Electrochromic devices having improved ion conducting layers
First Claim
1. A method of making an ion conductor layer comprising the steps of:
- a) depositing a first ion transport layer directly onto a substrate, said first ion transport layer comprising a material selected from the group consisting of silicon oxides, aluminum oxides, aluminum nitrides, niobium oxides, tantalum oxides, zirconium oxides, yttrium oxides, hafnium oxides, and mixtures thereof;
b) depositing a buffer layer directly onto said first ion transport layer; and
c) depositing a second ion transport layer directly onto said buffer layer, said second ion transport layer comprising a material selected from the group consisting of silicon oxides, aluminum oxides, aluminum nitrides, niobium oxides, tantalum oxides, zirconium oxides, yttrium oxides, hafnium oxides, and mixtures thereof.
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Accused Products
Abstract
An improved ion conductor layer for use in electrochromic devices and other applications is disclosed. The improved ion-conductor layer is comprised of at least two ion transport layers and a buffer layer, wherein the at least two ion transport layers and the buffer layer alternate within the ion conductor layer such that the ion transport layers are in communication with a first and a second electrode. Electrochromic devices utilizing such an improved ion conductor layer color more deeply by virtue of the increased voltage developed across the ion conductor layer prior to electronic breakdown while reducing the amount of electronic leakage. Also disclosed are methods of making electrochromic devices incorporating the improved ion conductor layer disclosed herein and methods of making ion conductors for use in other applications.
90 Citations
16 Claims
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1. A method of making an ion conductor layer comprising the steps of:
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a) depositing a first ion transport layer directly onto a substrate, said first ion transport layer comprising a material selected from the group consisting of silicon oxides, aluminum oxides, aluminum nitrides, niobium oxides, tantalum oxides, zirconium oxides, yttrium oxides, hafnium oxides, and mixtures thereof; b) depositing a buffer layer directly onto said first ion transport layer; and c) depositing a second ion transport layer directly onto said buffer layer, said second ion transport layer comprising a material selected from the group consisting of silicon oxides, aluminum oxides, aluminum nitrides, niobium oxides, tantalum oxides, zirconium oxides, yttrium oxides, hafnium oxides, and mixtures thereof. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of making an ion conductor layer comprising the steps of:
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a) depositing a first ion transport layer directly onto a substrate; b) depositing a buffer layer directly onto said first ion transport layer; and c) depositing a second ion transport layer directly onto said buffer layer; and wherein said first and second ion transport layers are deposited by means of a method selected from the group consisting of physical vapor deposition, intermediate frequency reactive sputtering, DC sputtering, wet chemical methods, laser ablation methods, sol-gel, metallo-organic decomposition, and magnetic sputtering; and wherein said buffer layer is deposited by means of a method selected from the group consisting of physical vapor deposition, intermediate frequency reactive sputtering, DC sputtering, sol-gel, metallo-organic decomposition, and magnetic sputtering. - View Dependent Claims (11, 12, 13, 14, 15, 16)
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Specification