Electron beam writing apparatus and electron beam writing method
First Claim
1. An electron beam writing apparatus comprising a control unit and a writing unit having an electron optical column and a writing chamber, comprising;
- a stage on which a sample is placed in the writing unit;
an electron gun unit, which is disposed in the electron optical column, configured to emit an electron beam;
a shield plate, which is disposed between the stage and the electron optical column, configured to reduce reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam from entering the electron optical column; and
an electrostatic lens positioned in an axial direction of the electron beam in the electron optical column,wherein the electrostatic lens is disposed immediately above the shield plate and is supplied with negative voltage, from a voltage supply device, constantly during writing patterns on the sample, and is configured to block the reflected electrons or the secondary electrons from entering the electron optical column.
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Accused Products
Abstract
An electron beam writing apparatus comprising a XY stage that a sample is placed on, an electron optical column, an electron gun emitting an electron beam disposed in the optical column, an electrostatic lens provided with electrodes aligned in an axial direction of the electron beam disposed in the optical column, wherein a shield plate is disposed between the XY stage and the electron optical column to block reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam. The electrostatic lens is disposed immediately above the shield plate to change a focal position of the electron beam. A voltage supply device applies a negative voltage constantly to the electrostatic lens.
38 Citations
13 Claims
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1. An electron beam writing apparatus comprising a control unit and a writing unit having an electron optical column and a writing chamber, comprising;
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a stage on which a sample is placed in the writing unit; an electron gun unit, which is disposed in the electron optical column, configured to emit an electron beam; a shield plate, which is disposed between the stage and the electron optical column, configured to reduce reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam from entering the electron optical column; and an electrostatic lens positioned in an axial direction of the electron beam in the electron optical column, wherein the electrostatic lens is disposed immediately above the shield plate and is supplied with negative voltage, from a voltage supply device, constantly during writing patterns on the sample, and is configured to block the reflected electrons or the secondary electrons from entering the electron optical column. - View Dependent Claims (2, 3, 4)
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5. An electron beam writing apparatus comprising a control unit and a writing unit having an electron optical column and a writing chamber, comprising;
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a stage on which a sample is placed in the writing unit; an electron gun unit, which is disposed in the electron optical column, configured to emit an electron beam; a shield plate, which is disposed between the stage and the electron optical column, configured to reduce reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam from entering the electron optical column; an electrostatic lens aligned in an axial direction of the electron beam in the electron optical column, wherein the electrostatic lens is disposed immediately above the shield plate; and a retarding electrode disposed immediately above the electrostatic lens and supplied with negative voltage constantly, from a voltage supply device, during writing patterns on the sample, and is configured to block the reflected electrons or the secondary electrons from entering the electron optical column. - View Dependent Claims (6, 7, 8)
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9. An electron beam writing method comprising:
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writing a predetermined pattern on a sample placed on a stage by emitting an electron beam from an electron gun disposed in an electron optical column, wherein a negative voltage is constantly applied to an electrostatic lens for changing a focal position of the electron beam or a retarding electrode disposed immediately above the electrostatic lens, during the writing of the predetermined pattern on the sample to block reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam from entering the electron optical column. - View Dependent Claims (10, 11, 12, 13)
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Specification