Organoaminosilane precursors and methods for making and using same

• US 8,771,807 B2
• Filed: 05/17/2012
• Issued: 07/08/2014
• Est. Priority Date: 05/24/2011
• Status: Active Grant

• Current Assignee: Versum Materials US, LLC (Merck & Co., Inc.)
• Original Assignee: Air Products and Chemicals Incorporated (Linde Plc)
• Inventors: Xiao, Manchao, Lei, Xinjian, Han, Bing, O'Neill, Mark Leonard, Pearlstein, Ronald Martin, Ho, Richard, Chandra, Haripin, Derecskei-Kovacs, Agnes
• Primary Examiner(s): Loewe, Robert S
• Application Number:
  US13/474,076
• Publication Number:
  US 20130129940A1
• Time in Patent Office: 782 Days
• Field of Search: None
• US Class Current: 427/578
• CPC Class Codes: C07F 7/025 without C-silicon linkages
• CPC Class Codes: C07F 7/10 containing nitrogen having a Si-N linkage
• CPC Class Codes: C23C 16/24 Deposition of silicon only
• CPC Class Codes: C23C 16/308 Oxynitrides
• CPC Class Codes: C23C 16/32 Carbides
• CPC Class Codes: C23C 16/345 Silicon nitride
• CPC Class Codes: C23C 16/347 Carbon nitride
• CPC Class Codes: C23C 16/401 containing silicon
• CPC Class Codes: C23C 16/402 Silicon dioxide
• CPC Class Codes: C23C 16/45553 characterized by the use of precursors specially adapted for ALD
• CPC Class Codes: H01L 21/02126 the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
• CPC Class Codes: H01L 21/02164 the material being a silicon oxide, e.g. SiO2
• CPC Class Codes: H01L 21/02219 the compound comprising silicon and nitrogen
• CPC Class Codes: H01L 21/0228 deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD

Abstract

Described herein are organoaminosilane precursors which can be used to deposit silicon containing films which contain silicon and methods for making these precursors. Also disclosed herein are deposition methods for making silicon-containing films or silicon containing films using the organoaminosilane precursors described herein. Also disclosed herein are the vessels that comprise the organoaminosilane precursors or a composition thereof that can be used, for example, to deliver the precursor to a reactor in order to deposit a silicon-containing film.

Claims

1. An organoaminosilane represented by one of the following Formulas A, B, or C:

2. A composition for the deposition of a silicon containing film comprising:

an organoaminosilane having Formula A, B, and C or mixtures thereof;

3. The composition of claim 2 wherein the organoaminosilane and the solvent each has a boiling point and wherein the difference between the boiling point of the organoaminosilane and the boiling point of the solvent is 40°

C. or less.

4. The composition of claim 2 wherein the organoaminosilane and the solvent each has a boiling point and wherein the difference between the boiling point of the organoaminosilane and the boiling point of the solvent is 20°

C. or less.

5. An organoaminosilane of following Formula A:

6. The organoaminosilane of claim 5 wherein R and R¹ are different substitutents and wherein the organoaminosilane is one selected from the group consisting of:

N-propyl-isopropylaminosilane, N-methylcyclohexylaminosilane, N-ethylcyclohexylaminosilane-, allylphenylaminosilane, N-isopropylcyclohexylaminosilane, allylcyclopentylaminosilane, phenylcyclohexylaminosilane, and 2-(N-silylmethylamino)pyridine.

7. An organoaminosilane of following Formula B:

8. The organoaminosilane of claim 7 which is one selected from the group consisting of:

N-(4-methoxyphenyl)disilazane, N-(3-methoxyphenyl)disilazane, N-(2-methoxyphenyl)disilazane, N-(4-chlorophenyl)disilazane, N-(2-chlorophenyl)disilazane, N-(2-ethylphenyl)disilazane, N-(2,6-diethylphenyl)disilazane, N-(2-propylphenyl)disilazane, N-(4-t-butylphenyl)disilazane, N-(4-iso-propylphenyl)disilazane, N-(2-iso-propylphenyl)disilazane, N-(3-ethylphenyl)disilazane, N-(4-sec-butylphenyl)disilazane, N-(4-vinylphenyl)disilazane, N-(3-methylphenyl)disilazane, N-(4-methylphenyl)disilazane, N-(2,4,6-trimethylphenyl)disilazane, and N-(2, 6-di-isopropylphenyl)disilazane.

9. An organoaminosilane selected from the group consisting of:

1-N-(2-pyridyl)disilazane, N,N-disilyl-2-aminopyrimidine, N-(4-methyl-2-pyridyl)disilazane, N-(6-methyl-2-pyridyl)disilazane, N-(3-methyl-2-pyridyl)disilazane, N-(5-methyl-2-pyridyl)disilazane, and N-[2-(4-methylpyrimidino)amino]disilazane.

10. An organoaminosilane selected from the group consisting of, N-(2-dimethylamino-1-methylethyl)disilazane, N-(2-dimethylaminoethyl)disilazane, N-(1-cyclohexylethyl)disilazane, N,N-disilylcumylamine, N-[3,3-dimethylbutyl-2]ldisilazane, N,N-disilyl-2-picolylamine, N,N-disilyl-2-(2-pyridyl)ethylamine, and N,N-disilyl-1-(4-methylphenyl)ethylamine.