Semiconductor device
First Claim
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1. A semiconductor device comprising:
- a gate electrode;
a gate insulating film over the gate electrode;
a pair of electrodes over the gate insulating film;
an oxide semiconductor film which at least partially overlaps with the gate electrode and is at least partially in contact with the pair of electrodes; and
an insulating film over the oxide semiconductor film,wherein at least one of the gate insulating film and the insulating film includes a silicon oxide film having a negative fixed charge and an oxygen-excess silicon oxide film,wherein a first edge of the gate electrode, a second edge of the pair of electrodes, and a third edge of the oxide semiconductor film are parallel to a channel length direction when seen from above, andwherein the first edge is between the second edge and the third edge in a channel width direction when seen from above.
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Abstract
Provided is a highly reliable semiconductor device by giving stable electric characteristics to a transistor in which a semiconductor film whose threshold voltage is difficult to control is used as an active layer. By using a silicon oxide film having a negative fixed charge as a film in contact with the active layer of the transistor or a film in the vicinity of the active layer, a negative electric field is always applied to the active layer due to the negative fixed charge and the threshold voltage of the transistor can be shifted in the positive direction. Thus, the highly reliable semiconductor device can be manufactured by giving stable electric characteristics to the transistor.
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Citations
24 Claims
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1. A semiconductor device comprising:
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a gate electrode; a gate insulating film over the gate electrode; a pair of electrodes over the gate insulating film; an oxide semiconductor film which at least partially overlaps with the gate electrode and is at least partially in contact with the pair of electrodes; and an insulating film over the oxide semiconductor film, wherein at least one of the gate insulating film and the insulating film includes a silicon oxide film having a negative fixed charge and an oxygen-excess silicon oxide film, wherein a first edge of the gate electrode, a second edge of the pair of electrodes, and a third edge of the oxide semiconductor film are parallel to a channel length direction when seen from above, and wherein the first edge is between the second edge and the third edge in a channel width direction when seen from above. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A semiconductor device comprising:
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a base insulating film; an oxide semiconductor film over the base insulating film; a pair of electrodes at least partially in contact with the oxide semiconductor film; a gate insulating film over the oxide semiconductor film; and a gate electrode which at least partially overlaps with the oxide semiconductor film with the gate insulating film interposed therebetween, wherein at least one of the base insulating film and the gate insulating film includes a silicon oxide film having a negative fixed charge and an oxygen-excess silicon oxide film, wherein a first edge of the gate electrode, a second edge of the pair of electrodes, and a third edge of the oxide semiconductor film are parallel to a channel length direction when seen from above, and wherein the first edge is between the second edge and the third edge in a channel width direction when seen from above. - View Dependent Claims (8, 9, 10, 11, 12)
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13. A semiconductor device comprising:
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a gate electrode; a gate insulating film over the gate electrode; a pair of electrodes over the gate insulating film; an oxide semiconductor film which at least partially overlaps with the gate electrode and is at least partially in contact with the pair of electrodes; and an insulating film over the oxide semiconductor film, wherein at least one of the gate insulating film and the insulating film comprises a silicon oxide film including an impurity selected from the group consisting of B, Ga, In, and a combination thereof and an oxygen-excess silicon oxide film, wherein a first edge of the gate electrode, a second edge of the pair of electrodes, and a third edge of the oxide semiconductor film are parallel to a channel length direction when seen from above, and wherein the first edge is between the second edge and the third edge in a channel width direction when seen from above. - View Dependent Claims (14, 15)
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16. A semiconductor device comprising:
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a base insulating film; an oxide semiconductor film over the base insulating film; a pair of electrodes at least partially in contact with the oxide semiconductor film; a gate insulating film over the oxide semiconductor film; and a gate electrode which at least partially overlaps with the oxide semiconductor film with the gate insulating film interposed therebetween, wherein at least one of the base insulating film and the gate insulating film comprises a silicon oxide film including an impurity selected from the group consisting of B, Ga, In, and a combination thereof and an oxygen-excess silicon oxide film, wherein a first edge of the gate electrode, a second edge of the pair of electrodes, and a third edge of the oxide semiconductor film are parallel to a channel length direction when seen from above, and wherein the first edge is between the second edge and the third edge in a channel width direction when seen from above. - View Dependent Claims (17, 18)
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19. A semiconductor device comprising:
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a gate electrode; a gate insulating film over the gate electrode; a pair of electrodes over the gate insulating film; an oxide semiconductor film which at least partially overlaps with the gate electrode and is at least partially in contact with the pair of electrodes; and an insulating film over the oxide semiconductor film, wherein at least one of the gate insulating film and the insulating film comprises an oxygen-excess silicon oxide film having a negative fixed charge, wherein a first edge of the gate electrode, a second edge of the pair of electrodes, and a third edge of the oxide semiconductor film are parallel to a channel length direction when seen from above, and wherein the first edge is between the second edge and the third edge in a channel width direction when seen from above. - View Dependent Claims (20, 21, 22)
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23. A semiconductor device comprising:
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a gate electrode; a gate insulating film over the gate electrode; a pair of electrodes over the gate insulating film; a semiconductor film which at least partially overlaps with the gate electrode and is at least partially in contact with the pair of electrodes; and an insulating film over the semiconductor film, wherein at least one of the gate insulating film and the insulating film comprises a silicon oxide film including an impurity selected from the group consisting of B, Ga, In, and a combination thereof, wherein a first edge of the gate electrode, a second edge of the pair of electrodes, and a third edge of the semiconductor film are parallel to a channel length direction when seen from above, and wherein the first edge is between the second edge and the third edge in a channel width direction when seen from above. - View Dependent Claims (24)
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Specification