Semiconductor component and method for producing a semiconductor component

• US 8,742,539 B2
• Filed: 07/27/2012
• Issued: 06/03/2014
• Est. Priority Date: 07/27/2012
• Status: Active Grant

• Current Assignee: Infineon Technologies Austria Ag (Infineon Technologies AG)
• Original Assignee: Infineon Technologies Austria Ag (Infineon Technologies AG)
• Inventors: Weyers, Joachim, Hirler, Franz, Mauder, Anton, Bueyuektas, Kevni
• Primary Examiner(s): FOURSON III, GEORGE R
• Application Number:
  US13/560,626
• Publication Number:
  US 20140027879A1
• Time in Patent Office: 676 Days
• Field of Search: 257/379, 257/516, 257/531, 257/E21.022, 438/381, 438/FOR.220
• US Class Current: 257/531
• CPC Class Codes: H01L 28/10 Inductors
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

One aspect of the invention relates to a semiconductor component with a semiconductor body with a top side and with a bottom side. A first coil that is monolithically integrated with the semiconductor body is arranged distant from the bottom side and comprises N first windings, wherein N≧1. The first coil has a first coil axis that extends in a direction different from a surface normal of the bottom side.

Claims

1. A semiconductor component comprising:

a semiconductor body comprising a top side and a bottom side, the top side and the bottom side being sides of the semiconductor body with the largest areas; and

a first coil that

is monolithically integrated with the semiconductor body;

comprises N first windings wherein N≧

1;

is arranged distant from the bottom side; and

comprises a first coil axis that extends in a direction different from a surface normal of the bottom side.

2. The semiconductor component as claimed in claim 1 wherein the first coil axis runs parallel to the bottom side.

3. The semiconductor component as claimed in claim 1 wherein a continuous layer of semiconductor material is arranged between the first coil and the bottom side and wherein each straight line that runs perpendicular to the bottom side and that intersects a first winding also intersects the continuous layer.

4. The semiconductor component as claimed in claim 1 wherein

the semiconductor body comprises a first trench comprising a continuous surface that comprises doped or undoped semiconductor material;

and

the first coil is at least partly arranged in the first trench.

5. The semiconductor component as claimed in claim 1 wherein

the first coil comprises at least two first windings,

wherein at least two of the first windings comprise the same shape and size.

6. The semiconductor component as claimed in claim 1 wherein each of the first windings comprises a partial winding.

7. The semiconductor component as claimed in claim 6 wherein

each of the partial windings comprises two first vertical sections and a first connection section that electrically connects the first vertical sections, wherein the two first vertical sections each extend from the first connection section toward the top side;

and

the two first vertical sections comprise, in each case, an orientation non-parallel relative to the bottom side.

8. The semiconductor component as claimed in claim 6 wherein each of the partial windings comprises two first sections that include an angle between −

120° and

+120°

.

9. The semiconductor component as claimed in claim 6 wherein each of the partial windings comprises one of the following materials:

undoped polycrystalline semiconductor material;

doped polycrystalline semiconductor material;

a silicide;

a metal;

a combination of a silicide, and a doped or undoped semiconductor material.

10. The semiconductor component as claimed in claim 1 wherein:

the first coil comprises two first windings;

each of the first windings comprises two first vertical sections and a first connection section that electrically connects the first vertical sections;

the two first vertical sections extend from the first connection section toward the top side; and

a first conductor path is arranged on the top side and electrically conductively connects the first windings.

11. The semiconductor component as claimed in claim 10 wherein the first conductor path is arranged on the top side.

12. The semiconductor component as claimed in claim 10 wherein the first conductor path consists of or comprises one of the following materials:

undoped polycrystalline semiconductor material;

doped polycrystalline semiconductor material;

a silicide;

a metal;

a combination of a silicide and a doped or undoped semiconductor material.

13. The semiconductor component as claimed in claim 1 comprising a first dielectric that electrically insulates the first coil from the semiconductor body.

14. The semiconductor component as claimed in claim 1 comprising a magnetic core that is arranged inside the first coil.

15. The semiconductor component as claimed in claim 1 comprising a second coil that is monolithically integrated with the semiconductor body that comprises K second windings, wherein K≧

1, said second coil being galvanically insulated from the first coil.

16. The semiconductor component as claimed in claim 15 comprising a magnetic core that is arranged inside both the first coil and the second coil.

17. The semiconductor component as claimed in claim 15 wherein the second coil is arranged outside and adjacent to the first coil.

18. The semiconductor component as claimed in claim 15 wherein the first coil surrounds a first interior zone and the second coil surrounds a second interior zone that overlaps the first interior zone.

19. The semiconductor component as claimed in claim 1 comprising an active semiconductor region, wherein the first coil forms a detector that is able to detect the electromagnetic induction of a magnetic field caused by an electric current through the active semiconductor region.

20. The semiconductor component as claimed in claim 1 comprising a controllable semiconductor device monolithically integrated with the semiconductor body the controllable semiconductor device comprising a control electrode;

a signal path formed between the first coil and the control electrode for transmitting an electrical signal from the first coil to the control electrode.

21. The semiconductor component as claimed in claim 1 wherein the first coil extends, in a direction perpendicular to the bottom side, at least 5 μ

m into the semiconductor body.

22. A method for producing a semiconductor component with a coil that is monolithically integrated with a semiconductor body, the method comprising:

providing a semiconductor body with a top side and with a bottom side;

producing a first trench that extends from the top side into the semiconductor body;

producing, simultaneously an electrically conductive first partial winding arranged on a surface of the first trench and comprising two top ends, and an electrically conductive second partial winding arranged on the surface of the first trench and comprising two top ends, wherein the first partial winding is electrically insulated from the second partial winding and

producing a conductor path on the top side, the conductor path electrically conductively connecting one of the first ends of the first partial winding and one of the first ends of the second partial winding.

23. The method as claimed in claim 22 comprising:

producing the first and second partial windings by depositing a conductive material on the surface of the first trench; and

structuring the conductive material thereby obtaining the first and second partial windings.

24. The method as claimed in claim 22 comprising:

producing the first and second partial windings by

depositing a seed layer on the surface of the first trench;

forming a structured mask layer comprising openings on the seed layer;

electroplating the seed layer;

removing the structured mask layer;

removing the seed layer in sections where the seed layer is not electroplated, thereby obtaining the the first and second partial windings;

filling the first trench at least partly with a dielectric; and

depositing the first conductor path on the dielectric.

25. The method as claimed in claim 22 comprising:

producing the first and second partial windings by

producing a structured seed layer on the surface of the first trench, the structured seed layer comprising sections that are arranged distant from one another;

electroless plating the sections of the seed layer, thereby obtaining the first and second partial windings, wherein the first and second partial windings are electrically insulated from one another; and

filling the first trench at least partly with a dielectric;

depositing the first conductor path on the dielectric.

26. The method as claimed in claim 22 comprising:

producing a structured layer of doped or undoped polycrystalline silicon on the electrically isolated or not isolated surface of the first trench, the structured layer comprising sections that are arranged distant from one another;

depositing a metal layer over the structured layer of the doped or undoped polycrystalline silicon;

annealing the metal layer and the structured layer of the doped or undoped polycrystalline silicon, thereby forming;

a silicide from the silicon and from a metal of the metal layer; and

the first and second partial windings;

removing the remaining non-silicided metal layer at least partly such that the first and second partial windings are electrically insulated from one another;

filling the first trench at least partly with a dielectric; and

depositing the first conductor path on the dielectric.

27. The method as claimed in claim 22 comprising:

producing a controllable semiconductor device monolithically integrated with the semiconductor body, the controllable semiconductor device comprising a control electrode arranged in a second trench or on the top side, wherein

at least a part of the control electrode, at least a part of the first partial winding and at least a part of the second partial winding is formed during a common deposition process of an electrically conductive material.