Method and system for computing fourier series coefficients for mask layouts using FFT

• US 8,739,081 B2
• Filed: 02/12/2013
• Issued: 05/27/2014
• Est. Priority Date: 04/30/2010
• Status: Expired due to Fees

• Current Assignee: GlobalFoundries, Inc.
• Original Assignee: International Business Machines Corporation
• Inventors: Hurley, Paul T., Kryszczuk, Krzysztof, Scheibler, Robin, Schipani, Davide
• Primary Examiner(s): Do, Thuan
• Assistant Examiner(s): DIMYAN, MAGID Y
• Application Number:
  US13/765,304
• Publication Number:
  US 20130152025A1
• Time in Patent Office: 469 Days
• Field of Search: 716/50, 716/54, 716/55
• US Class Current: 716/54
• CPC Class Codes: G03F 1/70 Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
• CPC Class Codes: G06F 30/392 Floor-planning or layout, e.g. partitioning or placement

Abstract

A method and system for computing Fourier coefficients for a Fourier representation of a mask transmission function for a lithography mask. The method includes: sampling a polygon of a mask pattern of the lithography mask to obtain an indicator function which defines the polygon, performing a Fourier Transform on the indicator function to obtain preliminary Fourier coefficients, and scaling the Fourier coefficients for the Fourier representation of the mask transmission function, where at least one of the steps is carried out using a computer device.

Claims

1. A method for computing a Fourier series representation of a mask transmission function for a print simulation of a lithography mask used in a manufacture of lithography masks, the method comprising the steps of:

sampling at least one polygon of a mask pattern of the lithography mask to obtain an indicator function defining the at least one polygon using a number of pixels;

performing a Discrete Fourier Transform (DFT) on the indicator function to obtain coefficients of the DFT; and

scaling, using a computer device, the coefficients of the DFT to obtain exact coefficients of a Fourier series that represents the mask transmission function,

wherein the mask pattern comprises at least one tile, wherein the at least one tile comprises the at least one polygon.

2. The method according to claim 1, such that the at least one polygon is fully contained in the at least one tile, wherein a pixel size is defined as a pixel size in at least one dimension.

3. The method according to claim 2, wherein the pixel size in the at least one dimension is obtained as a greatest common divider of a tile size in the at least one dimension and a coordinates of vertices of the at least one polygon in the at least one dimension.

4. The method according to claim 1, wherein a pixel size in at least one dimension is obtained as a greatest common divider of a tile size in the at least one dimension and coordinates of vertices of the at least one polygon in at least one dimension.

5. The method according to claim 1, wherein the DFT is a two-dimensional Fast Fourier Transform.

6. The method according to claim 1, wherein the sampling utilizes a minimal number of pixels possible.

7. The method according to claim 1, further comprising the step of using the exact coefficients of the Fourier series to obtain the print simulation of the lithography mask.

8. The method according to claim 1, further comprising the step of using the exact coefficients of the Fourier series for manufacture of at least one of integrated circuits and lithography masks.

9. The method according to claim 1, wherein the indicator function represents the at least one polygon by a function of coordinates within the at least one tile, wherein the indicator function defines whether a point is within the at least one polygon, wherein each the coordinate corresponds to a pixel having a pixel size in at least one dimension.

10. The method according to claim 9, wherein the step of scaling the coefficients of the DFT is performed by multiplying the coefficients of the DFT by scaling factors, wherein the scaling factors are determined according to a scaling factor function depending on the coordinates.

11. The method according to claim 10, wherein the scaling factors are provided using a lookup table.

12. A system, comprising:

means for sampling at least one polygon of a mask pattern of a lithography mask to obtain an indicator function defining the at least one polygon using a number of pixels;

a computer device including means for performing a Discrete Fourier Transform operation on the indicator function to obtain coefficients of a Discrete Fourier Transform; and

means for scaling the coefficients of the Discrete Fourier Transform to obtain exact coefficients of a Fourier series that represents a mask transmission function for the lithography mask,

wherein the mask pattern comprises at least one tile, wherein the at least one tile comprises the at least one polygon.

13. The system according to claim 12, such that the at least one polygon is fully contained in the at least one tile, wherein a pixel size is defined as a pixel size in at least one dimension.

14. The system according to claim 13, wherein the pixel size in the at least one dimension is obtained as a greatest common divider of a tile size in the at least one dimension and coordinates of vertices of the at least one polygon in the at least one dimension.

15. The system according to claim 12, wherein a pixel size in at least one dimension is obtained as a greatest common divider of a tile size in the at least one dimension and coordinates of vertices of the at least one polygon in at least one dimension.

16. The system according to claim 12, wherein the Discrete Fourier Transform is a two-dimensional Fast Fourier Transform.

17. The system according to claim 12, wherein the sampling utilizes a minimal number of pixels possible.

20. The system according to claim 15, wherein the exact coefficients of the Fourier series are used to obtain a print simulation of the lithography mask, and wherein the print simulation is used to manufacture at least one of an integrated circuit and a lithography mask.

18. A method, comprising the steps of:

sampling at least one polygon of a mask pattern of a lithography mask to obtain an indicator function defining the at least one polygon using a number of pixels;

performing a discrete Fourier transformation on the indicator function to obtain coefficients of a discrete Fourier Transform; and

scaling, using a computer device, the coefficients of the discrete Fourier Transform to obtain exact coefficients of a continuous Fourier series that represents a mask transmission function, wherein the mask pattern comprises at least one tile, wherein the at least one tile comprises the at least one polygon;

using the continuous Fourier series to obtain a print simulation of the lithography mask; and

using the print simulation for manufacturing at least one of an integrated circuit and a lithography mask.

19. The method according to claim 18, such that the at least one polygon is fully contained in the at least one tile, wherein a pixel size is defined as a pixel size in at least one dimension.