Systems and methods of laser texturing and crystallization of material surfaces
First Claim
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1. A method for micro texturing a surface of a material, comprising:
- providing a gaseous or vacuum environment in an area around the surface of the material;
irradiating a portion of the surface with short laser pulses;
moving at least one of the surface or a laser beam relative to each other to allow the short laser pulses to irradiate the surface;
wherein the method produces a periodic array of micro pillars, semi-periodic array of micro pillars, or a non-periodic array of micro pillars on the surface, resulting in changes in properties of the surface wherein nanospikes are produced atop the micro pillars;
wherein said material comprises a semiconductor;
wherein the laser pulses have a duration of between about one femtosecond and about 999 picoseconds; and
wherein the laser pulses have a wavelength of between about 400 and about 1,600 nm.
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Abstract
The surface of a material is textured and crystallized in a single step by exposing the surface to pulses from an ultrafast laser. The laser treatment causes pillars to form on the treated surface. These pillars provide for greater light absorption. The crystallization of the material provides for higher electric conductivity and changes in optical properties of the material. The method may be performed in a gaseous environment, so that laser assisted chemical etching will aid in the texturing of the surface. This method may be used on various material surfaces, such as semiconductors, metals, ceramics, polymers, and glasses.
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Citations
71 Claims
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1. A method for micro texturing a surface of a material, comprising:
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providing a gaseous or vacuum environment in an area around the surface of the material; irradiating a portion of the surface with short laser pulses; moving at least one of the surface or a laser beam relative to each other to allow the short laser pulses to irradiate the surface; wherein the method produces a periodic array of micro pillars, semi-periodic array of micro pillars, or a non-periodic array of micro pillars on the surface, resulting in changes in properties of the surface wherein nanospikes are produced atop the micro pillars; wherein said material comprises a semiconductor; wherein the laser pulses have a duration of between about one femtosecond and about 999 picoseconds; and wherein the laser pulses have a wavelength of between about 400 and about 1,600 nm. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 55, 56, 57, 58, 59, 60, 61, 62)
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24. A method for micro texturing a semiconductor surface, comprising:
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irradiating a portion of the semiconductor surface with short laser pulses; moving at least one of the surface and a laser beam relative to each other to allow the short laser pulses to irradiate another portion of the surface; wherein the method produces micro pillars on the surface, resulting in changes in properties of the surface;
wherein nanospikes are produced atop the micro pillars;wherein the laser pulses have a duration of between about one femtosecond and about 999 picoseconds; and wherein the laser pulses have a wavelength of between about 400 and about 1,600 nm. - View Dependent Claims (25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 54, 63, 64)
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65. A system for micro texturing a surface of a material comprising:
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a chamber in an area around the surface of the material to provide a gaseous or vacuum environment; an energy source providing a power supply for a radiation source, said radiation source for irradiating at least a portion of the surface; a base for retaining said surface, said base or radiation source adapted to move relative to one another for irradiation wherein a periodic array of micro pillars or a non-periodic array of micro pillars on the surface, resulting in changes in properties of the surface;
wherein nanospikes are produced atop the micro pillars;wherein said material comprises semiconductor; wherein said irradiation has a duration of between about one femtosecond and about 999 picoseconds; and wherein said laser pulses have a wavelength of between about 400 nanometers and about 1,600 nanometers. - View Dependent Claims (66, 67, 68, 69)
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70. A system for micro texturing a surface of a material comprising:
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a chamber in an area around the surface of the material to provide a gaseous or vacuum environment; an energy source providing a power supply for a radiation source, said radiation source for irradiating at least a portion of the surface, wherein said surface is provided in a gaseous or vacuum environment; wherein said material comprises a semiconductor; a base for retaining said surface, said base or radiation source adapted to move relative to one another for irradiation wherein micro pillars are produced on said portion of the surface, resulting in changes in properties of the surface;
wherein nanospikes are produced atop the micro pillars;wherein said irradiation has a duration of between about one femtosecond and 999 picoseconds; and wherein said laser pulses have a wavelength of between about 400 and about 1,600 nanometers.
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71. A method for micro texturing a surface of a material, comprising:
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providing a gaseous or vacuum environment in an area around the surface of the material; irradiating a portion of the surface with energy pulses; moving at least one of the surface or an energy beam relative to each other to allow the energy pulses to irradiate the surface; wherein the method produces a periodic array of micro pillars or a non-periodic array of micro pillars on the surface, resulting in changes in properties of the surface;
wherein nanospikes are produced atop the micro pillars;wherein said material comprises semiconductor; wherein said irradiation has a duration of between about one femtosecond and about 999 picoseconds; and wherein said energy pulses have a wavelength of between about 400 and about 1,600 nanometers.
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Specification