Electron beam detector, electron beam processing apparatus, and method of manufacturing electron beam detector

• US 8,779,378 B2
• Filed: 08/15/2013
• Issued: 07/15/2014
• Est. Priority Date: 08/30/2012
• Status: Active Grant

• Current Assignee: Advantest Corporation
• Original Assignee: Advantest Corporation
• Inventors: Abe, Kenji, Kurokawa, Masaki, Tsuda, Akiyoshi, Nasuno, Hideki
• Primary Examiner(s): Berman, Jack
• Assistant Examiner(s): LUCK, SEAN M
• Application Number:
  US13/968,022
• Publication Number:
  US 20140061465A1
• Time in Patent Office: 334 Days
• Field of Search: 250/310, 250/397
• US Class Current: 250/397
• CPC Class Codes: H01J 2237/24405 Faraday cages
• CPC Class Codes: H01J 37/244 Detectors; Associated components or circuits therefor
• CPC Class Codes: H01J 37/28 with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence
• CPC Class Codes: H01J 9/00 Apparatus or processes specially adapted for the manufacture , installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
• CPC Class Codes: H01J 9/02 Manufacture of electrodes or electrode systems

Abstract

There is provided an electron beam detector including an electron beam scatterer which is disposed at a predetermined distance below a shield including a plurality of openings formed therein, and a beam detection element disposed at a predetermined distance below the scatterer and configured to convert an electron beam into an electric signal. In the electron beam detector, the scatterer is disposed at an equal distance from any of the openings in the shield, and the beam detection element is disposed at an equal distance from any of the openings in the shield. Thus, the electron beam detector can suppress a variation in detection sensitivity depending on the position of the opening.

Claims

1. An electron beam detector comprising:

a shield plate having a plurality of openings including a support of the shield plate formed into flat plate shape and a shield film supported by the support of the shield plate;

a scatterer arranged in parallel with the shield plate, including a support of the scatterer formed into flat plate shape which includes a plurality of openings formed at portions corresponding to the plurality of openings of the shield plate, and a scatterer film formed on the support of the scatterer and configured to scatter electron beam passed through the shield plate; and

a beam detection element formed into flat plate shape and arranged in parallel with the shield plate, disposed at a predetermined distance from the scatterer and configured to convert the electron beam passed through the scatterer into an electric signal.

2. The electron beam detector according to claim 1, wherein an etching stopper film is formed between the scatterer film and the support of the scatterer by use of a material different from that of the scatterer film and that of the support member.

3. The electron beam detector according to claim 1, wherein the scatterer film and the support of the scatterer are made of different materials.

5. The electron beam detector according to claim 1, wherein

the scatterer comprises a spacer film formed on the scatterer film and including an opening formed at the same position as the opening of the support of the scatterer, and

the scatterer and the beam detection element are bonded to each other while the spacer film is interposed in between.

8. The electron beam detector according to claim 1, wherein the beam detection element is a PIN diode formed into the same shape as the scatterer.

12. The electron beam detector according to claim 1, wherein the scatterer is arranged in such a direction that the support of the scatterer is located on an upstream side of the electron beam.

4. The electron beam detector comprising:

a shield plate having a plurality of openings including;

a first support formed into flat plate shape;

a second support formed on the first support; and

a shield film formed on the second support, which is supported by the first support and the second support having a plurality of openings,

a scatterer, arranged in parallel with the shield plate, including;

a support of the scatterer formed into flat plate shape which includes a plurality of openings formed at portions corresponding to the plurality of openings of the shield plate; and

a scatterer film formed on the support of the scatterer and configured to scatter electron beam passed through the shield plate; and

a beam detection element formed into flat plate shape and arranged in parallel with the shield plate, disposed at a predetermined distance from the scatterer and configured to convert the electron beam passed through the scatterer into an electric signal,

wherein the support of the scatterer and the first support of the shield plate are integrally bonded to each other.

6. The electron beam detector comprising:

a shield plate having a plurality of openings including a support of the shield plate formed into flat plate shape, and a shield film supported by the support of the shield plate;

a scatterer, arranged in parallel with the shield plate, including a scatterer film formed on the support of shield plate and configured to scatter electron beam passed through the shield plate; and

a beam detection element formed into flat plate shape and arranged in parallel with the shield plate, disposed at a predetermined distance from the scatterer and configured to convert the electron beam passed through the scatterer into an electric signal,

wherein the shield film is formed on the scatterer film.

7. The electron beam detector according to claim 6, wherein the support of the shield plate is covered with a metal film.

9. The electron beam detector comprising:

a shield plate including a plurality of openings formed therein;

a scatterer disposed at a predetermined distance from the shield plate and configured to scatter an electron beam passed through any of the openings of the shield plate; and

a beam detection element disposed at a predetermined distance from the scatterer and configured to convert the electron beam passed through the scatterer into an electric signal;

wherein a scatterer film constituting the scatterer is formed on the beam detection element, and

wherein a shield film constituting the shield plate and including an opening formed in its predetermined portion is formed on the scatterer film.

10. An electron beam processing apparatus comprising:

an electron beam irradiator configured to perform irradiation with an electron beam;

a sample stage to mount a sample to be irradiated with the electron beam; and

an electron beam detector placed on the sample stage and configured to detect a characteristic of the electron beam, wherein

the electron beam detector includes;

a shield plate having a plurality of openings including a support of the shield plate formed into flat plate shape, and a shield film supported by the support of the shield plate;

a scatterer, arranged in parallel with the shield plate, including a support of the scatterer formed into flat plate shape which includes a plurality of openings formed at portions corresponding to the plurality of openings of the shield plate, and a scatterer film formed on the support of the scatterer and configured to scatter electron beam passed through the shield plate; and

a beam detection element formed into flat plate shape and arranged in parallel with the shield plate, disposed at a predetermined distance from the scatterer and configured to convert the electron beam passed through the scatterer into an electric signal.

11. A method of manufacturing an electron beam detector comprising the steps of:

preparing a support;

forming an etching stopper film on the support, the etching stopper film being made of a material different from a material of the support;

forming a scatterer film on the etching stopper film, the scatterer film being made of a material different from the material of the etching stopper film;

forming an opening in a predetermined portion of the support by etching; and

removing selectively the etching stopper film exposed through the opening of the support,

wherein the electron beam detector includes;

a shield plate having a plurality of openings including a support of the shield plate formed into flat plate shape, and a shield film supported by the support of the shield plate;

a scatterer, arranged in parallel with the shield plate, including a support of the scatterer formed into flat plate shape which includes a plurality of openings formed at portions corresponding to the plurality of openings of the shield plate, and a scatterer film formed on the support of the scatterer and configured to scatter electron beam passed through the shield plate; and

a beam detection element formed into flat plate shape and arranged in parallel with the shield plate, disposed at a predetermined distance from the scatterer and configured to convert the electron beam passed through the scatterer into an electric signal.

13. An electron beam detector according:

a shield plate having a plurality of openings and including a first support formed into flat plate shape and a shield film which is supported by the first support having a plurality of openings;

a scatterer film arranged in parallel with the shield plate, integrally bonded to bottom surface of the first support and configured to scatter the electron beam passed through the shield plate; and

a beam detection element formed into flat plate shape arranged in parallel with the shield plate disposed at a predetermined distance from the scatterer and configured to convert the electron beam passed through the scatterer into an electric signal.