Methods of forming micro-electromechanical resonators having passive temperature compensation regions therein
First Claim
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1. A method of forming a periodic signal generator, comprising:
- forming a microelectromechanical resonator comprising a suspended resonator body having at least two semiconductor layers therein of opposite conductivity type that form a P-N rectifying junction therebetween and a piezoelectric layer on the at least two semiconductor layers.
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Abstract
Methods of forming micromechanical resonators include forming first and second substrates having first and second semiconductor layers of first and second conductivity type therein, respectively. The first semiconductor layer of first conductivity type is bonded to the second semiconductor layer of second conductivity type to thereby define a first rectifying junction at an interface of the bonded semiconductor layers. A piezoelectric layer is formed on the first rectifying junction and at least a first electrode is formed on the piezoelectric layer.
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9 Claims
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1. A method of forming a periodic signal generator, comprising:
forming a microelectromechanical resonator comprising a suspended resonator body having at least two semiconductor layers therein of opposite conductivity type that form a P-N rectifying junction therebetween and a piezoelectric layer on the at least two semiconductor layers. - View Dependent Claims (2, 3)
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4. A method of forming a micromechanical resonator, comprising:
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forming first and second substrates having first and second semiconductor layers of first and second conductivity type therein, respectively, said first substrate comprising a first buried electrically insulating layer therein; bonding the first semiconductor layer of first conductivity type to the second semiconductor layer of second conductivity type to thereby define a first rectifying junction therebetween; forming a piezoelectric layer on the first rectifying junction; and forming at least a first electrode on the piezoelectric layer; wherein said bonding is followed by removing the first buried electrically insulating layer to expose a surface of the first semiconductor layer; and
wherein said forming a piezoelectric layer is preceded by bonding a third semiconductor layer of second conductivity type to the exposed surface of the first semiconductor layer to thereby define a second rectifying junction therebetween.
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5. A method of forming a micromechanical resonator, comprising:
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forming first and second substrates having first and second semiconductor layers of first and second conductivity type therein, respectively; bonding the first semiconductor layer of first conductivity type to the second semiconductor layer of second conductivity type to thereby define a first rectifying junction therebetween; forming a piezoelectric layer on the first rectifying junction; and forming at least a first electrode on the piezoelectric layer. - View Dependent Claims (6, 7, 8, 9)
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Specification