Material for cleaning a substrate

• US 8,716,210 B2
• Filed: 11/17/2010
• Issued: 05/06/2014
• Est. Priority Date: 12/30/2005
• Status: Expired due to Fees

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Freer, Erik M., de Larios, John M., Mikhaylichenko, Katrina, Ravkin, Michael, Korolik, Mikhail, Redeker, Fred C.
• Primary Examiner(s): WEBB, GREGORY E
• Application Number:
  US12/948,613
• Publication Number:
  US 20110065621A1
• Time in Patent Office: 1,266 Days
• Field of Search: 510/175, 510/176
• US Class Current: 510/175
• CPC Class Codes: B08B 3/04 Cleaning involving contact with liquid
• CPC Class Codes: B08B 7/00 Cleaning by methods not provided for in a single other subclass or a single group in this subclass
• CPC Class Codes: C11D 17/0013 Liquid compositions with insoluble particles in suspension C11D17/0021, C11D17/0026, C11D17/003 take precedence
• CPC Class Codes: C11D 17/0017 Multi-phase liquid compositions
• CPC Class Codes: C11D 2111/22 Electronic devices, e.g. PCBs or semiconductors
• CPC Class Codes: G03F 1/82 Auxiliary processes, e.g. cleaning or inspecting
• CPC Class Codes: H01L 21/02052 Wet cleaning only H01L21/02085 takes precedence
• CPC Class Codes: H01L 21/02057 Cleaning during device manufacture
• CPC Class Codes: H01L 21/02096 only mechanical cleaning
• CPC Class Codes: H01L 21/67051 using mainly spraying means, e.g. nozzles

Abstract

Material for cleaning using a tri-state body are disclosed. A substrate having a particle deposited thereon is provided. A tri-state body that has a solid portion, liquid portion, and a gas portion is generated. A force is applied over the tri-state body to promulgate an interaction between the solid portion and the particle. The tri-state body is removed along with the particle from the surface of the substrate. The interaction between the solid portion and the particle causes the particle to be removed along with the tri-state body.

Claims

1. A cleaning material for preparing a substrate, the cleaning material comprising:

a liquid component;

a solid component defined by a plurality of solids that are dispersed within the liquid component, the solid component defining a plurality of hydrocarbon chains having a carboxyl group attached to one end of each of the plurality of hydrocarbon chains that are in suspension and are adverse to flocculation among the plurality of hydrocarbon chains; and

a gas component intermixed with the liquid component and the solid component, to define the cleaning material in a state to be applied to the substrate.

2. The cleaning material for preparing a substrate, as recited in claim 1, wherein the liquid component includes a base.

3. The cleaning material for preparing a substrate, as recited in claim 2, wherein the base is an aqueous base selected from the group consisting of ammonia hydroxide, potassium hydroxide, sodium hydroxide, and tetramethylammonium hydroxide.

4. The cleaning material for preparing a substrate, as recited in claim 1, wherein the solids act as a foam inhibitor.

5. The cleaning material for preparing a substrate, as recited in claim 1, wherein the solid component acts as a surfactant.

6. The cleaning material for preparing a substrate, as recited in claim 1, wherein the solid component is ionized by the liquid component to form the plurality of solids.

7. The cleaning material for preparing a substrate, as recited in claim 1, wherein the solid component has a carboxylic, sulfonic, or phosphonic acid portion.

8. A substrate cleaning solution, comprising:

a plurality of hydrocarbon chains, each of the plurality hydrocarbon chains having a carboxyl group, the plurality of hydrocarbon chains forming a solid component dispersed and in suspension within a liquid component; and

a gas component intermixed with the liquid component and the solid component, wherein the liquid component and the gas component define an encapsulating transport, the gas component further substantially filling the encapsulating transport, the encapsulating transport is combined with other encapsulating transports to define the substrate cleaning solution to be applied to a substrate.

9. The substrate cleaning solution, as recited in claim 8, wherein the solid component interacts with a particle on a surface of the substrate, the interaction is one of a connection or transfer of momentum between the particle and the solid component.

10. The substrate cleaning solution, as recited in claim 9, wherein if the interaction is the connection, the connection is one of adhesion or repulsion.

11. The substrate cleaning solution, as recited in claim 8, wherein the encapsulating transports apply a force that causes the solid component to come in proximity to a particle so as to facilitate the interaction with the solid component and the particle on the surface of the substrate.

12. The substrate cleaning solution, as recited in claim 8, wherein suspension of the solid component is activated through an application of a base to the substrate cleaning solution.

13. The substrate cleaning solution, as recited in claim 8, wherein the gas component is one of a gas mixture of, ozone (O3), oxygen (O2), hydrochloric acid (HCl), hydrofluoric acid (HF), nitrogen (N2), and argon (Ar);

ozone (O3) and nitrogen (N2);

ozone (O3) and argon (Ar);

ozone (O3), oxygen (O2) and nitrogen (N2);

ozone (O3), oxygen (O2) and argon (Ar);

ozone (O3), oxygen (O2), nitrogen (N2), and argon (Ar); and

oxygen (O2), argon (Ar) and nitrogen (N2).

14. The substrate cleaning solution, as recited in claim 8, wherein the solid component acts as a foam inhibitor.

15. A foam for cleaning a substrate, comprising:

a plurality of tri-state bodies, the tri-state bodies having a diameter smaller than a largest dimension of a particle on the substrate, each tri-state body including,

a liquid portion,

a solid portion defined by a surfactant in a substantial solid phase, the surfactant distributed in the liquid portion to define a plurality of hydrocarbon chains having a carboxyl group attached to one end of each of the plurality of hydrocarbon chains; and

a gas portion, wherein the liquid portion, the solid portion and the gas portion define the plurality of tri-state bodies.

16. The foam for cleaning a substrate, as recited in claim 15, wherein the liquid component includes a base.

17. The foam for cleaning a substrate, as recited in claim 16, wherein the base is an aqueous base selected from the group consisting of ammonia hydroxide, potassium hydroxide, sodium hydroxide, and tetramethylammonium hydroxide.

18. The foam for cleaning a substrate, as recited in claim 15, wherein adjacent tri-state bodies positioned over the tri-state body applies a force to promulgate an interaction between the solid portion and a particle on the substrate.