Optical element and method of manufacturing optical element with each of first and second layers having a repetition structure

• US 8,715,516 B2
• Filed: 01/26/2011
• Issued: 05/06/2014
• Est. Priority Date: 02/28/2006
• Status: Expired due to Fees

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Terada, Junji, Nakai, Noriyuki, Arai, Kazuhiro, Sakamoto, Jun-ichi
• Primary Examiner(s): Ahmed, Shamim
• Application Number:
  US13/013,882
• Publication Number:
  US 20110114598A1
• Time in Patent Office: 1,196 Days
• Field of Search: 216/24, 216/41, 216/58, 216/83
• US Class Current: 216/24
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: G02B 1/002 made of materials engineered to provide properties not available in nature, e.g. metamaterials
• CPC Class Codes: G02B 27/42 Diffraction optics , i.e. systems including a diffractive element being designed for providing a diffractive effectG02B27/60 takes precedence
• CPC Class Codes: G02B 27/4261 having a diffractive element with major polarization dependent properties
• CPC Class Codes: G02B 5/1809 with pitch less than or comparable to the wavelength
• CPC Class Codes: G02B 6/126 using polarisation effects G02B6/1226 takes precedence
• CPC Class Codes: G02B 6/136 by etching

Abstract

An optical element having a three-dimensional structure which can function in a visible range and can improve adherence at a structural interface of the element, and a method of manufacturing the optical element. The optical element includes a substrate, and at least a first layer and a second layer on the substrate are manufactured such that each of the first layer and the second layer has a repetition structure of spaces and structural parts at a pitch equal to or less than a wavelength of visible light, and at an interface between the first layer and the second layer, overlapped structures are provided in which the repetition structure of the first layer and the repetition structure of the second layer overlap in a stack direction of the layers.

Claims

1. A method of manufacturing an optical element comprising a substrate, and a first layer and a second layer formed on the substrate, the method comprising the steps of:

forming the first layer on the substrate;

processing in the first layer a repetition structure comprised of spaces and structural parts, having a pitch equal to or less than a wavelength of visible light;

filling the spaces with a filling material;

etching the filling material to expose an upper portion of the repetition structure from the filling material, so that side surfaces of the repetition structure are exposed in a range of 3 nm or more and 20 nm or less from an upper surface of the repetition structure;

forming the second layer on the filling material and the upper portion of the repetition structure, so that the upper portion of the repetition structure of the first layer and a lower portion of the second layer engage each other in a range of 3 nm or more and 20 nm or less;

processing in the second layer a repetition structure comprised of spaces and structural parts, having a pitch equal to or less than a wavelength of visible light; and

removing the filling material.

2. A method of manufacturing an optical element according to claim 1, wherein the filling material is a material which can be ashed with oxygen.

3. A method of manufacturing an optical element according to claim 1, wherein the filling material is selected from the group consisting of a photoresist material, a Bottom Anti-Reflection Coating material, an acrylic resin and a polystyrene resin.

4. A method of manufacturing an optical element according to claim 1, wherein the step of filling the spaces with a filling material is carried out by using a coating technique selected from the group consisting of spin coating, spray coating and slit coating.

5. A method of manufacturing an optical element according to claim 1, wherein in the step of etching the filling material, dry etching is employed.

6. A method of manufacturing an optical element according to claim 1, wherein the step of forming the second layer on the filling material and the upper portion of the repetition structure is carried out by using a film forming technique selected from the group consisting of vapor deposition, sputtering and CVD.