Surface sensor offset

• US 8,756,973 B2
• Filed: 07/11/2008
• Issued: 06/24/2014
• Est. Priority Date: 07/13/2007
• Status: Active Grant

• Current Assignee: Renishaw PLC
• Original Assignee: Renishaw PLC
• Inventors: Wallace, David Sven, Grzesiak, Jean-Louis
• Primary Examiner(s): Williams, Hezron E
• Assistant Examiner(s): FAYYAZ, NASHMIYA SAQIB
• Application Number:
  US12/452,078
• Publication Number:
  US 20100132432A1
• Time in Patent Office: 2,174 Days
• Field of Search: 73/17.5, 73/17.9, 73/18.1
• US Class Current: 73/1.79
• CPC Class Codes: G01B 21/045 Correction of measurements G01B9/02055 takes precedence

Abstract

A method of operating a coordinate positioning apparatus having a surface sensor that is rotatable about at least a first axis. The method comprises obtaining a first measurement with the surface sensor at a first angular orientation and obtaining a at least a second measurement with the surface sensor at a second angular orientation. The first and second angular orientations are different to each other such that any offset of the surface sensor from an expected position will have at least a partially opposing affect on the first and second measurements. The method then compensates and/or establishes for the offset using the first and second measurements.

Claims

1. A method of operating a coordinate positioning apparatus having an articulated head on which a surface sensor is mounted, the articulated head providing for rotation of the surface sensor about at least first and second axes, the method comprising:

positioning the surface sensor at a first angular orientation about the articulated head'"'"'s first axis and obtaining a first measurement of an artifact with the surface sensor at the first angular orientation which comprises actuating the articulated head to rotate the surface sensor about the articulated head'"'"'s second axis;

driving the articulated head to position the surface sensor at a second angular orientation about the first axis and obtaining at least a second measurement of the artifact with the surface sensor at the second angular orientation which comprises actuating the articulated head to rotate the surface sensor about the articulated head'"'"'s second axis, the first and second angular orientations being different from each other such that any offset of the surface sensor from an expected position will have at least a partially opposing effect on the first and second measurements; and

using the first and second measurements to establish the offset of the surface sensor from the expected position, and using the offset to correct errors in subsequent measurements obtained by the surface sensor.

2. A method as claimed in claim 1, in which the second angular orientation is different to the first angular orientation such that the effect on the second measurement of any offset of the surface sensor from the expected position is substantially equal and opposite to the effect on the first measurement.

3. A method as claimed in claim 2 in which the second angular orientation is substantially inverse the first angular orientation.

4. A method as claimed in claim 1, in which obtaining the first and second measurements comprise moving the surface sensor such that the surface sensor measures in a first dimension only relative to the surface sensor.

5. A method as claimed in claim 1, in which obtaining the first and second measurements comprise moving the surface sensor relative to an artifact such that the surface sensor measures in first and second dimensions relative to the surface sensor.

6. A method as claimed in claim 1 in which establishing the offset comprises determining the offset of the surface sensor in at least a first dimension.

7. A method as claimed in claim 6 in which establishing the offset comprises determining the offset of the surface sensor in at least a second dimension.

8. A method as claimed in claim 6, comprising determining at least first and second offset sources.

9. A method as claimed in claim 8, in which the first offset source comprises the difference between the actual and expected position of the at least first axis and the second offset source comprises the difference between the actual and expected position of the surface sensor relative to the first axis.

10. A method as claimed in claim 1 in which establishing the offset comprises determining a resultant measurement from the first and second measurements.

11. A method as claimed in claim 1 in which the second measurement is a repeat of the first measurement with the surface sensor at a different angular orientation.

12. A method as claimed in claim 1 in which obtaining each of the first and second measurements comprises measuring a plurality of points of an artifact.

13. A method as claimed in claim 1 in which obtaining the first and second measurements comprise obtaining first and second measurements of a circular feature.

14. A method as claimed in claim 1 in which the surface sensor is rotatable about at least a second axis that is perpendicular to the first axis.

15. A method as claimed in claim 14, in which the first and second angular orientations are taken about the first axis and measured relative to the second axis.

16. A method as claimed in claim 14, in which obtaining the first and second measurements comprises maintaining a linear position of the second axis.

17. A method as claimed in claim 14 in which second angular orientation is substantially equal and opposite the first angular orientation.

18. A method as claimed in claim 1 in which the surface sensor is a contact tip of a contact probe.

21. A method as claimed in claim 1, in which obtaining the first and second measurements comprise measuring the position of substantially the same point on the artifact.

22. A method as claimed in claim 1, in which obtaining the first and second measurements comprise measuring the position of a single point on the artifact.

23. A method as claimed in claim 1, in which obtaining the second measurement of the artifact comprises rotating the surface sensor about the articulated head'"'"'s second axis in a direction opposite to that which the surface sensor is rotated to obtain the first measurement.

19. A coordinate positioning apparatus having an articulated head on which a surface sensor is mounted, the articulated head providing for rotation of the surface sensor about at least first and second axes, and a controller which is configured to perform a method comprising:

positioning the surface sensor at a first angular orientation about the articulated head'"'"'s first axis and obtaining a first measurement of an artifact with the surface sensor at the first angular orientation which comprises actuating the articulated head to rotate the surface sensor about the articulated head'"'"'s second axis;

driving the articulated head to position the surface sensor at a second angular orientation about the first axis and obtaining at least a second measurement of the artifact with the surface sensor at the second angular orientation which comprises actuating the articulated head to rotate the surface sensor about the articulated head'"'"'s second axis, the first and second angular orientations being different from each other such that any offset of the surface sensor from an expected position will have at least a partially opposing effect on the first and second measurements; and

using the first and second measurements to establish the offset of the surface sensor from the expected position, and using the offset to correct errors in subsequent measurements obtained by the surface sensor.

20. A computer readable storage medium storing computer-executable program code, the program code including instructions which when executed by a controller of a measurement system having an articulated head on which a surface sensor is mounted, the articulated head providing for rotation of the surface sensor about at least first and second axes, cause the measurement system to perform steps comprising:

positioning the surface sensor at a first angular orientation about the articulated head'"'"'s first axis and obtaining a first measurement of an artifact with the surface sensor at the first angular orientation which comprises actuating the articulated head to rotate the surface sensor about the articulated head'"'"'s second axis;

driving the articulated head to position the surface sensor at a second angular orientation about the first axis and obtaining at least a second measurement of the artifact with the surface sensor at the second angular orientation which comprises actuating the articulated head to rotate the surface sensor about the articulated head'"'"'s second axis, the first and second angular orientations being different to from each other such that any offset of the surface sensor from an expected position will have at least a partially opposing effect on the first and second measurements; and

using the first and second measurements to establish the offset of the surface sensor from the expected position, and using the offset to correct errors in subsequent measurements obtained by the surface sensor.