Apparatus, system, and method for controlling a matching network based on information characterizing a cable

• US 8,847,561 B2
• Filed: 12/14/2008
• Issued: 09/30/2014
• Est. Priority Date: 05/07/2008
• Status: Active Grant

• Current Assignee: AES Global Holdings Pte Ltd. (Advanced Energy Industries, Inc. (China))
• Original Assignee: Advanced Energy Industries Incorporated
• Inventors: Karlicek, Tom, van Zyl, Gideon J., Sanford, Lane
• Primary Examiner(s): Berhane, Adolf
• Assistant Examiner(s): Quddus, Nusrat
• Application Number:
  US12/334,490
• Publication Number:
  US 20090278512A1
• Time in Patent Office: 2,116 Days
• Field of Search: 323/208, 323232-233, 323282-284, 323/285, 438/31
• US Class Current: 323/208
• CPC Class Codes: H01J 37/32174 Circuits specially adapted for controlling the RF discharge
• CPC Class Codes: H01J 37/32183 Matching circuits
• CPC Class Codes: H03H 7/40 Automatic matching of load impedance to source impedance
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence

Abstract

An apparatus, system and method are described that enable an impedance of a plasma load to be matched with a power generator. In some embodiments the apparatus includes a power output adapted to apply power that is utilized to energize a plasma; a sensor adapted to sample power applied at the power output so as to obtain power samples; and an impedance control output configured to provide, responsive to the power samples, an impedance-control signal that enables an impedance matching network connected to the output of the power generator and to the impedance control output to match, responsive to the an impedance-control signal, the impedance of the plasma to the operating impedance of the power generator.

Claims

1. A power generator for plasma processing comprising:

a power output adapted to apply power that is utilized to energize a plasma via a cable;

a sensor adapted to sample power applied at the power output so as to obtain power samples; and

an impedance control output configured to provide, responsive to the power samples and information characterizing the cable, an impedance-control signal that enables an impedance matching network connected to the output of the power generator and to the impedance control output to match, responsive to the impedance-control signal, the impedance of the plasma to the operating impedance of the power generator;

wherein

the information characterizing the cable comprises a length of the cable; and

the power generator is configured to automatically determine the length of the cable between the power generator and the match network based on impedance measured at the power generator and an impedance measured at the power generator while applying power such that the plasma remains unignited.

2. The power generator of claim 1, including:

a memory configured to store the information characterizing the cable that couples the power generator to the impedance matching network, and wherein the power generator is configured to provide the impedance control signal responsive to the information characterizing the cable.

3. The power generator of claim 2, including:

a user interface configured to enable a user to input at least a portion of the information that characterizes the cable.

4. The power generator of claim 3, including an impedance-control-logic portion configured to generate the content of the impedance-control signal responsive to the length of the cable and the power samples.

5. The power generator of claim 1, wherein the sensor includes a sensor selected from the group consisting of a voltage-current sensor and a directional coupler.

6. The power generator of claim 1, wherein the power output is adapted to apply RF power.

7. A method for delivering power to a plasma load comprising:

generating power at a power generator, wherein the power is utilized to energize a plasma;

providing the power to a power output of the power generator, the power output configured to couple the power generator to an impedance matching network via a cable;

sampling the power at the power output so as to obtain power samples, and

providing, responsive to the power samples and information characterizing the cable, the information characterizing the cable comprising a length of the cable, an impedance control signal to an impedance control output, so as to enable an impedance matching network that is coupled to the impedance control output to be controlled by the signal; and

determining, based on the power samples and an impedance measured at the power generator while applying power such that the plasma remains unignited, the length of the cable between the power generator and the match network.

8. The method of claim 7, including:

storing, in a memory of the power generator, the information characterizing the cable that couples the power generator to the impedance matching network, and wherein the power generator is configured to provide the impedance control signal responsive to the information characterizing the cable.

9. The method of claim 8, including:

receiving at least a portion of the information that characterizes the cable from a user via a user interface.

10. The method of claim 8, including:

generating the content of the impedance-control signal responsive to the length of the cable and the power samples.

11. The method of claim 7, wherein the power samples include information indicative of forward and reverse voltage information.

12. A power delivery system for plasma processing comprising:

a power generator including;

a power output configured to provide power via a cable,

a sensor to measure parameters of power delivered by the power output and information characterizing the cable, the information characterizing the cable including a length of the cable,

logic configured to calculate the length of the cable based on the parameters of power and an impedance measured at the power generator while applying power such that the plasma remains unignited, and

an impedance control output configured to provide an impedance control signal responsive to values of the parameters measured by the sensor; and

an impedance matching network connected to the output of the power generator and to the impedance control output of the power generator, the impedance matching network configured to provide, responsive to the impedance control signal, an efficient transfer of power from the power generator to plasma in a plasma processing chamber by matching the impedance of the plasma to the operating impedance of the power generator.

13. The system of claim 12, wherein the power generator includes a memory configured to store the information characterizing the cable that couples the power generator to the impedance matching network, and wherein the power generator is configured to provide the impedance control signal responsive to the information characterizing the cable.

14. The system of claim 13, wherein the power generator includes a user interface configured to enable a user to input at least a portion of the information characterizing the cable.