Pressure controlling apparatus
First Claim
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1. A pressure controlling apparatus that controls pressure of a processing gas in a processing chamber of a plasma processing apparatus that generates plasma from a processing gas introduced into the processing chamber and processes a processing target substrate, the pressure controlling apparatus comprising:
- a pressure sensor configured to detect pressure of a processing gas in the processing chamber;
an exhaust pipe that is communicated with the processing chamber and has a central axis passing a center of the processing chamber;
a regulating valve arranged in the exhaust pipe; and
a pressure controller configured to control the regulating valve so that pressure detected by the pressure sensor matches a target value, whereinthe regulating valve includesa valve port communicated with the exhaust pipe,a changing mechanism configured to change a shape of the valve port to a different shape whose center is located near the central axis of the exhaust pipe, anda slide valve that regulates an opening degree of the valve port changed by the changing mechanism, andthe pressure controller controls changing of a shape of the valve port by the changing mechanism and regulation of an opening degree of the valve port by the slide valve,and wherein the changing mechanism includes an orifice unit that has an opening having an area smaller than the valve port and, by inserting the orifice unit into the valve port, changes an area of the valve port to an area smaller than an area before inserting the orifice unit,the orifice unit is inserted into a position spaced from the slide valve and is moved to approach the slide valve along a flow path of the valve port, andthe orifice unit includesa tubular member that defines the valve port,a first hollow plate that extends outwardly from an end portion of the tubular member on the slide valve side, anda second hollow plate that extends outwardly from an end portion of the tubular member on an opposite side of the slide valve.
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0 Petitions
Accused Products
Abstract
According to one embodiment, there is provided pressure controlling apparatus including a detecting unit, an exhaust pipe, a regulating valve, and a pressure controlling unit. The regulating valve includes a valve port, a changing unit, and a slide valve. The valve port is communicated with the exhaust pipe. The changing unit changes a shape of the valve port to a different shape whose center is located near the central axis of the exhaust pipe. The slide valve regulates an opening degree of the valve port changed by the changing unit. The pressure controlling unit controls changing of a shape of the valve port by the changing unit and regulation of an opening degree of the valve port by the slide valve.
43 Citations
15 Claims
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1. A pressure controlling apparatus that controls pressure of a processing gas in a processing chamber of a plasma processing apparatus that generates plasma from a processing gas introduced into the processing chamber and processes a processing target substrate, the pressure controlling apparatus comprising:
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a pressure sensor configured to detect pressure of a processing gas in the processing chamber; an exhaust pipe that is communicated with the processing chamber and has a central axis passing a center of the processing chamber; a regulating valve arranged in the exhaust pipe; and a pressure controller configured to control the regulating valve so that pressure detected by the pressure sensor matches a target value, wherein the regulating valve includes a valve port communicated with the exhaust pipe, a changing mechanism configured to change a shape of the valve port to a different shape whose center is located near the central axis of the exhaust pipe, and a slide valve that regulates an opening degree of the valve port changed by the changing mechanism, and the pressure controller controls changing of a shape of the valve port by the changing mechanism and regulation of an opening degree of the valve port by the slide valve, and wherein the changing mechanism includes an orifice unit that has an opening having an area smaller than the valve port and, by inserting the orifice unit into the valve port, changes an area of the valve port to an area smaller than an area before inserting the orifice unit, the orifice unit is inserted into a position spaced from the slide valve and is moved to approach the slide valve along a flow path of the valve port, and the orifice unit includes a tubular member that defines the valve port, a first hollow plate that extends outwardly from an end portion of the tubular member on the slide valve side, and a second hollow plate that extends outwardly from an end portion of the tubular member on an opposite side of the slide valve. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A pressure controlling apparatus that controls pressure of a processing gas in a processing chamber of a plasma processing apparatus that generates plasma from a processing gas introduced into the processing chamber and processes a processing target substrate, the pressure controlling apparatus comprising:
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a pressure sensor configured to detect pressure of a processing gas in the processing chamber; an exhaust pipe that is communicated with the processing chamber and has a central axis passing a center of the processing chamber; a regulating valve arranged in the exhaust pipe; and a pressure controller configured to control the regulating valve so that pressure detected by the pressure sensor matches a target value, wherein the regulating valve includes a valve port communicated with the exhaust pipe, a changing mechanism configured to change a shape of the valve port to a different shape whose center is located near the central axis of the exhaust pipe, and a throttle mechanism that continuously changes an opening degree of the valve port changed by the changing mechanism so as to close from a periphery toward a center of the valve port along a plane substantially perpendicular to the central axis of the exhaust pipe with maintaining a state that the valve port is free from obstacles, and the pressure controller controls changing of a shape of the valve port by the changing mechanism and continuously changing of an opening degree of the valve port by the throttle mechanism; wherein the throttle mechanism includes; a doughnut-shaped member that has an opening corresponding to the valve port and a plurality of rails extending away from the opening, a plurality of blades travelling along the rails, and a plurality of ball bearings provided on the rails. - View Dependent Claims (14, 15)
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Specification
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Current AssigneeKioxia Corporation
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Original AssigneeKabushiki Kaisha Toshiba (Toshiba Corporation)
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InventorsEto, Hideo, Saito, Makoto, Nishiyama, Nobuyasu
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Primary Examiner(s)Houston, Elizabeth
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Assistant Examiner(s)LE, MINH Q
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Application NumberUS13/416,349Publication NumberTime in Patent Office921 DaysField of Search251/212, 251/205, 251/206, 251/158, 137/487.5, 137/613, 137/614, 156/345.26, 156/345.24, 156/345.15US Class Current137/487.5CPC Class CodesG05D 16/202 actuated by an electric motorH01L 21/67253 Process monitoring, e.g. fl...Y10T 137/1624 Destructible or deformable ...Y10T 137/7761 Electrically actuated valveY10T 137/87917 Flow path with serial valve...Y10T 137/87925 Separable flow path section...
