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Conduction path, semiconductor device using the same, and method of manufacturing conduction path, and semiconductor device

  • US 8,754,510 B2
  • Filed: 11/30/2011
  • Issued: 06/17/2014
  • Est. Priority Date: 12/10/2010
  • Status: Active Grant
First Claim
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1. A conduction path, comprising:

  • a first conductor forming a first conduction path, having a plate shape, made of a first metal, and having a hole; and

    a second conductor forming a second conduction path, having a plate shape, made of a second metal, and having a press-fit portion press-fitted into the hole, wherein;

    an inclined bonding surface inclined relative to a normal line of a surface of the first conductor other than the hole, on which a part of the second conductor is overlapped, is formed in a wall surface of the hole and a side surface of the press-fit portion,a bonding portion, at which newly formed surfaces of the hole and the press-fit portion, respectively, are bonded together, is formed in a region located in a periphery of the inclined bonding surface, the newly formed surfaces being surfaces formed by plastic flow caused when the press-fit portion is press-fitted into the hole,at the bonding portion, the first metal and the second metal are integrated with each other and wherein the hole is a through hole.

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