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Microlithographic projection exposure apparatus with correction optical system that heats projection objective element

  • US 8,773,638 B2
  • Filed: 03/19/2010
  • Issued: 07/08/2014
  • Est. Priority Date: 10/09/2007
  • Status: Active Grant
First Claim
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1. An apparatus, comprising:

  • a primary illumination system configured to produce an intensity distribution of projection light in a mask plane;

    a projection objective comprising a lens; and

    a correction optical system, comprising;

    a secondary illumination system configured to produce a variable intensity distribution of correction light in a reference surface; and

    a correction element comprising a heating material, the correction element being in a plane that is at least substantially optically conjugate to the reference surface so that the correction light and the projection light pass through the lens of the projection objective before they impinge on the correction element,wherein;

    all lenses through which both the correction light and the projection light pass comprise one or more lens materials having a lower coefficient of absorption for the correction light than the heating material,the correction optical system is configured to heat the entire correction element, andthe apparatus is a microlithographic projection exposure apparatus.

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