Light-emitting device having a trench in a semiconductor layer
First Claim
1. A light-emitting device comprising:
- a substrate;
an adhesive layer on the substrate;
a reflection layer on the adhesive layer;
a second semiconductor layer on the reflection layer;
a light-emitting layer on the second semiconductor layer;
a first semiconductor layer on the light-emitting layer, wherein a thickness of the first semiconductor layer is H;
a plurality of trenches through the first semiconductor layer, wherein a depth of one of the plurality of trenches is h; and
a first conductive structure on the first semiconductor layer;
wherein the depth of the trench h is greater than ⅓
of the thickness of the first semiconductor layer H;
wherein the first conductive structure comprises a first electrode encompassing an edge region of the light-emitting device, andwherein a total area of all trenches in the first semiconductor layer is not greater than 50% of an area of a top surface of the first semiconductor layer.
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Accused Products
Abstract
A light-emitting device comprises a substrate, an epitaxial structure formed on the substrate including a first semiconductor layer, a second semiconductor layer, and a light-emitting layer formed between the first semiconductor layer and the second semiconductor layer. A trench is formed in the epitaxial structure to expose a part of side surface of the epitaxial structure and a part of surface of the first semiconductor layer, so that a first conductive structure is formed on the part of surface of the first semiconductor layer in the trench, and a second conductive structure is formed on the second semiconductor layer. The first conductive structure includes a first electrode and a first pad electrically contacted with each other. The second conductive structure includes a second electrode and a second pad electrically contacted with each other. Furthermore, the area of at least one of the first pad and the second pad is between 1.5×104 μm2 and 6.2×104 μm2.
37 Citations
15 Claims
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1. A light-emitting device comprising:
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a substrate; an adhesive layer on the substrate; a reflection layer on the adhesive layer; a second semiconductor layer on the reflection layer; a light-emitting layer on the second semiconductor layer; a first semiconductor layer on the light-emitting layer, wherein a thickness of the first semiconductor layer is H; a plurality of trenches through the first semiconductor layer, wherein a depth of one of the plurality of trenches is h; and a first conductive structure on the first semiconductor layer; wherein the depth of the trench h is greater than ⅓
of the thickness of the first semiconductor layer H;wherein the first conductive structure comprises a first electrode encompassing an edge region of the light-emitting device, and wherein a total area of all trenches in the first semiconductor layer is not greater than 50% of an area of a top surface of the first semiconductor layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A light-emitting device comprising:
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a substrate; a second semiconductor layer on the substrate; a light-emitting layer on the second semiconductor layer; a first semiconductor layer on the light-emitting layer; a plurality of trenches in the first semiconductor layer; and a first conductive structure comprising a plurality of first electrodes and a first pad on the first semiconductor layer; wherein a depth of one of the plurality of trenches is greater than one-third of a thickness of the first semiconductor layer but less than the thickness of the first semiconductor layer; wherein the plurality of trenches is formed between two of the plurality of first electrodes, and wherein a total area of all trenches in the first semiconductor layer is not greater than 50% of an area of a top surface of the first semiconductor layer. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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Specification