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Apparatus for thin-film deposition

  • US 8,840,726 B2
  • Filed: 06/08/2011
  • Issued: 09/23/2014
  • Est. Priority Date: 06/08/2011
  • Status: Active Grant
First Claim
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1. An apparatus for depositing a thin film onto a surface of a substrate using precursor gases, the apparatus comprising:

  • a supporting device configured to hold the substrate; and

    a spinner positioned adjacent to the supporting device, the spinner having;

    a hub for connecting to a motor; and

    one or more blades connected to the hub,wherein the one or more blades are operative to rotate around the hub on a plane to drive a fluid flow of the precursor gases, so as to distribute the precursor gases across the surface of the substrate; and

    each of the one or more blades has a drive face inclined at an oblique angle to the plane for driving the distribution of the precursor gases across the surface of the substrate.

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