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Method and system for semiconductor process control and monitoring by using a data quality metric

  • US 8,849,615 B2
  • Filed: 01/11/2010
  • Issued: 09/30/2014
  • Est. Priority Date: 01/30/2009
  • Status: Active Grant
First Claim
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1. A method of monitoring a production process for processing microstructure devices in at least one process tool, the method comprising:

  • performing a data communication process so as to communicate a plurality of measurement data at least several times from said at least one process tool to a fault detection system during processing of a microstructure device;

    determining a data communication quality metric in said fault detection system, said data communication quality metric comprising a momentary data rate between successive measurements generated for each of the plurality of measurement data and indicating at least a degree of completeness of said measurement data; and

    performing a fault detection process in said fault detection system using said plurality of measurement data and said data communication quality metric as inputs to the fault detection process.

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