Generation of combinatorial patterns by deliberate tilting of a polymer-pen array
First Claim
1. A method of forming a pattern comprising pattern elements with a plurality of sizes on a substrate surface with a tilted pen array, comprising:
- choosing a tilt geometry for a pen array with respect to a substrate surface,the tilt geometry being in reference to a substrate surface and comprising a first angle of the pen array with respect to a first axis of the substrate and a second angle of the pen array with respect to a second axis of the substrate, the first and second axes being parallel to the substrate surface and perpendicular to one another, at least one of the first and second angles being non-zero, wherein a leveled position with respect to the substrate surface comprises first and second angles both equaling 0°
, andthe pen array comprising a plurality of tips fixed to a common substrate layer, the plurality of tips and the common substrate layer being formed from an elastomeric polymer or elastomeric gel polymer, and the tips having a radius of curvature of less than 1 μ
m;
inducing the tilt geometry between the pen array and the substrate surface by the chosen first and second angles; and
forming a pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes.
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Accused Products
Abstract
The disclosure relates to a method of forming a pattern having pattern elements with a plurality of sizes on a substrate surface with a tilted pen array that includes choosing a tilt geometry for a pen array with respect to a substrate, inducing the tilt geometry between the pen array and the substrate surface, and forming a pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes. For example, the tilt geometry is in reference to the substrate surface and comprises a first angle with respect to a first axis of the substrate and a second angle with respect to a second axis of the substrate, the second axis being perpendicular to the first axis, and at least one of the first and second angles being non-zero.
24 Citations
24 Claims
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1. A method of forming a pattern comprising pattern elements with a plurality of sizes on a substrate surface with a tilted pen array, comprising:
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choosing a tilt geometry for a pen array with respect to a substrate surface, the tilt geometry being in reference to a substrate surface and comprising a first angle of the pen array with respect to a first axis of the substrate and a second angle of the pen array with respect to a second axis of the substrate, the first and second axes being parallel to the substrate surface and perpendicular to one another, at least one of the first and second angles being non-zero, wherein a leveled position with respect to the substrate surface comprises first and second angles both equaling 0°
, andthe pen array comprising a plurality of tips fixed to a common substrate layer, the plurality of tips and the common substrate layer being formed from an elastomeric polymer or elastomeric gel polymer, and the tips having a radius of curvature of less than 1 μ
m;inducing the tilt geometry between the pen array and the substrate surface by the chosen first and second angles; and forming a pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes. - View Dependent Claims (4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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2. A method of forming a pattern comprising pattern elements with a plurality of sizes on a substrate surface with a tilted pen array, comprising:
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choosing a range of pattern element sizes for a pattern to be formed on a substrate surface; choosing, based on a theoretical model, a tilt geometry for a pen array with respect to the substrate surface to achieve the chosen range of pattern element sizes, the tilt geometry being in reference to a substrate surface and comprising a first angle of the pen array with respect to a first axis of the substrate and a second angle of the pen array with respect to a second axis of the substrate, the first and second axes being parallel to the substrate surface and perpendicular to one another, at least one of the first and second angles being non-zero, wherein a leveled position with respect to the substrate surface comprises first and second angles both equaling 0°
, andthe pen array comprising a plurality of tips fixed to a common substrate layer, the plurality of tips and the common substrate layer being formed from an elastomeric polymer or elastomeric gel polymer, and the tips having a radius of curvature of less than 1 μ
m;inducing the tilt geometry between the pen array and the substrate surface by the chosen first and second angles; and forming the pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes and comprises the chosen range of pattern element sizes. - View Dependent Claims (3)
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Specification