Passive power distribution for multiple electrode inductive plasma source
First Claim
1. A method for controlling a spatial distribution of plasma in a processing chamber that includes a primary inductor and N secondary inductors, comprising:
- exciting the plasma in the processing chamber with the primary inductor;
inductively coupling the primary inductor to each of N secondary inductors through the plasma, wherein N is equal to or greater than one; and
terminating each of the N secondary inductors such that substantially all current that passes through each of the N secondary inductors results from mutual inductance through the plasma with the primary inductor, the current through each of the N secondary inductors affecting the spatial distribution of the plasma.
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Accused Products
Abstract
Systems, methods, and Apparatus for controlling the spatial distribution of a plasma in a processing chamber are disclosed. An exemplary system includes a primary inductor disposed to excite the plasma when power is actively applied to the primary inductor; at least one secondary inductor located in proximity to the primary inductor such that substantially all current that passes through the secondary inductor results from mutual inductance through the plasma with the primary inductor. In addition, at least one terminating element is coupled to the at least one secondary inductor, the at least one terminating element affecting the current through the at least one secondary inductor so as to affect the spatial distribution of the plasma.
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Citations
12 Claims
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1. A method for controlling a spatial distribution of plasma in a processing chamber that includes a primary inductor and N secondary inductors, comprising:
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exciting the plasma in the processing chamber with the primary inductor; inductively coupling the primary inductor to each of N secondary inductors through the plasma, wherein N is equal to or greater than one; and terminating each of the N secondary inductors such that substantially all current that passes through each of the N secondary inductors results from mutual inductance through the plasma with the primary inductor, the current through each of the N secondary inductors affecting the spatial distribution of the plasma. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A system for controlling a spatial distribution of plasma in a processing chamber that includes a primary inductor and N secondary inductors, comprising:
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means for exciting the plasma in the processing chamber with the primary inductor; means for inductively coupling the primary inductor to each of N secondary inductors through the plasma, wherein N is equal to or greater than one; and means for terminating each of the N secondary inductors such that substantially all current that passes through each of the N secondary inductors results from mutual inductance through the plasma with the primary inductor, the current through each of the N secondary inductors affecting the spatial distribution of the plasma. - View Dependent Claims (8, 9, 10, 11, 12)
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Specification