Semiconductor memory device and driving method thereof
First Claim
1. A semiconductor device comprising:
- a first line;
a second line;
a third line;
a fourth line; and
a memory cell comprising;
a first transistor;
a second transistor; and
a capacitor,wherein one of a source and a drain of the first transistor is electrically connected to a gate of the second transistor and one of electrodes of the capacitor,wherein a gate of the first transistor is electrically connected to the first line,wherein one of a source and a drain of the second transistor is electrically connected to the third line,wherein the other of the source and the drain of the second transistor is electrically connected to the fourth line,wherein the other of electrodes of the capacitor is electrically connected to the second line,wherein the first transistor comprises a semiconductor layer including an oxide semiconductor,wherein an area of the capacitor is less than 2 times an area of a channel region of the second transistor,wherein the semiconductor device is configured to write a plurality of stages of data to the memory cell,wherein the semiconductor device is configured to read the plurality of stages of data from the memory cell, andwherein the plurality of stages of data is larger than or equal to three stages of data.
2 Assignments
0 Petitions
Accused Products
Abstract
A semiconductor device which stores data by using a transistor whose leakage current between source and drain in an off state is small as a writing transistor. In a matrix including a plurality of memory cells in which a drain of the writing transistor is connected to a gate of a reading transistor and the drain of the writing transistor is connected to one electrode of a capacitor, a gate of the writing transistor is connected to a writing word line; a source of the writing transistor is connected to a writing bit line; and a source and a drain of the reading transistor are connected to a reading bit line and a bias line. In order to reduce the number of wirings, the writing bit line or the bias line is substituted for the reading bit line in another column.
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Citations
10 Claims
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1. A semiconductor device comprising:
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a first line; a second line; a third line; a fourth line; and a memory cell comprising; a first transistor; a second transistor; and a capacitor, wherein one of a source and a drain of the first transistor is electrically connected to a gate of the second transistor and one of electrodes of the capacitor, wherein a gate of the first transistor is electrically connected to the first line, wherein one of a source and a drain of the second transistor is electrically connected to the third line, wherein the other of the source and the drain of the second transistor is electrically connected to the fourth line, wherein the other of electrodes of the capacitor is electrically connected to the second line, wherein the first transistor comprises a semiconductor layer including an oxide semiconductor, wherein an area of the capacitor is less than 2 times an area of a channel region of the second transistor, wherein the semiconductor device is configured to write a plurality of stages of data to the memory cell, wherein the semiconductor device is configured to read the plurality of stages of data from the memory cell, and wherein the plurality of stages of data is larger than or equal to three stages of data. - View Dependent Claims (2, 3, 4)
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5. A semiconductor device comprising:
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a first line; a second line; a third line; a fourth line; and a memory cell comprising; a first transistor; a second transistor; and a capacitor, wherein one of a source and a drain of the first transistor is electrically connected to a gate of the second transistor and one of electrodes of the capacitor, wherein a gate of the first transistor is electrically connected to the first line, wherein one of a source and a drain of the second transistor is electrically connected to the third line, wherein the other of the source and the drain of the second transistor is electrically connected to the fourth line, wherein the other of electrodes of the capacitor is electrically connected to the second line, wherein the first transistor comprises a semiconductor layer including an oxide semiconductor, wherein the semiconductor device is configured to write a plurality of stages of data to the memory cell, wherein the semiconductor device is configured to read the plurality of stages of data from the memory cell, wherein the plurality of stages of data is larger than or equal to three stages of data, and wherein leakage current between the source and the drain of the first transistor in an off state is 1×
10−
20 A or smaller at a temperature of 25°
C. - View Dependent Claims (6)
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7. A semiconductor device comprising:
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a first line; a second line; a third line; a fourth line; and a memory cell comprising; a first transistor; a second transistor; and a capacitor, wherein one of a source and a drain of the first transistor is electrically connected to a gate of the second transistor and one of electrodes of the capacitor, wherein a gate of the first transistor is electrically connected to the first line, wherein one of a source and a drain of the second transistor is electrically connected to the third line, wherein the other of the source and the drain of the second transistor is electrically connected to the fourth line, wherein the other of electrodes of the capacitor is electrically connected to the second line, wherein the first transistor comprises a semiconductor layer including an oxide semiconductor, wherein an area of the capacitor is less than 2 times an area of a channel region of the second transistor, wherein the semiconductor device is configured to write a plurality of stages of data to the memory cell, wherein the semiconductor device is configured to read the plurality of stages of data from the memory cell, wherein the plurality of stages of data is larger than or equal to three stages of data, wherein the semiconductor layer includes a first impurity region and a second impurity region, and wherein the first impurity region and the second impurity region are formed in a self-aligned manner with respect to the gate of the first transistor. - View Dependent Claims (8, 9, 10)
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Specification