Apparatuses and methods for atomic layer deposition
First Claim
1. An assembly for a vapor deposition process, comprising:
- a showerhead plate having a top surface, a bottom surface, and a radius extending from the center to the outer edge of the showerhead plate, wherein the showerhead plate has;
a first plurality of holes that extend through the showerhead plate and are in fluid communication with the top surface and the bottom surface, and are positioned within a first zone extending from the center of the showerhead plate to about 25% of the radius of the showerhead plate, wherein each hole of the first plurality has a diameter of less than 0.1 inches, and the diameter of holes of the first plurality increases radially extending from the center of the showerhead plate; and
a second plurality of holes that extend through the showerhead plate and are in fluid communication with the top surface and the bottom surface, and are positioned within a second zone extending from about 25% of the radius of the showerhead plate to about the outer edge of the showerhead plate, wherein each hole of the second plurality has a diameter of greater than 0.1 inches, and the diameter of holes of the second plurality increases radially extending towards the outer edge of the showerhead plate;
an inlet manifold assembly disposed above the showerhead plate, the inlet manifold assembly having an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further has injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel, wherein the centralized channel is in fluid communication with the first plurality of holes and the second plurality of holes; and
a water box contacting the inlet manifold assembly and the showerhead plate.
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Accused Products
Abstract
Embodiments of the invention provide apparatuses and methods for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In some embodiments, a PE-ALD chamber is provided which includes a chamber lid assembly coupled with a chamber body having a substrate support therein. In one embodiment, the chamber lid assembly has an inlet manifold assembly containing an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further contains injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel. The chamber lid assembly further contains a showerhead assembly disposed below the inlet manifold assembly, a water box disposed between the inlet manifold assembly and the showerhead assembly, and a remote plasma system (RPS) disposed above and coupled with the inlet manifold assembly, and in fluid communication with the centralized channel.
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Citations
15 Claims
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1. An assembly for a vapor deposition process, comprising:
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a showerhead plate having a top surface, a bottom surface, and a radius extending from the center to the outer edge of the showerhead plate, wherein the showerhead plate has; a first plurality of holes that extend through the showerhead plate and are in fluid communication with the top surface and the bottom surface, and are positioned within a first zone extending from the center of the showerhead plate to about 25% of the radius of the showerhead plate, wherein each hole of the first plurality has a diameter of less than 0.1 inches, and the diameter of holes of the first plurality increases radially extending from the center of the showerhead plate; and a second plurality of holes that extend through the showerhead plate and are in fluid communication with the top surface and the bottom surface, and are positioned within a second zone extending from about 25% of the radius of the showerhead plate to about the outer edge of the showerhead plate, wherein each hole of the second plurality has a diameter of greater than 0.1 inches, and the diameter of holes of the second plurality increases radially extending towards the outer edge of the showerhead plate; an inlet manifold assembly disposed above the showerhead plate, the inlet manifold assembly having an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further has injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel, wherein the centralized channel is in fluid communication with the first plurality of holes and the second plurality of holes; and a water box contacting the inlet manifold assembly and the showerhead plate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. An assembly for a vapor deposition process, comprising:
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a showerhead plate comprising an aluminum alloy and having a top surface, a bottom surface, and a radius extending from the center to the outer edge of the showerhead plate, wherein the showerhead plate has; a first plurality of holes that extend through the showerhead plate and are in fluid communication with the top surface and the bottom surface, and are disposed within a first zone which extends from the center of the showerhead plate to a second zone circumscribing the first zone, wherein each hole of the first plurality has a diameter of less than 0.1 inches, and the diameter of holes of the first plurality increases radially extending from the center of the showerhead plate; and a second plurality of holes that extend through the showerhead plate and are in fluid communication with the top surface and the bottom surface, and are disposed within the second zone which extends from the first zone to about the outer edge of the showerhead plate, wherein each hole of the second plurality has a diameter of greater than 0.1 inches, and the diameter of holes of the second plurality increases radially extending towards the outer edge of the showerhead plate; an inlet manifold assembly disposed above the showerhead plate, the inlet manifold assembly having an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further has injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel, wherein the centralized channel is in fluid communication with the first plurality of holes and the second plurality of holes; and a water box contacting the inlet manifold assembly and the showerhead plate. - View Dependent Claims (11, 12, 13, 14, 15)
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Specification