Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide

• US 8,785,559 B2
• Filed: 07/03/2013
• Issued: 07/22/2014
• Est. Priority Date: 06/19/2007
• Status: Active Grant

• Current Assignee: Micron Technology, Inc.
• Original Assignee: Micron Technology, Inc.
• Inventors: Millward, Dan B.
• Primary Examiner(s): JONES JR., ROBERT STOCKTON
• Application Number:
  US13/934,676
• Publication Number:
  US 20130295323A1
• Time in Patent Office: 384 Days
• Field of Search: 525/404, 525/108, 525/187, 528/393, 528/421
• US Class Current: 525/187
• CPC Class Codes: B32B 3/10 characterised by a discontinuous layer, i.e. formed of separate pieces of material
• CPC Class Codes: B81C 1/00031 Regular or irregular arrays of nanoscale structures, e.g. etch mask layer photomechanical, e.g. photolithographic, production of textured or patterned surfaces G03F7/00; lithographic processes for making patterned surfaces using printing and stamping G03F7/0002
• CPC Class Codes: B81C 2201/0149 Forming nanoscale microstructures using auto-arranging or self-assembling material
• CPC Class Codes: B81C 2201/0198 for making a masking layer
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: C08G 81/02 at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds
• CPC Class Codes: G03F 7/12 Production of screen printing forms or similar printing forms, e.g. stencils
• CPC Class Codes: G03F 7/40 Treatment after imagewise removal, e.g. baking
• CPC Class Codes: Y10T 428/24174 including sheet or component perpendicular to plane of web or sheet
• CPC Class Codes: Y10T 428/24182 Inward from edge of web or sheet
• CPC Class Codes: Y10T 428/24521 with component conforming to contour of nonplanar surface
• CPC Class Codes: Y10T 428/24612 Composite web or sheet

Abstract

Methods for fabricating a random graft PS-r-PEO copolymer and its use as a neutral wetting layer in the fabrication of sublithographic, nanoscale arrays of elements including openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. In some embodiments, the films can be used as a template or mask to etch openings in an underlying material layer.

Claims

1. A method of forming a self-assembled block copolymer structure, comprising:

preparing an azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer by;

reacting a reaction mixture comprising p-chloromethylstyrene and styrene to form polymer chains comprising chloromethyl moieties and repeating units derived from p-chloromethylstyrene and styrene, wherein the reaction mixture comprises p-chloromethylstyrene in a molecular amount greater than a molecular amount of the styrene;

reacting the polymer chains with one or more oligomers or polymers of poly(ethylene oxide) to form a graft copolymer comprising chloromethyl moieties, wherein the poly(ethylene oxide) has only one nucleophilic end; and

reacting the graft copolymer comprising chloromethyl moieties with an azide compound to displace chlorine atoms of the chloromethyl moieties to form azidomethyl moieties on the graft copolymer;

forming the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer over at least a portion of a floor of a trench in a substrate to provide a trench having at least one portion of the floor bearing azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer and at least one portion of the floor exposing the substrate;

forming a block copolymer material within the trench in the substrate; and

annealing the block copolymer material to self-assemble the block copolymer material into first and second self-assembled domains of a first polymer block of the block copolymer material in a matrix of a second polymer block, the first self-assembled domains over the at least a portion of the floor of the trench bearing a crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer, the first self-assembled domains oriented perpendicular to the at least a portion of the floor of the trench bearing the crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer and parallel to sidewalk of the trench, the second self-assembled domains over the at least a portion of the floor of the trench exposing the substrate, the second self-assembled domains oriented parallel to the floor and sidewalls of the trench.

3. The method of claim 1, wherein annealing the block copolymer material to self-assemble the block copolymer material comprises:

forming lamella domains over the at least a portion of the floor of the trench bearing the crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer, the lamella domains oriented perpendicular to the at least a portion of the floor of the trench bearing the crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer and parallel to the sidewalls; and

forming half-cylindrical domains over the at least a portion of the floor of the trench exposing the substrate, the half-cylindrical domains oriented parallel to the floor and sidewalls of the trench.

4. The method of claim 1, wherein annealing the block copolymer material to self-assemble the block copolymer material comprises:

forming cylindrical domains over the at least a portion of the floor of the trench bearing the crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer, the cylindrical domains oriented perpendicular to the at least a portion of the floor of the trench bearing the crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer and parallel to the sidewalls; and

forming half-cylindrical domains over the at least a portion of the floor of the trench exposing the substrate, the half-cylindrical domains oriented parallel to the floor and sidewalls of the trench.

5. The method of claim 4, wherein forming cylindrical domains over the at least a portion of the floor of the trench bearing the crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer comprises forming cylindrical domains in a hexagonal array perpendicular to the floor of the trench and parallel to the sidewalls.

6. The method of claim 4, wherein forming cylindrical domains over the at least a portion of the floor of the trench bearing the crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer comprises forming cylindrical domains in a single array perpendicular to the floor of the trench and parallel to the sidewalls.

7. The method of claim 1, further comprising selectively removing the second polymer block of the block copolymer material to provide a self-assembled structure within the trench, the self-assembled structure comprising a plurality of linear openings exposing the substrate and separated by lamellar domains of the first polymer block, the lamellar domains of the first polymer block supported by the at least a portion of the floor of the trench bearing the crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer.

8. The method of claim 1, further comprising selectively removing the first polymer block of the block copolymer material to provide a self-assembled structure within the trench, the self-assembled structure comprising a plurality of linear openings exposing the substrate and separated by lamellar domains of the second polymer block, the lamellar domains of the second polymer block supported by the at least a portion of the floor of the trench bearing the crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer.

9. The method of claim 1, further comprising selectively removing the second polymer block of the block copolymer material to provide a self-assembled structure within the trench, the self-assembled structure comprising a plurality of cylinders of the first polymer block supported by the at least a portion of the floor of the trench bearing the crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer, the plurality of cylinders arranged in a hexagonal array at a pitch distance of about L_o of the block copolymer material, the plurality of cylinders oriented perpendicular to the floor of the trench.

10. The method of claim 1, further comprising selectively removing the second polymer block of the block copolymer material to provide a self-assembled structure within the trench, the self-assembled structure comprising a plurality of cylinders of the first polymer block supported by the at least a portion of the floor of the trench bearing the crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer, the plurality of cylinders arranged in a single array at a pitch distance of about L_o of the block copolymer material, the plurality of cylinders oriented perpendicular to the floor of the trench.

11. The method of claim 1, further comprising selectively removing the first polymer block of the block copolymer material to provide a self-assembled structure within the trench, the self-assembled structure comprising a plurality of cylindrical openings in a hexagonal array within the matrix of the second polymer block, the plurality of cylindrical openings exposing the floor of the trench and oriented perpendicular to the floor of the trench.

12. The method of claim 1, further comprising selectively removing the first polymer block of the block copolymer material to provide a self-assembled structure within the trench, the self-assembled structure comprising a plurality of cylindrical openings in a single array within the matrix of the second polymer block, the plurality of cylindrical openings exposing the floor of the trench and oriented perpendicular to the floor of the trench.

2. A method of forming a self-assembled block copolymer structure, comprising:

preparing an azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer by;

reacting a reaction mixture comprising p-chloromethylstyrene to form a p-chloromethylstyrene homopolymer comprising chloromethyl moieties and repeating units derived from p-chloromethylstyrene;

reacting the p-chloromethylstyrene homopolymer with one or more oligomers or polymers of poly(ethylene oxide) to form a graft copolymer comprising chloromethyl moieties, wherein the poly(ethylene oxide) has only one nucleophilic end; and

reacting the graft copolymer comprising chloromethyl moieties with an azide compound to displace chlorine atoms of the chloromethyl moieties to form azidomethyl moieties on the graft copolymer;

forming the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer over at least a portion of a floor of a trench in a substrate to provide a trench having at least one portion of the floor bearing azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer and at least one portion of the floor exposing the substrate;

forming a block copolymer material within the trench in the substrate; and

annealing the block copolymer material to self-assemble the block copolymer material into first and second self-assembled domains of a first polymer block of the block copolymer material in a matrix of a second polymer block, the first self-assembled domains over the at least a portion of the floor of the trench bearing a crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer, the first self-assembled domains oriented perpendicular to the at least a portion of the floor of the trench bearing the crosslinked material of the azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer and parallel to sidewalls of the trench the second self-assembled domains over the at least a portion of the floor of the trench exposing the substrate, the second self-assembled domains oriented parallel to the floor and sidewalls of the trench.

13. A self-assembled block copolymer structure within a trench in a substrate, the self-assembled block copolymer structure comprising:

first self-assembled domains of a block copolymer material over a crosslinked material of an azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer on at least a portion of a floor of the trench, the first self-assembled domains oriented perpendicular to the floor of the trench, the first self-assembled domains comprising a plurality of lamellar polymer domains at a pitch distance of about L_o of the block copolymer material and separated by linear openings exposing the floor of the trench.

14. The self-assembled block copolymer structure of claim 13, further comprising:

second self-assembled domains of the block copolymer material over at least a portion of the floor of the trench exposing the substrate, the second self-assembled domains comprising half-cylindrical domains oriented parallel to the sidewalls and the floor of the trench.

19. The self-assembled block copolymer structure of claim 13, wherein the block copolymer material comprises poly(styrene-b-ethylene oxide) block copolymer.

20. The self-assembled block copolymer structure of claim 13, wherein the linear openings are about 5 nm to 60 nm wide.

15. A self-assembled block copolymer structure within a trench in a substrate, the self-assembled block copolymer structure comprising:

first self-assembled domains of a block copolymer material over a crosslinked material of an azido-functionalized random poly(styrene-r-ethylene oxide) graft copolymer on at least a portion of a floor of the trench, the first self-assembled domains oriented perpendicular to the floor of the trench and comprising a plurality of cylinders in a hexagonal array at a pitch distance of about L_o of the block copolymer material, the floor of the trench exposed between the self-assembled domains.

16. The self-assembled block copolymer structure of claim 15, further comprising:

second self-assembled domains of the block copolymer material over at least a portion of the floor of the trench exposing the substrate, the second self-assembled domains comprising half-cylindrical domains oriented parallel to the substrate and the sidewalls.

17. A self-assembled block copolymer structure within a trench in a substrate, the self-assembled block copolymer structure comprising:

first self-assembled domains of a block copolymer material over a crosslinked material of an azido-functionalized poly(styrene-r-ethylene oxide) graft copolymer on at least a portion of a floor of the trench, the first self-assembled domains oriented perpendicular to the floor of the trench and comprising a plurality of cylinders in a single array at a pitch distance of about L_o of the block copolymer material, the floor of the trench exposed between the self-assembled domains.

18. The self-assembled block copolymer structure of claim 17, further comprising:

second self-assembled domains of the block copolymer material over at least a portion of the floor of the trench exposing the substrate, the second self-assembled domains comprising half-cylindrical domains oriented parallel to the substrate and the sidewalls.