Liquid crystal display device and method of manufacturing the same
First Claim
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1. A liquid crystal display device comprising:
- a gate wiring over an insulating surface;
a common wiring over the insulating surface;
a first insulating film comprising silicon nitride over the gate wiring and the common wiring;
a first amorphous semiconductor film over the first insulating film;
a pair of second amorphous semiconductor films over the first amorphous semiconductor film;
a source wiring over one of the pair of second amorphous semiconductor films;
a second insulating film comprising silicon nitride over the source wiring;
a common electrode electrically connected to the common wiring;
a transparent electrode electrically connected to the other of the pair of second amorphous semiconductor films;
an alignment film over the transparent electrode and the common electrode; and
a liquid crystal over the alignment film,wherein the source wiring overlaps the first amorphous semiconductor film and one of the pair of second amorphous semiconductor films,wherein the first amorphous semiconductor film and one of the pair of second amorphous semiconductor films extend along the source wiring,wherein the second insulating film is in contact with the first amorphous semiconductor film and the pair of second amorphous semiconductor films in a region overlapping the gate wiring,wherein the transparent electrode overlaps the common wiring, andwherein the source wiring overlaps the gate wiring and the common wiring.
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Abstract
In a liquid crystal display device of an IPS system, to realize reduction of manufacturing cost and improvement of yield by decreasing the number of steps for manufacturing a TFT. A channel etch type bottom gate TFT structure, where patterning of a source region and a drain region and patterning of a source wiring and a pixel electrode are carried out by the same photomask.
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Citations
15 Claims
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1. A liquid crystal display device comprising:
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a gate wiring over an insulating surface; a common wiring over the insulating surface; a first insulating film comprising silicon nitride over the gate wiring and the common wiring; a first amorphous semiconductor film over the first insulating film; a pair of second amorphous semiconductor films over the first amorphous semiconductor film; a source wiring over one of the pair of second amorphous semiconductor films; a second insulating film comprising silicon nitride over the source wiring; a common electrode electrically connected to the common wiring; a transparent electrode electrically connected to the other of the pair of second amorphous semiconductor films; an alignment film over the transparent electrode and the common electrode; and a liquid crystal over the alignment film, wherein the source wiring overlaps the first amorphous semiconductor film and one of the pair of second amorphous semiconductor films, wherein the first amorphous semiconductor film and one of the pair of second amorphous semiconductor films extend along the source wiring, wherein the second insulating film is in contact with the first amorphous semiconductor film and the pair of second amorphous semiconductor films in a region overlapping the gate wiring, wherein the transparent electrode overlaps the common wiring, and wherein the source wiring overlaps the gate wiring and the common wiring. - View Dependent Claims (2, 3, 4, 5)
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6. A liquid crystal display device comprising:
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a gate wiring over an insulating surface; a common wiring over the insulating surface; a first insulating film comprising silicon nitride over the gate wiring and the common wiring; a first amorphous semiconductor film over the first insulating film; a pair of second amorphous semiconductor films over the first amorphous semiconductor film; a source wiring over one of the pair of second amorphous semiconductor films; a second insulating film comprising silicon nitride over the source wiring; a common electrode electrically connected to the common wiring; a transparent electrode electrically connected to the other of the pair of second amorphous semiconductor films; an alignment film over the transparent electrode and the common electrode; a liquid crystal over the alignment film; and a terminal portion comprising a conductive layer formed of a same layer as the transparent electrode, wherein the source wiring overlaps the first amorphous semiconductor film and one of the pair of second amorphous semiconductor films, wherein the first amorphous semiconductor film and one of the pair of second amorphous semiconductor films extend along the source wiring, wherein the second insulating film is in contact with the first amorphous semiconductor film and the pair of second amorphous semiconductor films in a region overlapping the gate wiring, wherein the transparent electrode overlaps the common wiring, and wherein the source wiring overlaps the gate wiring and the common wiring. - View Dependent Claims (7, 8, 9, 10)
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11. A liquid crystal display device comprising:
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a gate wiring over an insulating surface; a common wiring over the insulating surface; a first insulating film over the gate wiring and the common wiring; a first amorphous semiconductor film over the first insulating film; a pair of second amorphous semiconductor films over the first amorphous semiconductor film; a source wiring over one of the pair of second amorphous semiconductor films; a second insulating film over the source wiring; a common electrode electrically connected to the common wiring; a transparent electrode electrically connected to the other of the pair of second amorphous semiconductor films; an alignment film over the transparent electrode and the common electrode; a liquid crystal over the alignment film; and a terminal portion comprising a conductive layer formed of a same layer as the transparent electrode, wherein the source wiring overlaps the first amorphous semiconductor film and one of the pair of second amorphous semiconductor films, wherein the first amorphous semiconductor film and one of the pair of second amorphous semiconductor films extend along the source wiring, wherein the second insulating film is in contact with the first amorphous semiconductor film and the pair of second amorphous semiconductor films in a region overlapping the gate wiring, wherein the transparent electrode overlaps the common wiring, and wherein the source wiring overlaps the gate wiring and the common wiring. - View Dependent Claims (12, 13, 14, 15)
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Specification