Film forming method

• US 8,778,815 B2
• Filed: 05/24/2013
• Issued: 07/15/2014
• Est. Priority Date: 05/28/2012
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Yamaguchi, Tatsuya, Niino, Reiji
• Primary Examiner(s): Smith, Zandra
• Assistant Examiner(s): Perkins, Pamela E
• Application Number:
  US13/901,889
• Publication Number:
  US 20130316545A1
• Time in Patent Office: 417 Days
• US Class Current: 438/781
• CPC Class Codes: B05D 1/36 Successively applying liquids or other fluent materials, e.g. without intermediate treatment
• CPC Class Codes: B05D 1/60 Deposition of organic layers from vapour phase vapour phase deposition in general C23C14/00, C23C16/00
• CPC Class Codes: H01L 21/02118 carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC polymers per se C08G, photoresist per se G03F
• CPC Class Codes: H01L 21/0228 deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
• CPC Class Codes: H01L 21/76831 in via holes or trenches, e.g. non-conductive sidewall liners
• CPC Class Codes: H01L 21/76832 Multiple layers
• CPC Class Codes: H01L 21/76898 formed through a semiconductor substrate
• CPC Class Codes: Y10T 428/31855 Of addition polymer from unsaturated monomers

Abstract

A method of forming a polyimide film on a surface of a substrate by dehydration condensation of a first monomer including a bifunctional acid anhydride and a second monomer including a bifunctional amine is disclosed. The method includes loading the substrate into a processing chamber, heating the substrate at a temperature at which a polyimide film is formed, and performing a cycle a predetermined number of times. The cycle comprises supplying a first processing gas containing the first monomer to the substrate, supplying a second processing gas containing the second monomer to the substrate. The method further includes supplying a replacement gas in the processing chamber between supplying the first processing gas and supplying the second processing gas thereby replacing atmosphere in the processing chamber by the replacement gas, and evacuating the first and/or the second processing gas out of the processing chamber.

Claims

1. A method of forming a polyimide film on a surface of a substrate by dehydration condensation of a first monomer having a bifunctional acid anhydride and a second monomer having a bifunctional amine, the method comprising:

loading the substrate into a processing chamber;

heating the substrate to a temperature at which the polyimide film is formed;

performing a predetermined number of cycles, wherein each cycle from the predetermined number of cycles comprises supplying a first processing gas containing the first monomer to the substrate, supplying a second processing gas containing the second monomer to the substrate, and supplying a replacement gas in the processing chamber between supplying the first processing gas and supplying the second processing gas thereby replacing atmosphere in the processing chamber by the replacement gas; and

evacuating the first and/or the second processing gas out of the processing chamber,

wherein at least one of the first and second monomers used in one cycle of the predetermined number of cycles is different from at least one of the first and second monomers used in another cycle of the predetermined number of cycles.

2. The method of claim 1, wherein an aromatic monomer and a non-aromatic monomer are used as the at least one of the first and second monomers in the one cycle and the another cycle, respectively.

3. The method of claim 1, wherein the one cycle and the another cycle are alternately performed.

4. The method of claim 1, wherein the another cycle is performed in at least one of the first cycle and the last cycle of the predetermined number of cycles.