Method and apparatus for processing metal bearing gases
First Claim
Patent Images
1. A method for processing metal bearing gases, the method comprising:
- receiving a metal bearing gas in a plasma chamber at a pressure via an inlet to the plasma chamber;
forming a toroidal plasma inside the plasma chamber, by passing current, generated by a solid state switching power supply comprising one or more switching semiconductor devices, through a primary winding of a transformer having a magnetic core surrounding a portion of the plasma chamber, the toroidal plasma reacting with the metal bearing gas to produce at least one of a metallic material, a metal oxide material or a metal nitride material; and
collecting the at least one of a metallic material, a metal oxide material or a metal nitride material via a device disposed relative to the plasma chamber.
5 Assignments
0 Petitions
Accused Products
Abstract
A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.
221 Citations
10 Claims
-
1. A method for processing metal bearing gases, the method comprising:
-
receiving a metal bearing gas in a plasma chamber at a pressure via an inlet to the plasma chamber; forming a toroidal plasma inside the plasma chamber, by passing current, generated by a solid state switching power supply comprising one or more switching semiconductor devices, through a primary winding of a transformer having a magnetic core surrounding a portion of the plasma chamber, the toroidal plasma reacting with the metal bearing gas to produce at least one of a metallic material, a metal oxide material or a metal nitride material; and collecting the at least one of a metallic material, a metal oxide material or a metal nitride material via a device disposed relative to the plasma chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
-
Specification