantially parallel to a surface of the substrate. - View Dependent Claims (2, 3, 4, 5)
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6. A semiconductor device comprising:
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a pixel portion over a substrate, the pixel portion comprising; a first electrode; a semiconductor layer; an insulating film over the first electrode, the insulating film comprising a contact hole; a first conductive film over the insulating film, the first conductive film being electrically connected to the semiconductor layer; a second conductive film over the first conductive film; a third conductive film; and a fourth conductive film over the insulating film; and a terminal portion over the substrate, the terminal portion comprising; a first wiring; a second wiring over the first wiring; and a third wiring over the second wiring, wherein the semiconductor layer and the first electrode overlap with each other, wherein the third conductive film, the first electrode and the first wiring are formed by processing a same film, wherein the second wiring and the first conductive film are formed by processing a same film, wherein the third wiring and the second conductive film are formed by processing a same film, wherein the second wiring is electrically connected to the first wiring through the contact hole of the insulating film, wherein the third wiring is electrically connected to the second wiring, wherein the third conductive film extends in a direction such that the third conductive film and the second conductive film do not overlap with each other, wherein the fourth conductive film and the third conductive film overlap with each other, wherein the fourth conductive film and the first electrode overlap with each other, and wherein the second conductive film and the fourth conductive film is configured to generate an electric field substantially parallel to a surface of the substrate. - View Dependent Claims (7, 8, 9, 10)
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11. A display device comprising:
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a pixel portion over a substrate, the pixel portion comprising; a liquid crystal; a first electrode; a semiconductor layer; an insulating film over the first electrode, the insulating film comprising a contact hole; a first conductive film over the insulating film, the first conductive film being electrically connected to the semiconductor layer; a second conductive film over the first conductive film; a third conductive film; and a fourth conductive film over the insulating film; and a terminal portion over the substrate, the terminal portion comprising; a first wiring; a second wiring over the first wiring; and a third wiring over the second wiring, wherein the semiconductor layer and the first electrode overlap with each other, wherein the third conductive film, the first electrode and the first wiring comprise a same material, wherein the second wiring and the first conductive film comprises a same material, wherein the third wiring and the second conductive film comprise a same material, wherein the second wiring is electrically connected to the first wiring through the contact hole of the insulating film, wherein the third wiring is electrically connected to the second wiring, wherein the third conductive film extends in a direction such that the third conductive film and the second conductive film do not overlap with each other, wherein the fourth conductive film and the third conductive film overlap with each other, wherein the fourth conductive film and the first electrode overlap with each other, wherein the second conductive film and the fourth conductive film is configured to generate an electric field substantially parallel to a surface of the substrate, and wherein the liquid crystal is controlled by the electric field. - View Dependent Claims (12, 13, 14, 15)
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16. A display device comprising:
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a pixel portion over a substrate, the pixel portion comprising; a liquid crystal; a first electrode; a semiconductor layer; an insulating film over the first electrode, the insulating film comprising a contact hole; a first conductive film over the insulating film, the first conductive film being electrically connected to the semiconductor layer; a second conductive film over the first conductive film; a third conductive film; and a fourth conductive film over the insulating film; and a terminal portion over the substrate, the terminal portion comprising; a first wiring; a second wiring over the first wiring; and a third wiring over the second wiring, wherein the semiconductor layer and the first electrode overlap with each other, wherein the third conductive film, the first electrode and the first wiring are formed by processing a same film, wherein the second wiring and the first conductive film are formed by processing a same film, wherein the third wiring and the second conductive film are formed by processing a same film, wherein the second wiring is electrically connected to the first wiring through the contact hole of the insulating film, wherein the third wiring is electrically connected to the second wiring, wherein the third conductive film extends in a direction such that the third conductive film and the second conductive film do not overlap with each other, wherein the fourth conductive film and the third conductive film overlap with each other, wherein the fourth conductive film and the first electrode overlap with each other, wherein the second conductive film and the fourth conductive film is configured to generate an electric field substantially parallel to a surface of the substrate, and wherein the liquid crystal is controlled by the electric field. - View Dependent Claims (17, 18, 19, 20)
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Specification