Double patterning process
First Claim
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1. A double patterning process, comprising:
- providing a substrate having a first area and a second area;
forming a target layer over the substrate;
forming a patterned first photoresist layer over the target layer, wherein the patterned first photoresist layer has a plurality of first openings and has a first thickness in the first area, at least a first portion of the patterned first photoresist layer in the second area has a second thickness less than the first thickness, and the second thickness is greater than zero; and
forming a second photoresist layer covering the patterned first photoresist layer and filling in the first openings.
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Abstract
A double patterning process is described. A substrate having a first area and a second area is provided. A target layer is formed over the substrate. A patterned first photoresist layer is formed over the target layer, wherein the patterned first photoresist layer has openings and has a first thickness in the first area, and at least a portion of the patterned first photoresist layer in the second area has a second thickness less than the first thickness. A second photoresist layer is then formed covering the patterned first photoresist layer and filling in the openings.
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16 Claims
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1. A double patterning process, comprising:
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providing a substrate having a first area and a second area; forming a target layer over the substrate; forming a patterned first photoresist layer over the target layer, wherein the patterned first photoresist layer has a plurality of first openings and has a first thickness in the first area, at least a first portion of the patterned first photoresist layer in the second area has a second thickness less than the first thickness, and the second thickness is greater than zero; and forming a second photoresist layer covering the patterned first photoresist layer and filling in the first openings. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification