Optical vacuum ultra-violet wavelength nanoimprint metrology

• US 8,867,041 B2
• Filed: 01/15/2012
• Issued: 10/21/2014
• Est. Priority Date: 01/18/2011
• Status: Active Grant

• Current Assignee: Bruker Technologies Ltd. (Bruker Corporation)
• Original Assignee: Jordan Valley Semiconductors Ltd. (Bruker Corporation)
• Inventors: Walsh, Phillip, Hurst, Jeffrey B., Harrison, Dale A.
• Primary Examiner(s): Chowdury, Tarifur
• Assistant Examiner(s): Lapage, Michael P
• Application Number:
  US13/350,780
• Publication Number:
  US 20120182542A1
• Time in Patent Office: 1,010 Days
• Field of Search: 356/51, 356/369, 356/612, 356/364, 356/445, 356/448, 356/601
• US Class Current: 356/448
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G01N 21/956 Inspecting patterns on the surface of objects contactless testing of electronic circuits G01R31/308; testing currency G07D; manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Abstract

An optical metrology apparatus for measuring nanoimprint structures using Vacuum Ultra-Violet (VUV) light is described. Focusing optics focus light onto the sample and collect the light reflected from the sample so as to record an optical response from nanoimprint structures on the sample, wherein the nanoimprint structures have an orientation that varies over a surface of the sample. A sample stage is configured to support the sample. At least one computer is connected to the metrology instrument and the sample stage and is configured to run a computer program which causes the sample stage to rotate the sample so as to present multiple different locations on the sample to the optical metrology instrument such that the orientation of the nanoimprint structures at the multiple different locations remains fixed with respect to a plane of the focusing optics of the metrology instrument in order to eliminate polarization effects.

Claims

1. An apparatus for measuring characteristics of a sample, the apparatus comprising:

an optical metrology instrument comprising focusing optics for focusing light onto the sample and collecting the light reflected from the sample so as to record an optical response from nanoimprint structures on the sample, wherein the nanoimprint structures have an orientation that varies over a surface of the sample;

a sample stage configured to support the sample; and

at least one computer, which is connected to the metrology instrument and the sample stage and is configured to run a computer program which causes the sample stage to rotate the sample so as to present multiple different locations on the sample to the optical metrology instrument such that the orientation of the nanoimprint structures at the multiple different locations remains fixed with respect to a plane of the focusing optics of the metrology instrument in order to eliminate polarization effects,

wherein the computer program causes the at least one computer to extract measured characteristics of the nanoimprint structures from a theoretical model of the sample

while making use of the fixed orientation of the nanoimprint structures in extraction of the measured characteristics.

2. The apparatus of claim 1, wherein the computer program causes the sample stage to rotate the sample so that the orientation of the nanoimprint structures is fixed at an azimuth of φ

=45°

with respect to the plane of the focusing optics of the metrology instrument.

3. The apparatus of claim 1, wherein the optical metrology instrument is configured to operate at wavelengths below deep ultra-violet (DUV) wavelengths but not lower than vacuum ultra-violet (VUV).

4. The apparatus of claim 1, wherein the optical metrology instrument is configured to operate as a reflectometer.

5. The apparatus of claim 1, wherein the nanoimprint structures are formed on the sample such that they are circularly symmetric with respect to the center of the sample.

6. The apparatus of claim 1, wherein the sample stage comprises an r-θ

stage.

7. The apparatus of claim 1, wherein the sample stage comprises an x-y-θ

stage.

8. A method for measuring characteristics of a sample, the method comprising:

operating an optical metrology instrument to focus light onto the sample and to collect the light reflected from the sample so as to record an optical response from nanoimprint structures on the sample, wherein the nanoimprint structures have an orientation that varies over a surface of the sample;

rotating a sample stage that supports the sample so as to present multiple different locations on the sample to the optical metrology instrument such that the orientation of the nanoimprint structures at the multiple different locations remains fixed with respect to a plane of the light that is focused and collected by the metrology instrument in order to eliminate polarization effects; and

running a computer program so as to cause at least one computer to extract measured characteristics from a theoretical model of the sample while making use of the fixed orientation of the nanoimprint structures in extraction of the measured characteristics.

9. The method of claim 8, wherein rotating the sample stage comprises orienting the sample so that the orientation of the nanoimprint structures is fixed at an azimuth of φ

=45°

with respect to the plane of the focused and collected light.

10. The method of claim 8, wherein operating the optical metrology instrument comprises focusing and collecting the light at wavelengths below deep ultra-violet (DUV) wavelengths but not lower than vacuum ultra-violet (VUV).

11. The method of claim 8, wherein operating the optical metrology instrument comprises collecting reflectometric data.

12. The method of claim 8, wherein the nanoimprint structures are formed on the sample such that they are circularly symmetric with respect to the center of the sample.

13. The method of claim 8, wherein the sample stage comprises an r-θ

stage.

14. The method of claim 8, wherein the sample stage comprises an x-y-θ

stage.