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Metal-insulator-metal capacitors with high capacitance density

  • US 8,847,354 B2
  • Filed: 01/24/2013
  • Issued: 09/30/2014
  • Est. Priority Date: 12/15/2010
  • Status: Active Grant
First Claim
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1. A metal-insulator-metal (MIM) capacitor comprising:

  • a first interlayer dielectric (ILD) layer having a top surface, a plurality of apertures, a first surface area with a perimeter surrounding the apertures, and a second surface area surrounding the first surface area, each aperture including a plurality of sidewalls that extend from the top surface of the first ILD layer into the first ILD layer;

    a conformal dielectric layer on the top surface of the first ILD layer and the sidewalls of the apertures; and

    a layer stack on the conformal dielectric layer, the layer stack including a first electrode and a capacitor dielectric layer, and the first electrode separated from the first ILD layer by the conformal dielectric layer.

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