Super junction semiconductor device comprising a cell area and an edge area
First Claim
1. A super junction semiconductor device comprising:
- at least one doped zone in a cell area;
a drift layer formed in the cell area and in an edge area surrounding the cell area, the drift layer comprising first portions of the first conductivity type and second portions of a second conductivity type opposite to the first conductivity type, an on-state or forward current from/to the at least one doped zone flowing through the first portions in the cell area; and
wherein at least one of the first and second portions other than the first portions in the cell area contain auxiliary impurities or include an auxiliary structure operable to locally reduce an avalanche rate.
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Accused Products
Abstract
A drift layer of a super junction semiconductor device includes first portions of a first conductivity type and second portions of a second conductivity type opposite to the first conductivity type. The first and second portions are formed both in a cell area and in an edge area surrounding the cell area, wherein an on-state or forward current through the drift layer flows through the first portions in the cell area. At least one of the first and second portions other than the first portions in the cell area includes an auxiliary structure or contains auxiliary impurities to locally reduce the avalanche rate. Locally reducing the avalanche rate increases the total voltage blocking capability of the super junction semiconductor device.
16 Citations
26 Claims
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1. A super junction semiconductor device comprising:
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at least one doped zone in a cell area; a drift layer formed in the cell area and in an edge area surrounding the cell area, the drift layer comprising first portions of the first conductivity type and second portions of a second conductivity type opposite to the first conductivity type, an on-state or forward current from/to the at least one doped zone flowing through the first portions in the cell area; and wherein at least one of the first and second portions other than the first portions in the cell area contain auxiliary impurities or include an auxiliary structure operable to locally reduce an avalanche rate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A method of manufacturing a super junction semiconductor device, the method comprising:
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forming a drift layer, the drift layer comprising, in a cell area and in an edge area surrounding the cell area, first portions of the first conductivity type and second portions of a second conductivity type opposite to the first conductivity type; forming at least one doped zone above the drift layer in the cell area, wherein an on-state current or forward current from/to the at least one doped zone flows through the first portions in the cell area; and providing in at least one of the first and second portions other than the first portions in the cell area auxiliary impurities or an auxiliary structure operable to locally reduce an avalanche rate. - View Dependent Claims (22, 23, 24, 25, 26)
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Specification