Method and apparatus for providing metric relating two or more process parameters to yield
First Claim
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1. A method comprising:
- determining two or more parameters associated with designing a semiconductor device;
determining two or more layers associated with designing the semiconductor device;
determining a process window associated with acceptable limits of the two or more parameters;
correlating distributions of the two or more parameters between the two or more layers; and
applying, by a processor, a probability density function and the correlated distribution of the two or more parameters to the process window to generate a yield metric that relates the two or more parameters to yield.
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Abstract
A process and apparatus are provided for generating and evaluating one or more metrics for analyzing the design and manufacture of semiconductor devices. Embodiments include scanning a drawn semiconductor design layout to determine a difficult-to-manufacture pattern within the drawn semiconductor design layout based on a match with a pre-characterized difficult-to-manufacture pattern determining a corrected pattern based on a pre-determined correlation between the corrected pattern and the pre-characterized difficult-to-manufacture pattern, and replacing the difficult-to-manufacture pattern with the corrected pattern within the drawn semiconductor design layout.
22 Citations
18 Claims
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1. A method comprising:
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determining two or more parameters associated with designing a semiconductor device; determining two or more layers associated with designing the semiconductor device; determining a process window associated with acceptable limits of the two or more parameters; correlating distributions of the two or more parameters between the two or more layers; and applying, by a processor, a probability density function and the correlated distribution of the two or more parameters to the process window to generate a yield metric that relates the two or more parameters to yield. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. An apparatus comprising:
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at least one processor; and at least one memory including computer program code for one or more programs, the at least one memory and the computer program code configured to, with the at least one processor, cause the apparatus to perform at least the following, determine two or more parameters associated with designing a semiconductor device; determine two or more layers associated with designing the semiconductor device; determine a process window associated with acceptable limits of the two or more parameters; correlate distributions of the two or more parameters between the two or more layers; and apply a probability density function and the correlated distribution of the two or more parameters to the process window to generate a yield metric that relates the two or more parameters to yield. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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17. A method comprising:
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determining two or more layers associated with designing a semiconductor device; determining two or more parameters, including exposure dosage and exposure focus, associated with designing a semiconductor device, wherein one or more of the parameters are associated with one or more of the layers; determining one or more process windows associated with acceptable limits of the two or more parameters; correlating distributions of the two or more parameters between at least two of the two or more layers; and applying, by a processor, a Gaussian probability density function and the correlated distribution of the two or more parameters according to the one or more process windows to generate a yield metric that relates the two or more parameters to yield. - View Dependent Claims (18)
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Specification