System and method for increasing the depth of focus of the human eye

• US 8,752,958 B2
• Filed: 12/03/2012
• Issued: 06/17/2014
• Est. Priority Date: 03/01/1999
• Status: Expired due to Fees

• Current Assignee: Boston Innovative Optics Incorporated
• Original Assignee: Boston Innovative Optics Incorporated
• Inventors: Miller, David, Blanco, Ernesto
• Primary Examiner(s): Willse, David H
• Assistant Examiner(s): BLANCO, JAVIER G
• Application Number:
  US13/692,864
• Publication Number:
  US 20130131795A1
• Time in Patent Office: 561 Days
• Field of Search: 623 511- 513, 351/159.01, 351/159.09, 351/159.6, 351/159.63
• US Class Current: 351/159.6
• CPC Class Codes: A61F 2/145 Corneal inlays, onlays, or lenses for refractive correction
• CPC Class Codes: A61F 2/15 Implant having one or more holes, e.g. for nutrient transport, for facilitating handling
• CPC Class Codes: A61F 2/1613 having special lens configurations, e.g. multipart lenses; having particular optical properties, e.g. pseudo-accommodative lenses, lenses having aberration corrections, diffractive lenses, lenses for variably absorbing electromagnetic radiation, lenses having variable focus
• CPC Class Codes: A61F 2/1659 having variable absorption coefficient for electromagnetic radiation, e.g. photochromic lenses
• CPC Class Codes: A61F 2002/1699 Additional features not otherwise provided for
• CPC Class Codes: A61F 2250/0098 radio-opaque, e.g. radio-opaque markers
• CPC Class Codes: B01D 2323/34 Use of radiation
• CPC Class Codes: G02C 2202/20 Diffractive and Fresnel lenses or lens portions
• CPC Class Codes: G02C 2202/22 Correction of higher order and chromatic aberrations, wave front measurement and calculation
• CPC Class Codes: G02C 7/04 Contact lenses for the eyes disinfection or sterilisation of contact lenses A61L12/00
• CPC Class Codes: G02C 7/042 Simultaneous type
• CPC Class Codes: G02C 7/044 Annular configuration, e.g. pupil tuned
• CPC Class Codes: G02C 7/046 Contact lenses having an iris pattern
• CPC Class Codes: G02C 7/12 Polarisers
• CPC Class Codes: G02C 7/16 Shades; shields; Obturators, e.g. with pinhole, with slot G02C5/003 takes precedence
• CPC Class Codes: G02C 7/165 with stenopaeic apertures

Abstract

A method and apparatus for increasing the depth of focus of the human eye is comprised of a lens body, an optic in the lens body configured to produce light interference, and a pinhole-like optical aperture substantially in the center of the optic. The optic may be configured to produce light scattering or composed of a light reflective material. Alternatively, the optic may increase the depth of focus via a combination of light interference, light scattering, light reflection and/or light absorption. The optic may also be configured as a series of concentric circles, a weave, a pattern of particles, or a pattern of curvatures. One method involves screening a patient for an ophthalmic lens using a pinhole screening device in the lens to increase the patient'"'"'s depth of focus. Another method comprises surgically implanting a mask in the patient'"'"'s eye to increase the depth of focus.

Claims

1. An implantable ophthalmic mask comprising:

a centrally located pinhole-like optical aperture configured to increase depth of focus;

a structure surrounding the aperture, the structure having varying degrees of opacity, each of the varying degrees of opacity preventing transmission of a substantial portion of visible light incident on the structure, the structure comprising a plurality of small holes disposed within an optically active zone when implanted, each of the plurality of small holes having a cross-sectional area that is smaller than the cross-sectional area of the central aperture, and

a lens body, wherein the mask is positioned between an anterior surface and a posterior surface of the lens body.

2. The implantable ophthalmic mask of claim 1, wherein the mask is configured to produce light interference.

3. The implantable ophthalmic mask of claim 2, wherein the structure is configured to minimize transmission of light by producing negative interference of light directed toward the structure.

4. The implantable ophthalmic mask of claim 3, wherein the mask is configured to transmit light by producing positive interference of light directed toward the mask.

5. The implantable ophthalmic mask of claim 1, wherein the mask is configured to produce light scattering.

6. The implantable ophthalmic mask of claim 1, wherein the mask is configured to block visual aberrations.

7. The implantable ophthalmic mask of claim 1, wherein each of the varying degrees of opacity prevents transmission of between 85% and 100% of visible light.

8. An ophthalmic device comprising:

an anterior lens surface;

a posterior lens surface; and

a mask comprising;

a centrally located pinhole-like optical aperture configured to increase depth of focus;

a structure surrounding the aperture, the structure having varying degrees of opacity, each of the varying degrees of opacity preventing transmission of a substantial portion of visible light incident on the structure, the structure comprising a plurality of small holes disposed within an optically active zone when implanted, each of the plurality of small holes having a cross-sectional area that is smaller than the cross-sectional area of the central aperture, and

wherein the mask is positioned in a lens body of the ophthalmic device to be concentric with a patient'"'"'s pupil when implanted.

9. The ophthalmic device of claim 8, wherein an optical power is provided for vision correction.

10. The ophthalmic device of claim 9, wherein the optical power is provided at least in an area outside the mask.

11. The ophthalmic device of claim 9, wherein the optical power is provided at least in the aperture.

12. The ophthalmic device of claim 11, wherein the optical power provides for near vision.

13. The ophthalmic device of claim 8, wherein the mask is located near the center of a lens body.

14. The ophthalmic device of claim 8, wherein the anterior lens surface is an anterior surface of an intraocular lens and wherein the posterior lens surface is a posterior surface of an intraocular lens.

15. An ophthalmic device comprising:

a lens body having an optical power for vision correction;

a mask comprising;

a centrally located pinhole aperture configured to increase depth of focus; and

a structure comprising a plurality of small holes disposed about the pinhole aperture, each of the plurality of small holes having a cross-sectional area that is smaller than the cross-sectional area of the central aperture, the structure comprising a material configured to prevent transmission of a substantial portion of light incident on an anterior surface of the mask, wherein at least one of said small holes is positioned closer to an outer periphery of the central aperture than an outer periphery of the lens body.

16. An ophthalmic lens, comprising:

a body having an optical power for vision correction;

a centrally located pinhole aperture; and

a structure surrounding a plurality of small holes disposed about the aperture, each of the plurality of small holes having a cross-sectional area that is smaller than the cross-sectional area of the central aperture, the structure configured to prevent transmission of a substantial portion of light incident on an anterior surface of the structure, wherein at least three of the small holes are intersected by a line intersecting a central axis of the central aperture.