Drawing apparatus, and method of manufacturing article

• US 8,791,431 B2
• Filed: 12/13/2013
• Issued: 07/29/2014
• Est. Priority Date: 12/19/2012
• Status: Expired due to Fees

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: Tanaka, Ichiro
• Primary Examiner(s): Souw, Bernard E
• Application Number:
  US14/106,027
• Publication Number:
  US 20140168628A1
• Time in Patent Office: 228 Days
• Field of Search: 250/396.R, 250/398, 250/491.1, 250/492.2, 250/492.21, 250/492.22, 250/492.3, 204/157.44, 204/157.47, 204/157.63, 422/186, 422/186.05, 422/186.06, 422/186.07
• US Class Current: 250/492.2
• CPC Class Codes: H01J 2237/006 Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece, H01J37/3244 takes precedence; environmental cells for electron microscopes H01J2237/2003; microscopes with environmental specimen chamber H01J2237/2608
• CPC Class Codes: H01J 2237/022 Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
• CPC Class Codes: H01J 2237/182 Obtaining or maintaining desired pressure
• CPC Class Codes: H01J 37/16 Vessels; Containers
• CPC Class Codes: H01J 37/3174 Particle-beam lithography, e.g. electron beam lithography

Abstract

The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus including a first member in which an aperture, through which the charged particle beam passes, is formed, a chamber including a first space and a second space which are partitioned by the first member, and a removing device including a first supply device configured to supply a first gas containing unsaturated hydrocarbon to the first space and a second supply device configured to supply a second gas containing ozone to the second space, and configured to remove contamination on the first member by active species generated by reaction of the first gas with the second gas.

Claims

1. A drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus comprising:

a first member in which an aperture, through which the charged particle beam passes, is formed;

a chamber including a first space and a second space which are partitioned by the first member; and

a removing device including a first supply device configured to supply a first gas containing unsaturated hydrocarbon to the first space and a second supply device configured to supply a second gas containing ozone to the second space, and configured to remove contamination on the first member by active species generated by reaction of the first gas with the second gas.

2. The apparatus according to claim 1, further comprising:

a regulator configured to regulate a gas pressure in at least one of the first space and the second space; and

a controller configured to control the regulator so as to form a gas pressure difference between the first space and the second space.

3. The apparatus according to claim 2, further comprising a stage disposed in one of the first space and the second space, and configured to hold the substrate and to be moved,

wherein the controller is configured to control the regulator so that a gas pressure in the other of the first space and the second space is higher than that of the one of the first space and the second space.

4. The apparatus according to claim 2, wherein the controller is configured to control the regulator so that the gas pressure difference changes with time.

5. The apparatus according to claim 4, wherein the controller is configured to control the regulator so that a magnitude relation between a gas pressure in the first space and a gas pressure in the second space is inverted with time.

6. The apparatus according to claim 1, wherein the first member includes at least one of an electrode member included in a charged particle optical system, an aperture array member for dividing a charged particle beam into a plurality of charged particle beams, and an aperture member for blanking a charged particle beam.

7. The apparatus according to claim 2, further comprising a charged particle source disposed in one of the first space and the second space, and configured to generate the charged particle beam,

wherein the controller is configured to control the regulator so that a gas pressure in the other of the first space and the second space is higher than that of the one of the first space and the second space.

8. The apparatus according to claim 1, further comprising a second member in which an aperture, through which the charged particle beam passes, is formed,

wherein the first supply device is configured to supply the first gas to the first space via a third space partitioned by the second member.

9. The apparatus according to claim 1, further comprising a second member in which an aperture, through which the charged particle beam passes, is formed,

wherein the second supply device is configured to supply the second gas to the second space via a third space partitioned by the second member.

10. The apparatus according to claim 1, further comprising a second member in which an aperture, through which the charged particle beam passes, is formed,

wherein the removing device includes a supply device configured to supply a third gas containing an inert gas to the first space via a third space partitioned by the second member.

11. The apparatus according to claim 1, further comprising a second member in which an aperture, through which the charged particle beam passes, is formed,

wherein the removing device includes a supply device configured to supply a third gas containing an inert gas to the second space via a third space partitioned by the second member.

12. The apparatus according to claim 1, further comprising a third member disposed in one of the first space and the second space, and configured to divide the one of the first space and the second space into a fourth space, which neighbors the other of the first space and the second space, and a fifth space outside the fourth space,

wherein the removing device includes a supply device configured to supply a gas, corresponding to the one of the first space and the second space, of the first gas and the second gas to the fourth space.

13. The apparatus according to claim 12, wherein the third member is a movable object.

14. The apparatus according to claim 13, wherein the movable object is a stage.

15. The apparatus according to claim 13, wherein the third member includes a sensor configured to measure the charged particle beam.

16. A method of manufacturing an article, the method comprising:

performing drawing on a substrate using a drawing apparatus;

developing the substrate on which the drawing has been performed; and

processing the developed substrate to manufacture the article,

wherein the drawing apparatus performs drawing on the substrate with a charged particle beam, and includes;

a first member in which an aperture, through which the charged particle beam passes, is formed;

a chamber including a first space and a second space which are partitioned by the first member; and

a removing device including a first supply device configured to supply a first gas containing unsaturated hydrocarbon to the first space and a second supply device configured to supply a second gas containing ozone to the second space, and configured to remove contamination on the first member by active species generated by reaction of the first gas with the second gas.