×

Method for defect reduction in magnetic write head fabrication

  • US 8,828,248 B2
  • Filed: 02/01/2013
  • Issued: 09/09/2014
  • Est. Priority Date: 02/01/2013
  • Status: Active Grant
First Claim
Patent Images

1. A method of making a write pole for a perpendicular magnetic recording write head, comprising:

  • forming a photoresist mask over a dielectric hard mask layer of a stack such that the photoresist mask covers a first portion of the dielectric hard mask layer and leaves a second portion exposed, wherein the stack comprises;

    a layer of magnetic material formed over a substrate;

    a layer of non-magnetic material formed over the layer of magnetic material;

    a polymeric underlayer formed over the layer of non-magnetic material; and

    the dielectric hard mask layer formed over the polymeric underlayer;

    performing a first reactive ion etch process to remove the exposed second portion of the dielectric hard mask layer such that a portion of the polymeric underlayer is exposed and a dielectric hard mask is formed, wherein a first portion of the first reactive ion etch process comprises exposing the second portion of the dielectric hard mask layer to an etching gas comprising CF4 and CHF3, wherein a ratio of CF4 to CHF3 in the first portion is between about 1.3 and about 2, wherein a second portion of the first reactive ion etch process uses an etching gas comprising CF4, and CHF3, and wherein a gas flow ratio of CF4 to CHF3 in the second portion is between about 0.3 to 0.8; and

    performing a second reactive ion etch process to remove the exposed polymeric underlayer to expose the layer of non-magnetic material.

View all claims
  • 6 Assignments
Timeline View
Assignment View
    ×
    ×