Method of making wafer structure for backside illuminated color image sensor
First Claim
Patent Images
1. A method comprising:
- providing a semiconductor substrate having a substantially planar front surface and a back surface;
forming a first pixel and a second pixel on the substantially planar front surface of the semiconductor substrate; and
forming a first portion of the semiconductor substrate having a first thickness and a second portion of the semiconductor substrate having a second thickness, wherein the first portion having the first thickness is aligned with the first pixel and the second portion having the second thickness is aligned with the second pixel.
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Abstract
An integrated circuit device is provided. The integrated circuit device can include a substrate; a first radiation-sensing element disposed over a first portion of the substrate; and a second radiation-sensing element disposed over a second portion of the substrate. The first portion comprises a first radiation absorption characteristic, and the second portion comprises a second radiation absorption characteristic different from the first radiation absorption characteristic.
72 Citations
20 Claims
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1. A method comprising:
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providing a semiconductor substrate having a substantially planar front surface and a back surface; forming a first pixel and a second pixel on the substantially planar front surface of the semiconductor substrate; and forming a first portion of the semiconductor substrate having a first thickness and a second portion of the semiconductor substrate having a second thickness, wherein the first portion having the first thickness is aligned with the first pixel and the second portion having the second thickness is aligned with the second pixel. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method comprising:
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forming a first radiation-sensing element and a second radiation-sensing element on a substantially planar first surface of a substrate; and removing portions of the substrate such that the substrate has a first thickness and a second thickness, wherein the first thickness and the second thickness are between the substantially planar first surface and a second surface of the substrate, and wherein the first thickness is aligned with the first radiation-sensing element and the second thickness is aligned with the second radiation-sensing element. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A method comprising:
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providing a substrate having a substantially planar first surface and an opposing second surface; forming a first pixel and a second pixel on the substantially planar first surface of the substrate; and removing portions of the substrate such that the substrate has a first thickness and a second a second thickness, wherein the first thickness is aligned with the first pixel and the second thickness is aligned with the second pixel. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification