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Method and structure for adding mass with stress isolation to MEMS structures

  • US 8,710,597 B1
  • Filed: 04/19/2011
  • Issued: 04/29/2014
  • Est. Priority Date: 04/21/2010
  • Status: Active Grant
First Claim
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1. An apparatus disposed upon a substrate having a surface region, the apparatus comprising:

  • a thickness of silicon material coupled to at least one flexible element, the thickness of silicon material being configured to move in one or more spatial directions about the flexible element, the thickness of silicon material having at least one intermediate cavity having a cavity surface region, the at least one flexible element being coupled to at least one portion of the surface region and at least one portion of the cavity surface region, the at least one flexible element being spatially oriented to be substantially 45 degrees or substantially (pi/4) radians to the edges of a die;

    a plurality of recessed regions formed in respective spatial regions of the thickness of silicon material; and

    a plug material formed overlying each of the recessed regions.

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