Method of detecting specific defect, and system and program for detecting specific defect
First Claim
1. A method of detecting a specific defect, comprising the steps of:
- acquiring a light point map which is in-plane position information of a light point detected in a position corresponding to a defect on a surface of a wafer by irradiating the surface of the wafer with light;
specifying a determination region where a specific defect is expected to be formed and a reference region which is a given region other than the determination region in the light point map, and calculating a ratio of a light point density of the determination region to a light point density of the reference region; and
determining whether or not the specific defect is formed based on the calculated ratio.
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Abstract
The present invention provides a detection method which allows specific defects that would occur on a wafer surface to be detected more reliably. A method of detecting a specific defect of the present invention includes the steps of: acquiring a light point map which is in-plane position information of a light point detected in a position corresponding to a defect on a surface of a wafer by irradiating the surface of the wafer with light (S101); specifying a determination region where a specific defect is expected to be formed and a reference region which is a given region other than the determination region in the light point map, and calculating a ratio of a light point density of the determination region to a light point density of the reference region (S102); and determining whether or not the specific defect is formed based on the calculated ratio (S103).
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Citations
9 Claims
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1. A method of detecting a specific defect, comprising the steps of:
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acquiring a light point map which is in-plane position information of a light point detected in a position corresponding to a defect on a surface of a wafer by irradiating the surface of the wafer with light; specifying a determination region where a specific defect is expected to be formed and a reference region which is a given region other than the determination region in the light point map, and calculating a ratio of a light point density of the determination region to a light point density of the reference region; and determining whether or not the specific defect is formed based on the calculated ratio. - View Dependent Claims (2, 3, 4, 5)
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6. A system for detecting a specific defect, comprising:
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an acquisition unit for acquiring a light point map which is in-plane position information of a light point detected in a position corresponding to a defect on a surface of a wafer by irradiating the surface of the wafer with light; a storage unit for storing data on a determination region where a specific defect is expected to be formed and a reference region which is a given region other than the determination region in the light point map; a calculation unit for calculating a ratio of a light point density of the determination region to a light point density of the reference region in the light point map; and a determination unit for determining whether or not the specific defect is formed based on the calculated ratio.
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7. A method of detecting a specific defect, comprising the steps of:
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detecting a defect on a surface of a wafer as a light point by irradiating the surface of the wafer with light; creating a light point map which is in-plane position information of the detected light point; specifying a determination region where a specific defect is expected to be formed and a reference region which is a given region other than the determination region in the light point map, and calculating a ratio of a light point density of the determination region to a light point density of the reference region; and determining whether or not the specific defect is formed based on the calculated ratio. - View Dependent Claims (8)
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9. A system for detecting a specific defect, comprising:
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a detection unit for detecting a defect on a surface of a wafer as a light point by irradiating the surface of the wafer with light; an analysis unit for creating a light point map which is in-plane position information of the light point on the surface of the wafer based on output from the detection unit; a storage unit for storing data on a determination region where a specific defect is expected to be formed and a reference region which is a given region other than the determination region in the light point map; a calculation unit for calculating a ratio of a light point density of the determination region to a light point density of the reference region in the light point map; and a determination unit for determining whether or not the specific defect is formed based on the calculated ratio.
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Specification