Methods of forming a dielectric cap layer on a metal gate structure
First Claim
Patent Images
1. A method, comprising:
- forming a replacement gate structure of a transistor, said replacement gate structure comprising at least a first metal layer, wherein forming said replacement gate structure comprises removing at least a sacrificial gate electrode and forming said replacement gate structure comprised of said first metal layer and a high-k gate insulation layer; and
forming a first metal-containing insulating material region in said first metal layer by performing a gas cluster ion beam process.
3 Assignments
0 Petitions
Accused Products
Abstract
Disclosed herein are various methods of forming metal-containing insulating material regions on a metal layer of a gate structure of a semiconductor device. In one example, the method includes forming a gate structure of a transistor, the gate structure comprising at least a first metal layer, and forming a first metal-containing insulating material region in the first metal layer by performing a gas cluster ion beam process using to implant gas molecules into the first metal layer.
-
Citations
23 Claims
-
1. A method, comprising:
-
forming a replacement gate structure of a transistor, said replacement gate structure comprising at least a first metal layer, wherein forming said replacement gate structure comprises removing at least a sacrificial gate electrode and forming said replacement gate structure comprised of said first metal layer and a high-k gate insulation layer; and forming a first metal-containing insulating material region in said first metal layer by performing a gas cluster ion beam process. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
-
9. A method, comprising:
-
forming a gate structure comprised of a first metal layer and a second metal layer; and forming a first metal-containing insulating material region in said first metal layer and a second metal-containing insulating material region in said second metal layer by performing at least one gas cluster ion beam process to direct gas molecules toward said first and second metal layers. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
-
-
20. A method, comprising:
-
forming a replacement gate structure comprised of a high-k gate insulation layer, a first metal layer and a second metal layer; and forming a first metal oxide region having a thickness of at least 0.5 nm in said first metal layer and a second metal oxide region having a thickness of at least 0.5 nm in said second metal layer by performing at least one gas cluster ion beam process to direct oxygen molecules toward said first and second metal layers, wherein said gas cluster ion beam process is performed at a temperature of less than 400°
C. and at an energy level of at least 3 keV. - View Dependent Claims (21, 22, 23)
-
Specification