Sub-10 NM line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers

• US 8,784,974 B2
• Filed: 05/17/2012
• Issued: 07/22/2014
• Est. Priority Date: 03/22/2007
• Status: Active Grant

• Current Assignee: Micron Technology, Inc.
• Original Assignee: Micron Technology, Inc.
• Inventors: Millward, Dan B.
• Primary Examiner(s): Loney, Donald J
• Application Number:
  US13/473,748
• Publication Number:
  US 20120223051A1
• Time in Patent Office: 796 Days
• Field of Search: 428/167, 428/172, 428/173, 428/195.1, 216/49, 438/700, 438/702, 427/97.2, 427/97.5, 427/97.7, 427/98.2, 427/307, 427/372.2
• US Class Current: 428/167
• CPC Class Codes: B05D 3/007 After-treatment
• CPC Class Codes: B81C 1/00031 Regular or irregular arrays of nanoscale structures, e.g. etch mask layer photomechanical, e.g. photolithographic, production of textured or patterned surfaces G03F7/00; lithographic processes for making patterned surfaces using printing and stamping G03F7/0002
• CPC Class Codes: B81C 2201/0149 Forming nanoscale microstructures using auto-arranging or self-assembling material
• CPC Class Codes: B81C 2201/0198 for making a masking layer
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: H01L 21/02002 Preparing wafers
• CPC Class Codes: H01L 21/3086 characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
• CPC Class Codes: H01L 21/31144 using masks
• CPC Class Codes: Y10T 428/24 Structurally defined web or sheet [e.g., overall dimension, etc.]
• CPC Class Codes: Y10T 428/24149 Honeycomb-like
• CPC Class Codes: Y10T 428/24174 including sheet or component perpendicular to plane of web or sheet
• CPC Class Codes: Y10T 428/24521 with component conforming to contour of nonplanar surface
• CPC Class Codes: Y10T 428/2457 Parallel ribs and/or grooves
• CPC Class Codes: Y10T 428/24612 Composite web or sheet
• CPC Class Codes: Y10T 428/24802 Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Abstract

Methods for fabricating sub-lithographic, nanoscale microchannels utilizing an aqueous emulsion of an amphiphilic agent and a water-soluble, hydrogel-forming polymer, and films and devices formed from these methods are provided.

Claims

1. A method for forming a structure for a template for etching a substrate, comprising:

depositing an aqueous emulsion comprising an amphiphilic material and a water-soluble, hydrogel-forming polymer material within a trench in a material overlying the substrate, the trench having sidewalls and a floor, wherein the amphiphilic material self-assembles selectively on the sidewalls of the trench and the polymer material self-assembles selectively on the floor of the trench; and

cross-linking the polymer material to form a cross-linked, water-soluble polymer hydrogel material on the floor of the trench.

2. The method of claim 1, further comprising drying the cross-linked, water-soluble polymer hydrogel material.

3. The method of claim 1, further comprising removing a portion of the cross-linked, water-soluble polymer hydrogel material to expose the self-assembled amphiphilic material on the sidewalls of the trench.

4. The method of claim 1, further comprising removing the self-assembled amphiphilic material to form a gap between the cross-linked, water-soluble polymer hydrogel material and the sidewalls of the trench and expose the substrate at the floor of the trench.

5. The method of claim 4, wherein the gap between the cross-linked, water-soluble polymer hydrogel material and the sidewalls of the trench is less than or equal to about 10 nm.

6. The method of claim 1, further comprising, before depositing the aqueous emulsion, forming a hydrophobic material on the sidewalls of the trench and a hydrophilic material on the floor of the trench.

7. The method of claim 1, wherein cross-linking the polymer material comprises applying a catalyst onto the aqueous emulsion within the trench.

8. The method of claim 1, further comprising applying a silicon ester material to the cross-linked, water-soluble polymer hydrogel material to effect a sol-gel reaction.

9. The method of claim 1, further comprising, prior to depositing the aqueous emulsion:

forming a self-assembled lamellar-phase block copolymer within another trench having other sidewalls and another floor defined by another material overlying the material overlying the substrate;

selectively removing one block of the self-assembled block copolymer material to form openings to expose the material overlying the substrate at the another floor of the another trench; and

etching through the openings to form second trenches in the substrate, the second trenches having hydrophobic sidewalls and a hydrophilic floor, the second trenches including the trench in the material overlying the substrate;

wherein depositing the aqueous emulsion comprises depositing the aqueous emulsion into the trench of the second trenches.

10. A method for forming a structure for a template for etching a substrate, comprising:

depositing an aqueous emulsion comprising an amphiphilic surfactant and a water-soluble, hydrogel-forming polymer material into a trench in a material overlying the substrate, the trench having hydrophobic sidewalls and a hydrophilic floor such that the polymer material self-assembles selectively on the floor of the trench and the amphiphilic surfactant self-assembles selectively on the sidewalls of the trench; and

cross-linking the polymer material to form a cross-linked, water-soluble polymer hydrogel material situated on the floor of the trench.

11. A method for fabricating an etch mask on a substrate, comprising:

depositing an aqueous emulsion comprising an amphiphilic surfactant material and a water-soluble, hydrogel-forming polymer material into a trench in a material overlying the substrate, the trench having sidewalls and a floor such that the polymer material self-assembles on the floor of the trench and the amphiphilic surfactant material self-assembles selectively on the sidewalls;

cross-linking the polymer material to form a cross-linked, water-soluble polymer hydrogel material situated on the floor of the trench; and

removing the amphiphilic surfactant material to form an opening between the cross-linked, water-soluble polymer hydrogel material and the sidewalls of the trench to expose the substrate at the floor of the trench.

12. The method of claim 11, further comprising etching the substrate through the opening.

13. A structure for a template for etching a substrate, comprising:

a fill within a trench in a material overlying the substrate, the trench having sidewalls and a floor, the fill comprising a cross-linked, water-soluble polymer hydrogel material situated on the floor of the trench with an amphiphilic material on the sidewalls of the trench.

14. A structure for a template for etching a substrate, comprising:

a first trench in a material overlying a substrate, the first trench having a length; and

a plurality of lines within the first trench, the plurality of lines comprising a polymer material, lines of the plurality separated from one another by openings extending for the length of the first trench, the openings exposing second trenches in the substrate, the second trenches containing a cross-linked, water-soluble polymer hydrogel material between an amphiphilic material situated on sidewalls of the second trenches.

15. An intermediate structure for a template for etching a substrate, comprising:

a cross-linked hydrogel formed from a water-soluble polymer, the cross-linked hydrogel wetting a floor of a trench; and

a planar structure of an amphiphilic agent disposed on sidewall surfaces of the trench, the planar structure having a thickness of less than or equal to about 10 nm.

16. The intermediate structure of claim 15, wherein the planar structure of the amphiphilic agent is disposed on end sidewall surfaces of the trench.

17. The intermediate structure of claim 15, wherein the water-soluble polymer is selected from the group consisting of poly(ethylene oxide), poly(ethylene glycol), poly(vinyl alcohol), and poly(saccharide).

18. The intermediate structure of claim 15, wherein the amphiphilic agent is selected from the group consisting of a phospholipid, nonionic surfactant, acryloylated sulfosuccinic acid ester surfactant, and hydroxybenzoic acid.

19. The intermediate structure of claim 15, wherein the cross-linked hydrogel comprises a hardening agent selected from the group consisting of silicon dioxide, a metal oxide, carbonate, carbon black, and solvated metal.

20. The intermediate structure of claim 15, further comprising a silicon ester overlying the fill.

21. An intermediate structure for a template for etching a substrate, comprising:

a first trench in a material overlying a substrate;

a polymer material within the first trench, the polymer material defining openings distributed across a width of the first trench, each of the openings having an opening width of about 10-60 nm, each of the openings extending a length of the first trench, the openings exposing second trenches in the substrate; and

a cross-linked hydrogel within at least one of the second trenches, the cross-linked hydrogel formed from a water-soluble polymer and comprising an amphiphilic agent on sidewalls of the second trenches.