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Methods and apparatuses for energetic neutral flux generation for processing a substrate

  • US 8,828,883 B2
  • Filed: 08/24/2010
  • Issued: 09/09/2014
  • Est. Priority Date: 08/24/2010
  • Status: Active Grant
First Claim
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1. A method of treating a substrate, comprising:

  • forming a plasma in a processing chamber by applying a DC voltage to an electrode associated with the processing chamber but electrically decoupled from the substrate, the DC voltage of sufficient amplitude to cause the plasma to form;

    accelerating ions of the plasma to become energetic ions moving toward the substrate disposed in the processing chamber by maintaining the DC voltage on the electrode for a first duration;

    neutralizing at least some of the energetic ions to generate energetic neutrals moving toward the substrate by removing the DC voltage from the electrode for a second duration sufficient to;

    enable the at least some of the energetic ions to be neutralized by combining with electrons before reaching the substrate; and

    retain a kinetic energy of the energetic neutrals toward the substrate; and

    impacting the substrate with at least some of the energetic neutrals.

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