Exposure apparatus and method for producing device

• US 8,760,617 B2
• Filed: 02/25/2013
• Issued: 06/24/2014
• Est. Priority Date: 05/23/2003
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Kobayashi, Naoyuki, Tanimoto, Akikazu, Mizuno, Yasushi, Shiraishi, Kenichi, Nakano, Katsushi, Owa, Soichi
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US13/775,853
• Publication Number:
  US 20130169945A1
• Time in Patent Office: 484 Days
• Field of Search: 355/30, 355/53, 355/77, 250/548
• US Class Current: 355/30
• CPC Class Codes: G03B 27/52 Details
• CPC Class Codes: G03F 7/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L21/00, H05K
• CPC Class Codes: G03F 7/2041 in the presence of a fluid, e.g. immersion; using fluid cooling means
• CPC Class Codes: G03F 7/70316 Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
• CPC Class Codes: G03F 7/70925 Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
• CPC Class Codes: G03F 7/70958 Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
• CPC Class Codes: G03F 9/7015 Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
• CPC Class Codes: G03F 9/7088 Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
• CPC Class Codes: G03F 9/7096 Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus

Abstract

A cleaning of a liquid immersion exposure apparatus is performed at a different time than an exposure operation. A stage is placed under a liquid supply inlet during a cleaning operation. The cleaning operation is performed at the different time than the exposure operation in which an immersion liquid is supplied onto a substrate held on a holder of the stage. The immersion liquid is supplied from a liquid supply inlet during the cleaning operation. The immersion liquid is supplied to a portion of the stage different from a portion at which the substrate is held by the holder of the stage.

Claims

1. A cleaning method used in a liquid immersion exposure apparatus, the method comprising:

placing a stage under a liquid supply inlet during a cleaning operation, the cleaning operation being performed at a different time than an exposure operation in which an immersion liquid is supplied onto a substrate held on a holder of the stage; and

supplying the immersion liquid from the liquid supply inlet during the cleaning operation, wherein the supplying includes supplying the immersion liquid to a portion of the stage different from a portion at which the substrate is held by the holder of the stage.

2. The method of claim 1, wherein a component of the exposure apparatus is cleaned by the immersion liquid during the cleaning operation.

3. The method of claim 2, wherein the component includes an optical element of a projection system via which the substrate is exposed during the exposure operation.

4. The method of claim 2, further comprising collecting the supplied immersion liquid via a liquid recovery outlet from the portion of the stage during the cleaning operation.

5. The method of claim 4, wherein the component includes a liquid immersion area forming member having the liquid recovery outlet, the liquid immersion area forming member forming a liquid immersion area of the immersion liquid at a portion of an upper surface of the substrate during the exposure operation.

6. The method of claim 5, wherein the liquid immersion area forming member has the liquid supply inlet.

7. The method of claim 4, wherein the liquid supply inlet and the liquid recovery outlet are arranged such that an upper surface of the substrate faces the liquid supply inlet and the liquid recovery outlet during the exposure operation.

8. The method of claim 7, wherein the liquid recovery outlet is arranged to surround the liquid supply inlet.

9. The method of claim 1, wherein a liquid immersion area of the immersion liquid is formed at the portion of the stage during the cleaning operation by supplying the immersion liquid and collecting the immersion liquid.

10. The method of claim 9, wherein a gap between a projection system via which the substrate is exposed during the exposure operation and the stage is filled with the immersion liquid during the cleaning operation.

11. The method of claim 1, wherein the immersion liquid includes pure water.

12. The method of claim 1, wherein the cleaning operation is performed after the exposure operation.

13. The method of claim 1, wherein the cleaning operation is performed before the exposure operation.

14. A liquid immersion exposure apparatus comprising:

a projection system having a final optical element;

a stage having a holder on which a substrate to be exposed is held and which is movable below the projection system;

a liquid supply inlet below which the stage is moved, and from which an immersion liquid is supplied;

a liquid recovery outlet below which the stage is moved, and from which the supplied immersion liquid is collected; and

a controller that controls the exposure apparatus to perform (i) an exposure operation in which the immersion liquid is supplied onto the substrate from the liquid supply inlet and (ii) a cleaning operation at a different time than the exposure operation, during the cleaning operation, the immersion liquid is supplied from the liquid supply inlet, the cleaning operation including supplying the immersion liquid to a portion of the stage different from a portion at which the substrate is held by the holder of the stage.

15. The apparatus of claim 14, wherein a component of the exposure apparatus is cleaned by the immersion liquid during the cleaning operation.

16. The apparatus of claim 15, wherein the component of the exposure apparatus includes the final optical element of the projection system.

17. The apparatus of claim 15, wherein the component of the exposure apparatus includes a liquid immersion area forming member having the liquid recovery outlet, the liquid immersion area forming member forming a liquid immersion area of the immersion liquid at a portion of an upper surface of the substrate during the exposure operation.

18. The apparatus of claim 17, wherein the liquid immersion area forming member has the liquid supply inlet.

19. The apparatus of claim 14, wherein the liquid supply inlet and the liquid recovery outlet are arranged such that an upper surface of the substrate faces the liquid supply inlet and the liquid recovery outlet during the exposure operation.

20. The apparatus of claim 19, wherein the liquid recovery outlet is arranged to surround the liquid supply inlet.

21. The apparatus of claim 14, wherein a liquid immersion area of the immersion liquid is formed at the portion on the stage during the cleaning operation by supplying the immersion liquid and collecting the immersion liquid.

22. The apparatus of claim 21, wherein a gap between the projection system and the portion of the stage is filled with the immersion liquid during the cleaning operation.

23. The apparatus of claim 14, wherein the cleaning operation is performed after the exposure operation.

24. The apparatus of claim 14, wherein the cleaning operation is performed before the exposure operation.

25. The apparatus of claim 14, wherein the immersion liquid includes pure water.

26. The apparatus of claim 14, further comprising:

a measurement system including a measurement member provided on the stage and a light-receiver,

wherein a light from the projection system is received by the light-receiver through a light-transmitting portion of the measurement member and a liquid immersion area of the immersion liquid formed in a gap between the projection system and the measurement member.

27. The apparatus of claim 26, further comprising a first liquid-removal system by which the immersion liquid remaining on the measurement member is removed.

28. The apparatus of claim 26, wherein the measurement member has an upper surface which is liquid-repellent.

29. The apparatus of claim 28, wherein the measurement member includes a coating of a liquid-repellent material.

30. The apparatus of claim 14, further comprising:

a measurement member provided on the stage; and

a first alignment system which detects an alignment mark of the substrate not through the immersion liquid,

wherein the measurement member has a reference mark which is detected by the first alignment system.

31. The apparatus of claim 30, wherein the substrate is positioned during the exposure operation based on a detection-result of the first alignment system and projection position information obtained through the immersion liquid and the projection system.

32. The apparatus of claim 14, further comprising:

a measurement member provided on the stage; and

a second alignment system,

wherein a liquid immersion area of the immersion liquid is formed on the measurement member, and a gap between the projection system and the measurement member is filled with the immersion liquid in order to obtain projection position information using the second alignment system.

33. The apparatus of claim 14, further comprising a second liquid removal system by which the immersion liquid remaining on the final optical element of the projection system is removed.

34. The apparatus of claim 14, further comprising a liquid-absorbing member provided in a groove of the stage, which is capable of absorbing the immersion liquid supplied from the liquid supply inlet.

35. The apparatus of claim 34, wherein the liquid absorbing member includes a porous material.

36. The apparatus of claim 34, wherein a flow-passage, which is in communication with the groove, is provided in the stage and the flow-passage is connected to a suction source.

37. The apparatus of claim 36, wherein the flow passage in the stage is connected to a tank and the suction source is connected to the flow passage through the tank.

38. The apparatus of claim 37, wherein the suction source is connected to an upper portion of the tank, a discharge flow passage is provided at a lower portion of the tank, and the liquid in the tank is discharged through the discharge flow passage.

39. The apparatus of claim 14, wherein the stage includes a liquid recovery outlet which collects the immersion liquid supplied from the liquid supply inlet.

40. The apparatus of claim 39, wherein a flow passage is provided in the stage, the flow passage being in communication with the liquid recovery outlet of the stage and the flow passage being connected to a suction source.

41. The apparatus of claim 40, wherein the flow passage in the stage is connected to a tank and the suction source is connected to the flow passage through the tank.

42. The apparatus of claim 41, wherein the suction source is connected to an upper portion of the tank, a discharge flow passage is provided at a lower portion of the tank, and the liquid in the tank is discharged through the discharge flow passage.

43. The apparatus of claim 14, wherein a flow passage is provided in the stage, the flow passage being in communication with a groove of the stage and the flow passage being connected to a suction source to suck the immersion liquid from the groove.

44. The apparatus of claim 43, wherein the flow passage in the stage is connected to a tank and the suction source is connected to the flow passage through the tank.

45. The apparatus of claim 44, wherein the suction source is connected to an upper portion of the tank, a discharge flow passage is provided at a lower portion of the tank, and the liquid in the tank is discharged through the discharge flow passage.

46. A device manufacturing method comprising a step of exposing a substrate using the exposure apparatus defined in claim 14.

47. A cleaning method used in a liquid immersion exposure apparatus, the method comprising:

placing a stage under a liquid supply inlet during a cleaning operation, the cleaning operation being performed at a different time than an exposure operation in which an immersion liquid is supplied onto a substrate having a resist and held on a holder of the stage; and

supplying the immersion liquid from the liquid supply inlet from above the stage and during the cleaning operation, wherein the supplying includes supplying the immersion liquid to a surface different from an upper surface of the substrate having the resist.

48. The method of claim 47, wherein a component of the exposure apparatus is cleaned by the immersion liquid during the cleaning operation.

49. The method of claim 48, wherein the component includes an optical element of a projection system via which the substrate having the resist is exposed during the exposure operation.

50. The method of claim 48, further comprising collecting the supplied immersion liquid via a liquid recovery outlet from the surface different from the upper surface of the substrate having the resist during the cleaning operation.

51. The method of claim 50, wherein the component includes a liquid immersion area forming member having the liquid recovery outlet, the liquid immersion area forming member forming a liquid immersion area of the immersion liquid at a portion of the upper surface of the substrate having the resist during the exposure operation.

52. The method of claim 51, wherein the liquid immersion area forming member has the liquid supply inlet.

53. The method of claim 50, wherein the liquid supply inlet and the liquid recovery outlet are arranged such that the upper surface of the substrate having the resist faces the liquid supply inlet and the liquid recovery outlet during the exposure operation.

54. The method of claim 53, wherein the liquid recovery outlet is arranged to surround the liquid supply inlet.

55. The method of claim 47, wherein a liquid immersion area of the immersion liquid is formed during the cleaning operation by supplying the immersion liquid and collecting the immersion liquid.

56. The method of claim 55, wherein a gap between a projection system via which the substrate is exposed during the exposure operation and the stage is filled with the immersion liquid during the cleaning operation.

57. The method of claim 47, wherein the immersion liquid includes pure water.

58. The method of claim 47, wherein the cleaning operation is performed after the exposure operation.

59. The method of claim 47, wherein the cleaning operation is performed before the exposure operation.

60. A liquid immersion exposure apparatus comprising:

a projection system having a final optical element;

a stage having a holder on which a substrate having a resist to be exposed is held and which is movable below the projection system;

a liquid supply inlet below which the stage is moved, and from which an immersion liquid is supplied;

a liquid recovery outlet below which the stage is moved, and from which the supplied immersion liquid is collected; and

a controller that controls the exposure apparatus to perform (i) an exposure operation in which the immersion liquid is supplied onto the substrate having the resist from the liquid supply inlet and (ii) a cleaning operation at a different time than the exposure operation, during the cleaning operation, the immersion liquid is supplied from the liquid supply inlet from above the stage, the cleaning operation including supplying the immersion liquid to a surface different from an upper surface of the substrate having the resist.

61. The apparatus of claim 60, wherein a component of the exposure apparatus is cleaned by the immersion liquid during the cleaning operation.

62. The apparatus of claim 61, wherein the component of the exposure apparatus includes the final optical element of the projection system.

63. The apparatus of claim 61, wherein the component of the exposure apparatus includes a liquid immersion area forming member having the liquid recovery outlet, the liquid immersion area forming member forming a liquid immersion area of the immersion liquid at a portion of the upper surface of the substrate having the resist during the exposure operation.

64. The apparatus of claim 63, wherein the liquid immersion area forming member has the liquid supply inlet.

65. The apparatus of claim 60, wherein the liquid supply inlet and the liquid recovery outlet are arranged such that the upper surface of the substrate having the resist faces the liquid supply inlet and the liquid recovery outlet during the exposure operation.

66. The apparatus of claim 65, wherein the liquid recovery outlet is arranged to surround the liquid supply inlet.

67. The apparatus of claim 60, wherein a liquid immersion area of the immersion liquid is formed during the cleaning operation by supplying the immersion liquid and collecting the immersion liquid.

68. The apparatus of claim 67, wherein a gap between the projection system and the surface different from the upper surface of the substrate having the resist is filled with the immersion liquid during the cleaning operation.

69. The apparatus of claim 60, wherein the cleaning operation is performed after the exposure operation.

70. The apparatus of claim 60, wherein the cleaning operation is performed before the exposure operation.

71. The apparatus of claim 60, wherein the immersion liquid includes pure water.

72. The apparatus of claim 60, further comprising:

a measurement system including a measurement member provided on the stage and a light-receiver,

wherein a light from the projection system is received by the light-receiver through a light-transmitting portion of the measurement member and a liquid immersion area of the immersion liquid formed in a gap between the projection system and the measurement member.

73. The apparatus of claim 72, further comprising a first liquid-removal system by which the immersion liquid remaining on the measurement member is removed.

74. The apparatus of claim 72, wherein the measurement member has an upper surface which is liquid-repellent.

75. The apparatus of claim 74, wherein the measurement member includes a coating of a liquid-repellent material.

76. The apparatus of claim 60, further comprising:

a measurement member provided on the stage; and

a first alignment system which detects an alignment mark of the substrate not through the immersion liquid,

wherein the measurement member has a reference mark which is detected by the first alignment system.

77. The apparatus of claim 76, wherein the substrate is positioned during the exposure operation based on a detection-result of the first alignment system and projection position information obtained through the immersion liquid and the projection system.

78. The apparatus of claim 60, further comprising:

a measurement member provided on the stage; and

a second alignment system,

wherein a liquid immersion area of the immersion liquid is formed on the measurement member, and a gap between the projection system and the measurement member is filled with the immersion liquid in order to obtain projection position information using the second alignment system.

79. The apparatus of claim 60, further comprising a second liquid removal system by which the immersion liquid remaining on the final optical element of the projection system is removed.

80. The apparatus of claim 79, wherein the second liquid removal system moves the remaining liquid in a predetermined area to outside of the predetermined area.

81. The apparatus of claim 80, wherein the second liquid removal system moves the remaining liquid using a clean gas.

82. The apparatus of claim 60, further comprising a liquid-absorbing member provided in a groove of the stage, which is capable of absorbing the immersion liquid supplied from the liquid supply inlet.

83. The apparatus of claim 82, wherein the liquid absorbing member includes a porous material.

84. The apparatus of claim 82, wherein a flow-passage, which is in communication with the groove, is provided in the stage and the flow-passage is connected to a suction source.

85. The apparatus of claim 84, wherein the flow passage in the stage is connected to a tank and the suction source is connected to the flow passage through the tank.

86. The apparatus of claim 85, wherein the suction source is connected to an upper portion of the tank, a discharge flow passage is provided at a lower portion of the tank, and the liquid in the tank is discharged through the discharge flow passage.

87. The apparatus of claim 60, wherein the stage includes a liquid recovery outlet which collects the immersion liquid supplied from the liquid supply inlet.

88. The apparatus of claim 87, wherein a flow passage is provided in the stage, the flow passage being in communication with the liquid recovery outlet of the stage and the flow passage being connected to a suction source.

89. The apparatus of claim 88, wherein the flow passage in the stage is connected to a tank and the suction source is connected to the flow passage through the tank.

90. The apparatus of claim 89, wherein the suction source is connected to an upper portion of the tank, a discharge flow passage is provided at a lower portion of the tank, and the liquid in the tank is discharged through the discharge flow passage.

91. The apparatus of claim 87, wherein the immersion liquid is recovered from the liquid recovery outlet of the stage after completion of the exposure for the substrate.

92. The apparatus of claim 60, wherein a flow passage is provided in the stage, the flow passage being in communication with a groove of the stage and the flow passage being connected to a suction source to suck the immersion liquid from the groove.

93. The apparatus of claim 92, wherein the flow passage in the stage is connected to a tank and the suction source is connected to the flow passage through the tank.

94. The apparatus of claim 93, wherein the suction source is connected to an upper portion of the tank, a discharge flow passage is provided at a lower portion of the tank, and the liquid in the tank is discharged through the discharge flow passage.

95. A device manufacturing method comprising a step of exposing a substrate using the exposure apparatus defined in claim 60.