Methods and apparatus for insitu analysis of gases in electronic device fabrication systems

• US 8,813,538 B2
• Filed: 09/20/2011
• Issued: 08/26/2014
• Est. Priority Date: 07/31/2006
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Carlson, David K., Kuppurao, Satheesh
• Primary Examiner(s): Raevis, Robert R
• Application Number:
  US13/237,144
• Publication Number:
  US 20120006092A1
• Time in Patent Office: 1,071 Days
• Field of Search: None
• US Class Current: 73/23.31
• CPC Class Codes: G01N 33/0016 by regulating a physical variable, e.g. pressure or temperature
• CPC Class Codes: Y10T 137/85978 With pump

Abstract

Systems and methods are disclosed that include adjusting a pressure level of a sample gas in a testing chamber, for example, using a pressurized inert reference gas, and determining a composition of the adjusted sample gas. By adjusting the pressure level of the sample gas, the composition of the sample gas may be determined more accurately than otherwise possible. Numerous other aspects are disclosed.

Claims

1. A method for testing a sample gas comprising:

adjusting a pressure level of a sample gas; and

determining a composition of the adjusted sample gas;

wherein the adjusting includes adjusting the pressure level from a low pressure at which measurement by spectroscopy would not be accurate to a higher pressure within a high enough suitable range at which the composition of the sample gas is capable of being accurately determined by spectroscopy; and

wherein adjusting the pressure level includes;

adding additional sample gas to the sample gas in an isolatable chamber; and

controlling a booster pump and a variable outlet orifice.

2. The method of claim 1 wherein adjusting the pressure level includes receiving pressure information from a pressure monitor.

3. The method of claim 1 wherein adjusting the pressure level includes isolating the isolatable chamber once the desired pressure range is achieved.

4. The method of claim 1 wherein determining a composition of the adjusted sample gas includes measuring a pressure of the sample gas before and after the pressure level of the sample gas is adjusted.

5. A system for testing sample gases comprising:

a processing tool having a plurality of isolatable spaces containing gases to be tested;

a measurement device comprising a chamber adapted to contain a sample gas to be tested;

a fitting for selectively coupling the chamber to the plurality of spaces;

a controller adapted to adjust a pressure level of the sample gas in the chamber;

wherein the adjustment includes adjusting the pressure level from a low pressure at which measurement by spectroscopy would not be accurate to a higher pressure within a high enough suitable range at which a composition of the sample gas is capable of being accurately determined by spectroscopy; and

wherein the controller is coupled to a sample gas supply and a booster pump.

6. The system of claim 5 wherein the booster pump operates at a fixed rate.

7. The system of claim 5 wherein the measurement device comprises a spectrophotometer.

8. The system of claim 5 further comprising a pressure monitor coupled to the controller and configured to provide gas pressure information to the controller.