Method, system and software for accessing design rules and library of design features while designing semiconductor device layout

• US 8,769,475 B2
• Filed: 10/31/2011
• Issued: 07/01/2014
• Est. Priority Date: 10/31/2011
• Status: Active Grant

• Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Original Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Inventors: Tsai, Tsung-Chieh, Wu, Juing-Yi, Chen, Chin-An, Wu, Pei-Tzu, Ting, Jyh-Kang
• Primary Examiner(s): Chiang, Jack
• Assistant Examiner(s): LEE, ERIC D
• Application Number:
  US13/285,528
• Publication Number:
  US 20130111418A1
• Time in Patent Office: 974 Days
• Field of Search: 716/139
• US Class Current: 716/139
• CPC Class Codes: G06F 30/398 Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM] optical proximity correction [OPC] design processes G03F1/36

Abstract

Provided is a system and method for designing the layout of integrated circuits or other semiconductor devices while directly accessing design rules and a library of design features by interfacing with a GUI upon which the design layout is displayed. The design rules may be directly linked to the design features of the pattern library and imported into the device layout. The design rules may be directly accessed while designing the layout or while conducting a design rule check and the design features from the pattern library may be used in creating the layout.

Claims

1. A non-transitory computer readable storage medium encoded with computer program code such that, when said computer program code is executed by a processor, said processor performs a design method, said design method comprising:

designing a semiconductor device layout and displaying said semiconductor device layout on a graphical user interface (GUI);

accessing design rules by interacting with said GUI by selecting a feature of said semiconductor device layout when said semiconductor device layout is displayed on said GUI thereby automatically-accessing a library of design features; and

,

importing at least one of said design features directly into said semiconductor device layout,

wherein said design rules are linked to said library of design features.

2. The non-transitory computer readable storage medium as in claim 1, wherein said automatically-accessing a library of design features by interacting with said GUI and said importing at least one of said design features directly into said semiconductor device layout comprises using said at least one of said design features in said designing a semiconductor device layout.

3. The non-transitory computer readable storage medium as in claim 1, wherein said accessing design rules comprises causing said design rules to be displayed on said GUI and said automatically accessing a library includes causing said library of design features to be displayed on said GUI, and wherein said accessing design rules comprises positioning a cursor on a desired design feature of said design features, and selecting said desired design feature.

4. The non-transitory computer readable storage medium as in claim 1, wherein said accessing design rules comprises using a physical input device to control position of a cursor on a display of said semiconductor device layout on said GUI, positioning said cursor on said feature in said display and selecting said feature by clicking on said cursor thereby causing said design rule to be displayed on said GUI.

5. The non-transitory computer readable storage medium as in claim 1, wherein said designing, said accessing design rules and said importing take place simultaneously and said method further comprises performing a design rule check and finalizing said layout in compliance with said design rules and transmitting said finalized layout to a mask foundry.

6. A method for designing a semiconductor device, said method comprising:

designing a layout of a semiconductor device and displaying said layout on a graphical user interface (GUI) using an electronic design automation (EDA) system;

accessing design rules by interacting with said GUI by selecting a feature of said layout when said layout is displayed thereby automatically accessing a library of design features and displaying said library of design features on said GUI when said layout is displayed; and

importing at least one desired design feature from said library of design features by selecting said at least one desired design feature from said library and importing said at least one desired design feature into said layout by interacting with said GUI.

7. The method as in claim 6, wherein said accessing design rules comprises positioning a cursor on a portion of said layout and clicking a mouse, and further comprising checking said layout for compliance with said design rules by interacting with said GUI.

8. The method as in claim 6, wherein:

said accessing design rules comprises displaying said design rules on said GUI, and

said design rules are foundry process verified design rules associated with a mask foundry and a device fabrication foundry.

9. The method as in claim 6, wherein said importing at least one desired design feature comprises forming a finalized layout that complies with said design rules and includes at least one of said design features, and further comprising using said finalized layout to form a photomask set.

10. The method as in claim 9, further comprising using said photomask set to form a semiconductor device.

11. The method as in claim 6, wherein said designing a layout of a semiconductor device and displaying said layout on a GUI using an electronic design automation (EDA) system includes:

providing a tangible computer readable storage medium to a processor of said EDA system, said tangible computer readable storage medium encoded with computer program code such that, when said computer program code is executed by said processor, said processor enables a user to use said EDA system to perform said designing a layout, said accessing design rules thereby automatically accessing a library of design features and said importing at least one desired design feature, by interacting with said GUI.

12. The method as in claim 6, wherein said design rules are linked to said design features and wherein said accessing design rules thereby automatically accessing a library of design features, takes place prior to said designing.

13. The method as in claim 6, wherein said accessing design rules thereby automatically accessing a library of design features, and said importing at least one desired design feature take place during said designing.

14. The method as in claim 13, wherein said accessing design rules comprises causing a table of said design rules to be displayed on said GUI, and further comprising performing a design rule check and finalizing said layout.

15. The EDA system as in claim 14, wherein said method further comprises comparing at least one of said design rules to at least one feature of said semiconductor device layout and wherein said automatically accessing a library includes:

causing said library to be displayed on said GUI.

16. An electronic design automation (EDA) system comprising:

a processor;

a graphical user interface (GUI);

a non-transitory computer readable storage medium encoded with computer program code configured to be executed by said processor to enable a user to use said EDA system to design a layout of a semiconductor device according to a method comprising;

performing a design of a semiconductor device layout and displaying said semiconductor device layout on said GUI;

accessing design rules by interacting with said GUI by selecting a feature of said semiconductor device layout thereby automatically accessing a library of design features and displaying said library of design features on said GUI when said semiconductor device layout is displayed; and

importing at least one of said design features directly into said semiconductor device layout by interacting with said GUI wherein said design rules are linked to said library and wherein said accessing design rules automatically further accesses said library of design features.

17. The EDA system as in claim 16, wherein said design rules are associated with a photomask foundry and a fabrication foundry.

18. The EDA system as in claim 16, further comprising a software module that receives said tangible computer readable storage medium and includes said design rules and said design library.