Microlithographic projection exposure apparatus with correction optical system that heats projection objective element
First Claim
1. An apparatus, comprising:
- a primary illumination system configured to produce an intensity distribution of projection light in a mask plane;
a projection objective comprising a lens; and
a correction optical system, comprising;
a secondary illumination system configured to produce a variable intensity distribution of correction light in a reference surface; and
a correction element comprising a heating material, the correction element being in a plane that is at least substantially optically conjugate to the reference surface so that the correction light and the projection light pass through the lens of the projection objective before they impinge on the correction element,wherein;
all lenses through which both the correction light and the projection light pass comprise one or more lens materials having a lower coefficient of absorption for the correction light than the heating material,the correction optical system is configured to heat the entire correction element, andthe apparatus is a microlithographic projection exposure apparatus.
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Accused Products
Abstract
A microlithographic projection exposure apparatus includes a primary illumination system producing projection light, a projection objective and a correction optical system. The correction optical system includes a secondary illumination system, which produces an intensity distribution of correction light in a reference surface, and a correction element which includes a heating material and is arranged in a plane that is at least substantially optically conjugate to the reference surface such that the correction light and the projection light pass through at least one lens contained in the projection objective before they impinge on the correction element. All lenses through which both the correction light and the projection light pass are made of a lens material which has a lower coefficient of absorption for the correction light than the heating material contained in the correction element.
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Citations
23 Claims
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1. An apparatus, comprising:
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a primary illumination system configured to produce an intensity distribution of projection light in a mask plane; a projection objective comprising a lens; and a correction optical system, comprising; a secondary illumination system configured to produce a variable intensity distribution of correction light in a reference surface; and a correction element comprising a heating material, the correction element being in a plane that is at least substantially optically conjugate to the reference surface so that the correction light and the projection light pass through the lens of the projection objective before they impinge on the correction element, wherein; all lenses through which both the correction light and the projection light pass comprise one or more lens materials having a lower coefficient of absorption for the correction light than the heating material, the correction optical system is configured to heat the entire correction element, and the apparatus is a microlithographic projection exposure apparatus. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A method, comprising:
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producing a variable intensity distribution of correction light in a reference surface; imaging the reference surface onto a correction element in a projection objective of a microlithographic projection exposure apparatus, and using a correction optical system, the correction optical system being configured to heat the entire correction element, wherein both projection light of the microlithographic projection exposure apparatus and the correction light pass through at least one lens of the projection objective before they impinge on the correction element, and the correction light is more strongly absorbed in the correction element than in any lens through which both the correction light and the projection light pass. - View Dependent Claims (20)
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21. An apparatus, comprising:
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a projection objective comprising a lens; and a correction optical system, comprising; a light modulator system configured to produce a variable intensity distribution of correction light in a reference surface; and a correction element in a plane that is at least substantially optically conjugate to the reference surface so that the correction light and a projection light pass through the lens of the projection objective before they impinge on the correction element, wherein; the correction optical system is configured to heat the entire correction element; and the apparatus is a microlithographic projection exposure apparatus. - View Dependent Claims (22, 23)
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Specification